A system for removing particulates of a fissile material includes first and second filtration paths. A first filter and a first valve are disposed in the first filtration path. A second filter and a second valve are disposed in the second filtration path. The first valve and the second valve are configured to switch between a dual open state and a mixed open/closed state. During the dual open state, the first valve and the second valve axe open to permit concurrent flows of the effluent gas through the first and second filtration paths. During the mixed open/closed state, one of the first valve and the second valve is open while the other of the first valve and the second valve is closed to permit the particulates on a corresponding one of the first filter and the second filter to be dislodged by a countercurrent flow of a purging gas.

A system for removing particulates of a fissile material includes first and second filtration paths. A first filter and a first valve are disposed in the first filtration path. A second filter and a second valve are disposed in the second filtration path. The first valve and the second valve are configured to switch between a dual open state and a mixed open/closed state. During the dual open state, the first valve and the second valve axe open to permit concurrent flows of the effluent gas through the first and second filtration paths. During the mixed open/closed state, one of the first valve and the second valve is open while the other of the first valve and the second valve is closed to permit the particulates on a corresponding one of the first filter and the second filter to be dislodged by a countercurrent flow of a purging gas.

Pulse dosing is used to administer a cleaning formulation into a fluid process stream flowing through structural components of a processing facility. The fluid process stream may contain corn, corn-derived products, or a combination thereof, or the fluid process stream may contain a process condensate, a rinse fluid, a cleaning fluid or any combination thereof. The processing facility may be an ethanol processing plant, a protein processing plant, a corn oil processing plant, an ethanol and corn oil processing plant, an ethanol and protein processing plant, or an ethanol, corn oil and protein processing plant. Pulse dosing may include administering the cleaning formulation into the fluid process stream for a period of x seconds every y minutes, with no administration of the cleaning formulation between the periods of x seconds.

Pulse dosing is used to administer a cleaning formulation into a fluid process stream flowing through structural components of a processing facility. The fluid process stream may contain corn, corn-derived products, or a combination thereof, or the fluid process stream may contain a process condensate, a rinse fluid, a cleaning fluid or any combination thereof. The processing facility may be an ethanol processing plant, a protein processing plant, a corn oil processing plant, an ethanol and corn oil processing plant, an ethanol and protein processing plant, or an ethanol, corn oil and protein processing plant. Pulse dosing may include administering the cleaning formulation into the fluid process stream for a period of x seconds every y minutes, with no administration of the cleaning formulation between the periods of x seconds.

A filter cleaning system includes a storage unit that stores liquid that is passed through a filter; a liquid supply path that sends the liquid stored in the storage unit to the filter; a circulation path that returns the liquid sent from the filter to the storage unit; a first supply unit that supplies a first liquid to the storage unit; and a second supply unit that supplies a second liquid having a surface tension lower than that of the first liquid and an affinity for the first liquid, to the storage unit.

A filter cleaning system includes a storage unit that stores liquid that is passed through a filter; a liquid supply path that sends the liquid stored in the storage unit to the filter; a circulation path that returns the liquid sent from the filter to the storage unit; a first supply unit that supplies a first liquid to the storage unit; and a second supply unit that supplies a second liquid having a surface tension lower than that of the first liquid and an affinity for the first liquid, to the storage unit.

A method of controlling the water level in ground in which drainage pipes have been laid, said method comprising: a) providing the ground with water passing through the drainage pipes in a natural way and/or by active intervention using a control system, b) creating an underpressure or overpressure of water and/or air in the drainage pipes by means of the control system, thereby causing water or air to be extracted from or supplied to the soil via the drainage pipes, and c) programming the programmable control system in such a manner that the control system determines the points in time, durations, volumes and/or order of the water supply to the drainage pipes and of the generation of an underpressure or overpressure of water and/or air.

In some embodiments, a system for pre-wetting a filter includes a filter, a piping system, a first gas, a second gas, a first buffer tank, and a second buffer tank. The first gas drives the solvent to clean the filter. The two buffer tanks store the solvent discharged from the filter. The second gas selectively drives the solvent in the first buffer tank to return to the filter and then to be discharged into the second buffer tank. Alternatively, the second gas selectively drives the solvent in the second buffer tank to return to the filter and then to be discharged into the first buffer tank.

Systems and methods for managing debris material in a fluid are described. In examples, the system may include a flow line that directs a fluid into an inlet of a barrel, through the barrel to filter at least some material from the fluid, and out of an outlet of the barrel. The system may also include a backflush line coupled to the flow line between an inlet valve and an inlet of the barrel and between an outlet valve and an outlet of the barrel. In examples, the system includes a pump positioned on the backflush line, where in a backflush mode, the inlet and outlet valves close to isolate the barrel, and the pump circulates the fluid through the backflush line and through the barrel in a reverse direction to move fluid and material from the barrel to a screen overflow assembly.

Systems and methods for managing debris material in a fluid are described. In examples, the system may include a flow line that directs a fluid into an inlet of a barrel, through the barrel to filter at least some material from the fluid, and out of an outlet of the barrel. The system may also include a backflush line coupled to the flow line between an inlet valve and an inlet of the barrel and between an outlet valve and an outlet of the barrel. In examples, the system includes a pump positioned on the backflush line, where in a backflush mode, the inlet and outlet valves close to isolate the barrel, and the pump circulates the fluid through the backflush line and through the barrel in a reverse direction to move fluid and material from the barrel to a screen overflow assembly.