Patent classifications
B82B3/008
Property control of multifunctional surfaces
The physical and chemical properties of surfaces can be controlled by bonding nanoparticles, microspheres, or nanotextures to the surface via inorganic precursors. Surfaces can acquire a variety of desirable properties such as antireflection, antifogging, antifrosting, UV blocking, and IR absorption, while maintaining transparency to visible light. Micro or nanomaterials can also be used as etching masks to texture a surface and control its physical and chemical properties via its micro or nanotexture.
NANO-ELECTROMECHANICAL SYSTEM (NEMS) DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME
A NEMS device structure and a method for forming the same are provided. The NEMS device structure includes a first dielectric layer formed over a substrate, and a first conductive layer formed in the first dielectric layer. The NEMS device structure includes a second dielectric layer formed over the first dielectric layer, and a first supporting electrode a second supporting electrode and a beam structure formed in the second dielectric layer. The beam structure is formed between the first supporting electrode and the second supporting electrode, and the beam structure has a T-shaped structure. The NEMS device structure includes a first through hole formed between the first supporting electrode and the beam structure, and a second through hole formed between the second supporting electrode and the beam structure.
Nano-electromechanical system (NEMS) device structure and method for forming the same
A NEMS device structure and a method for forming the same are provided. The NEMS device structure includes a substrate and an interconnect structure formed over the substrate. The NEMS device structure includes a dielectric layer formed over the interconnect structure and a beam structure formed in and over the dielectric layer, wherein the beam structure includes a plurality of strip structures. The NEMS device structure includes a cap structure formed over the dielectric layer and the beam structure and a cavity formed between the beam structure and the cap structure.
NANOSTRUCTURE FEATURING NANO-TOPOGRAPHY WITH OPTIMIZED ELECTRICAL AND BIOCHEMICAL PROPERTIES
A nanostructure includes a base layer including a surface. The nanostructure further includes nano-patterned features including non-random topography located on the surface of the base layer. The nanostructure also includes an encapsulating layer including a conductive material arranged on the nano-patterned features.
Excavated nanoframes with three-dimensional electrocatalytic surfaces
Described herein are metallic excavated nanoframes and methods for producing metallic excavated nanoframes. A method may include providing a solution including a plurality of excavated nanoparticles dispersed in a solvent, and exposing the solution to chemical corrosion to convert the plurality of excavated nanoparticles into a plurality of excavated nanoframes.
Laminated ceramic chip component including nano thin film layer, manufacturing method therefor, and atomic layer vapor deposition apparatus therefor
The present disclosure discloses the laminated ceramic chimp component including an element part having a ceramic main body and an internal electrode placed in the ceramic main body; an external electrode part having a first external electrode and a second external electrode, the first and second external electrodes being provided with side electrodes covering both side surfaces of the ceramic main body, respectively, upper electrodes covering portions of both sides of an upper surface of the ceramic main body, respectively, and lower electrodes covering portions of both sides of a lower surface of the ceramic main body, respectively; and a nano thin film layer formed of electric insulation material and applied to a region including the upper electrodes, the method for manufacturing the same and the atomic layer deposition apparatus for the same.
FORMING NANOSCALE PORES IN A SEMICONDUCTOR STRUCTURE UTILIZING NANOTUBES AS A SACRIFICIAL TEMPLATE
A method of forming a semiconductor structure includes forming two or more catalyst nanoparticles from a metal layer disposed over a substrate in two or more openings of a hard mask patterned over the metal layer. The method also includes growing two or more carbon nanotubes using the catalyst nanoparticles, and removing the carbon nanotubes to form two or more nanoscale pores. The two or more nanoscale pores may be circular nanoscale pores having a substantially uniform diameter. The two or more openings in the hard mask may have non-uniform size, and the substantially uniform diameter of the two or more nanopores may be controlled by a size of the carbon nanotubes.
Nanostructure featuring nano-topography with optimized electrical and biochemical properties
A nanostructure includes a base layer including a surface. The nanostructure further includes nano-patterned features including non-random topography located on the surface of the base layer. The nanostructure also includes an encapsulating layer including a conductive material arranged on the nano-patterned features.
THIN METAL FILM ASSEMBLY AND MANUFACTURING METHOD OF THE SAME
A method for manufacturing a thin metal layer assembly includes forming a thin metal layer including nanopatterns on a preliminary substrate. The method includes forming a metal reducing layer by chemically reducing the thin metal layer. The method includes separating the metal reducing layer from the preliminary substrate. The method includes bonding the metal reducing layer to a target substrate.
Method of fluorescent nanodiamonds production
The present invention relates to a fluorescent nanodiamond preparing method including a first operation of preparing nanodiamonds having an average particle diameter of 10 nm or less, a second operation of implanting plasma ions into the nanodiamonds, a third operation of heat-treating the nanodiamonds implanted with the plasma ions under a vacuum or inert gas atmosphere, a fourth operation of oxygen treatment of the heat-treated nanodiamonds under a gas atmosphere including oxygen to oxidize the surfaces of the nanodiamonds, a fifth operation of acid-treating the oxygen-treated nanodiamonds, a sixth operation of centrifuging and cleaning the acid-treated nanodiamonds, and a seventh operation of drying the cleaned nanodiamonds, wherein, in the second operation, the plasma ions are implanted at an incident ion dose of 10.sup.13 ions/cm.sup.2 or more and 10.sup.20 ions/cm.sup.2 or less.