Patent classifications
B32B2457/14
ADHESIVE BONDING COMPOSITION AND METHOD OF USE
A method of and system for adhesive bonding by a) providing a polymerizable adhesive composition on a surface of an element to be bonded to form an assembly; b) irradiating the assembly with radiation at a first wavelength capable of vulcanization of bonds in the polymerizable adhesive composition by activation of sulfur-containing compound with at least one selected from x-ray, e-beam, visible, or infrared light to thereby generate ultraviolet light in the polymerizable adhesive composition; and c) adhesively joining two or more components together by way of the polymerizable adhesive composition, and a curable polymer for use therein.
DIRECT BONDING AND DEBONDING OF ELEMENTS
A bonding method is disclosed. The bonding method can include providing a first element having a device portion and a first nonconductive bonding material disposed over the device portion of the first element. The bonding method can include providing a second element that includes a carrier. The second element having a substrate and a second nonconductive bonding material disposed over the substrate of the second element. The bonding method can include depositing a release layer between the device portion and the first nonconductive bonding material of the first element or between the substrate and the second nonconductive bonding material of the second element. The bonding method can include directly bonding the first nonconductive bonding material of the first element to the second nonconductive bonding material of the second element without an intervening adhesive. The bonding method can include removing the second element from the first element by transferring thermal energy to the release layer to thereby induce diffusion of gas including volatile species out of the release layer.
FILTER MEDIUM FOR AIR FILTER, FILTER PACK, AIR FILTER UNIT, AND METHOD FOR PRODUCING FILTER MEDIUM FOR AIR FILTER
A filter medium includes first and second porous films mainly containing fluororesin, and a pre-collection member upstream of the first film. The second film is downstream of the first film. The pre-collection member has a pressure drop when air is passed through at a flow rate of 5.3 cm/s of between 15 Pa and 55 Pa, a collection efficiency of NaCl particles having a particle diameter of 0.3 μm when air containing the particles is passed hrough at a flow rate of 5.3 cm/s of between 25% and 80%, a thickness of 0.4 mm or less, and a PF value between 7 and 15. The PF value={−log((100−collection efficiency (%))/100)}/(pressure drop (Pa)/1000). A ratio of the PF value of the pre-collection member to the PF value when the first and second films are overlapped, is between 0.20 and 0.45. The filter medium can be used in a filter pack or filter unit, and may be produced by integrating the first and second films and the pre-collection member using heat lamination.
WAFER LAMINATE AND MAKING METHOD
A wafer laminate has an adhesive layer (2) sandwiched between a support (1) and a wafer (3), with a circuit-forming surface of the wafer facing the adhesive layer. The adhesive layer (2) includes a light-shielding resin layer (2a), an epoxy-containing siloxane skeleton resin layer (2b), and a non-silicone thermoplastic resin layer (2c).
Method of manufacturing a device
Provided is a device in which the metal content existing in a joining interface is controlled. A manufacturing method for the device comprises: a step in which the surfaces of a first substrate and a second substrate are activated using a FAB gun; a step in which a plurality of metals are discharged by using the FAB gun to sputter a discharged metal body comprising the plurality of metals, and the plurality of metals are affixed to the surfaces of the first substrate and the second substrate; a step in which the first substrate and the second substrate are joined at room temperature; and a step in which heating is performed at a temperature that is high in comparison to the agglomeration start temperature of the plurality of metals and of the elements that constitute the first substrate or the second substrate. With regards to the step in which the plurality of metals are affixed, the density of the plurality of metals existing on the joining interface of the first substrate and the second substrate is set to 1×10.sup.12/cm.sup.2 or less by adjusting the exposure area of the discharged metal body.
Method for manufacturing laminate, method for manufacturing sealed substrate laminate, sealed substrate laminate, and sealed substrate
A laminate manufactured by forming a step difference in a substrate by grinding a periphery edge portion to have such a size that a surface on the inner side of the step difference can be housed in a cavity of a die, and then laminating the substrate, an adhesive layer, a release layer, and a support plate in this order such that the surface on the inner side of the step difference of the substrate faces the support plate.
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
According to one embodiment, in a semiconductor device, a first film is arranged on a side of a main surface of the substrate. A second film is arranged on an opposite side of the substrate with the first film interposed therebetween. A main surface of the second film is in contact with a main surface of the first film. A third film is arranged on an opposite side of the first film with the second film interposed therebetween. A main surface on a side of the substrate of the third film has two-dimensionally-distributed protrusions or recesses. A main surface on an opposite side of the substrate of the third film is flat. Absorptance of infrared light of the second film is higher than absorptance of the infrared light of the third film. Thermal expansion coefficient of the third film is different from thermal expansion coefficient of the second film.
RESIN COMPOSITION FOR SEMICONDUCTOR PACKAGE, COPPER CLAD LAMINATE AND CIRCUIT BOARD HAVING THE SAME
A resin composition for a semiconductor package according to an embodiment includes a resin composition comprising a resin and a filler provided in the resin, wherein the resin includes a soluble liquid crystal polymer resin, and wherein the filler has a negative coefficient of thermal expansion (negative CTE) and is provided in the soluble liquid crystal polymer resin.
Separation apparatus, separation system, and separation method
A separation apparatus for separating a superposed substrate in which a processing target substrate and a supporting substrate are joined together with an adhesive, into the processing target substrate and the supporting substrate includes: a first holding unit that includes a heating mechanism heating the processing target substrate and holds the processing target substrate; a second holding unit that includes a heating mechanism heating the supporting substrate and holds the supporting substrate; a moving mechanism that relatively moves at least the first holding unit or the second holding unit in a horizontal direction; and a porous part that is annularly provided along an outer peripheral portion of the first holding unit and formed with a plurality of pores, and supplies an inert gas to the outer peripheral portion of the first holding unit holding the processing target substrate.
Methods of transferring device wafers or layers between carrier substrates and other surfaces
New temporary bonding methods and articles formed from those methods are provided. In one embodiment, the methods comprise coating a device or other ultrathin layer on a growth substrate with a rigid support layer and then bonding that stack to a carrier substrate. The growth substrate can then be removed and the ultrathin layer mounted on a final support. In another embodiment, the invention provides methods of handling device layers during processing that must occur on both sides of the fragile layer without damaging it. This is accomplished via the sequential use of two carriers, one on each side of the device layer, bonded with different bonding compositions for selective debonding.