In an example, a MEMS device includes MEMS elements supported on a substrate. The MEMS elements satisfy one or more uniformity metrics. Various uniformity metrics may be used, include tilt angle of each MEMS element, height of each MEMS element, and shape of each MEMS element. To maintain uniformity among the MEMS elements are constructed such that the tilt angles, heights, and/or shapes of the MEMS elements are within acceptable range(s). In other examples, the MEMS elements may be on a wafer, in which case the uniformity metric(s) may be enforced across the wafer. The uniformity metric(s) may also be enforced across multiple wafers.