Patent classifications
B81B2207/11
METHOD FOR FORMING MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) STRUCTURE
A method for forming a micro-electro-mechanical system (MEMS) device structure is provided. The method includes forming a substrate over a micro-electro-mechanical system (MEMS) substrate. The substrate includes a semiconductor via. The method also includes forming a dielectric layer over a top surface of the substrate, and forming a polymer layer over the dielectric layer. The method further includes patterning the polymer layer to form an opening, and the semiconductor via is exposed by the opening. The method includes forming a conductive layer in the opening and over the polymer layer, and forming an under bump metallization (UBM) layer on the conductive layer. The method further includes forming an electrical connector over the UBM layer, wherein the electrical connector is electrically connected to the semiconductor via through the UBM layer.
MEMS-Sensor
A MEMS sensor includes a housing with an interior volume, wherein the housing has an access port to the interior volume, a MEMS component in the housing, and a protection structure, which reduces an introduction of electromagnetic disturbance radiation with a wavelength in the range between 10 nm and 20 m into the interior volume through the access port and reduces a propagation of the electromagnetic disturbance radiation in the interior volume.
Micro-electro-mechanical system (MEMS) structure including isolation ring at sidewalls of semiconductor via and method for forming the same
A method for forming a micro-electro-mechanical system (MEMS) device structure is provided. The MEMS device structure includes a micro-electro-mechanical system (MEMS) substrate, and a substrate formed over the MEMS substrate. The substrate includes a semiconductor via through the substrate. The MEMS device structure includes a dielectric layer formed over the substrate and a polymer layer formed on the dielectric layer. The MEMS device structure also includes a conductive layer formed in the dielectric layer and the polymer layer. The conductive layer is electrically connected to the semiconductor via, and the polymer layer is between the conductive layer and the dielectric layer.
ELECTRONIC APPARATUS INCLUDING HOLDING STRUCTURE FOR MICRO ELECTRO MECHANICAL SYSTEM (MEMS) MICROPHONE THAT REDUCES SOUND NOISE DUE TO PHOTOELECTRIC EFFECT
An electronic apparatus includes a housing provided with an opening, a Micro Electro Mechanical System (MEMS) microphone disposed at a position directly under the opening and configured to collect sound through the opening, a light blocking member disposed at a position corresponding to a sound collection unit of the MEMS microphone between the opening and the MEMS microphone to prevent light from entering the MEMS microphone through the opening, and a waterproof member disposed in contact with the light blocking member and configured to close the opening to prevent water from entering the housing through the opening.
MEMS DEVICE WITH MEMBRANE AND UPRIGHT NANOSTRUCTURES
In accordance with an embodiment a microelectromechanical system (MEMS) device including a substrate comprising a vertically extending through hole and a horizontally extending membrane structure covering the through hole, where the membrane structure comprises a plurality of upright nanostructures for providing a liquid repellent membrane surface. In other embodiments, certain methods are used for fabricating MEMS devices.
DIRECTIONAL MICROPHONE AND ASSOCIATED PACKING TECHNIQUES
Aspects of the disclosure provide a packaging technique for making a directional microphone which employs mechanical structures to cancel undesired background noise to realize the directional function instead of an extra sensor required in electronic noise-cancelling techniques, thus reducing the footprint and cost of a directional microphone. A directional microphone based on this technique can include an acoustic sensor and a housing enclosing the acoustic sensor. The acoustic sensor can include a sensing diaphragm, a cavity below the sensing diaphragm, and a first substrate. The directional microphone device can further includes a channel with an inlet open at an edge of the first substrate and an outlet connected with the cavity. The housing can include a cover attached to a second substrate supporting the first substrate. The cover can include a first opening over the sensing diaphragm and a second opening at a side of the cover.
MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) STRUCTURE AND METHOD FOR FORMING THE SAME
A method for forming a micro-electro-mechanical system (MEMS) device structure is provided. The MEMS device structure includes a micro-electro-mechanical system (MEMS) substrate, and a substrate formed over the MEMS substrate. The substrate includes a semiconductor via through the substrate. The MEMS device structure includes a dielectric layer formed over the substrate and a polymer layer formed on the dielectric layer. The MEMS device structure also includes a conductive layer formed in the dielectric layer and the polymer layer. The conductive layer is electrically connected to the semiconductor via, and the polymer layer is between the conductive layer and the dielectric layer.
SUPERHYDROPHOBIC AND SUPEROLEOPHOBIC NANOSURFACES
Devices, systems and techniques are described for producing and implementing articles and materials having nanoscale and microscale structures that exhibit superhydrophobic, superoleophobic or omniphobic surface properties and other enhanced properties. In one aspect, a surface nanostructure can be formed by adding a silicon-containing buffer layer such as silicon, silicon oxide or silicon nitride layer, followed by metal film deposition and heating to convert the metal film into balled-up, discrete islands to form an etch mask. The buffer layer can be etched using the etch mask to create an array of pillar structures underneath the etch mask, in which the pillar structures have a shape that includes cylinders, negatively tapered rods, or cones and are vertically aligned. In another aspect, a method of fabricating microscale or nanoscale polymer or metal structures on a substrate is made by photolithography and/or nano imprinting lithography.
DOORBELL CAMERA HAVING ACTIVE COOLING
A doorbell system is disclosed. The doorbell system includes a housing, a heat-generating structure, and a cooling system. The housing is configured to be coupled to a structure. The heat-generating structure and cooling system are coupled with the housing. The cooling system includes at least one active cooling cell. The heat-generating structure may be thermally coupled with the cooling system. The active cooling cell(s) are configured to utilize vibrational motion to drive a fluid for transferring heat from the heat-generating structure. The cooling system is coupled with and contained by the housing.
MINI PC HAVING ACTIVE COOLING
A mini personal computer (PC) is described. The mini PC includes a housing, at least one heat-generating structure coupled with the housing, and a cooling system. The cooling system includes at least one active cooling cell. The heat-generating structure(s) are coupled with the cooling system. The active cooling cell(s) are configured to utilize vibrational motion to drive a fluid for transferring heat from the heat-generating structure(s). The cooling system is coupled with and contained by the housing.