B81B2207/99

SENSOR ELEMENT, METHOD FOR MANUFACTURING SENSOR ELEMENT, DETECTION DEVICE, AND METHOD FOR MANUFACTURING DETECTION DEVICE

There is provided a sensor element including: a semiconductor base member having a first main surface and a second main surface located opposite to the first main surface, and having a cavity structure formed on the second main surface side; and a detection element formed on the first main surface side in a region where the cavity structure is formed, the second main surface of the semiconductor base member including a convexly and concavely shaped portion, and a tip of a convex portion of the convexly and concavely shaped portion having a curved shape.

Tunable Power Amplifier with Wide Frequency Range

A circuit includes an amplifier configured to amplify an input signal and generate an output signal. The circuit also includes a tuning network configured to tune frequency response of the amplifier. The tuning network includes at least one tunable capacitor, where the at least one tunable capacitor includes at least one micro-electro mechanical system (MEMS) capacitor. The amplifier could include a first die, the at least one MEMS capacitor could include a second die, and the first die and the second die could be integrated in a single package. The at least one MEMS capacitor could include a MEMS superstructure disposed over a control structure, where the control structure is configured to control the MEMS superstructure and tune the capacitance of the at least one MEMS capacitor.

Anchor and cavity configuration for MEMS-based cooling systems

A cooling system is described. The cooling system includes a bottom plate, a support structure, and a cooling element. The bottom plate has orifices therein. The cooling element has a central axis and is supported by the support structure at the central axis. A first portion of the cooling element is on a first side of the central axis and a second portion of the cooling element is on a second side of the central axis opposite to the first side. The first and second portions of the cooling element are unpinned. The first portion and the second portion are configured to undergo vibrational motion when actuated to drive a fluid toward a heat-generating structure. The support structure couples the cooling element to the bottom plate. At least one of the support structure is an adhesive support structure or the support structure undergoes rotational motion in response to the vibrational motion. The adhesive support structure has at least one lateral dimension defined by a trench in the cooling element or the bottom plate.

Expansion mediated adhesive device
12384945 · 2025-08-12 · ·

An adhesive device comprising a microstructure and polymer designed to interdigitate with the surface structure of a target surface. The device may include a microstructure material having an elastomeric, crosslinked polymer which may swell in the presence of a liquid. In the pre-swell state, the device microstructure may interdigitate with a target surface microstructure. When liquid on the target surface contacts the microstructure surface of the device, the liquid may cause the microstructure surface of the device to swell. The swelling may cause the microstructure to grasp the target surface resulting in adhesion between the device and the target surfaces.

Impact-resistant micromechanical arms

A micromechanical arm is provided. The micromechanical arm includes: a bottom metal piece having a plurality of trenches extending downwardly from a top surface of the bottom metal piece; an intermediate layer on the bottom metal piece and filling at least a portion of each of the plurality of trenches; and a top metal piece on the intermediate layer. The intermediate layer is made of a material that has a stiffness smaller than the bottom metal piece and the top metal piece.

IMPACT-RESISTANT MICROMECHANICAL ARMS
20250361139 · 2025-11-27 ·

A method of fabricating a micro-electromechanical systems (MEMS) structure comprises: providing a substrate; forming an etch stop layer over the substrate; forming a sacrificial layer on the etch stop layer; selectively etching the sacrificial layer to create a remaining sacrificial layer; forming a dielectric support layer; selectively etching the dielectric support layer to create an opening in the dielectric support layer; forming a bottom metal layer in the opening and on the remaining sacrificial layer; selectively etching the bottom metal layer to form a plurality of trenches extending downwardly from a top surface of the bottom metal layer; depositing an intermediate layer on the bottom metal layer such that the intermediate layer fills at least a portion of each of the plurality of trenches; forming a top metal piece on the intermediate layer; and removing the remaining sacrificial layer to create a cavity.

MEMS device, method for manufacturing MEMS device and electronic device

The present disclosure provides an MEMS device, a method for manufacturing an MEMS device and an electronic device, and belongs to the field of Micro-Electro-Mechanical System technology. The MEMS device includes: a first dielectric substrate and a first component on the first dielectric substrate; the first component and the first dielectric substrate enclose a movable space; the first component has a first portion corresponding to the movable space; the first portion has at least one first opening, and at least one protruding structure is on a side of the first portion close to the first dielectric substrate; orthographic projections of the at least one protruding structure and the at least one first opening on the first dielectric substrate do not overlap with each other, and a thickness of each protruding structure is smaller than a height of the movable space.

Die stacking with controlled tilt and angular alignment

Alignment features formed on a cover substrate allow for a second substrate to be bonded to the cover substrate while ensuring that the second substrate is not titled with respect to a plane defined by the alignment features. Die attachment material is patterned such that it deforms or flows underneath the second substrate while allowing corners of the second substrate to rest on landing areas that are elevated above the top surface of the cover substrate. Some of the landing areas may include additional features that are elevated above the landing areas to form notches which constrain the rotational position of the second in addition to its tilt.