The invention relates to an oil separating device (10) for crankcase ventilation of an internal combustion engine, comprising a carrier (11) comprising a gas inlet line (12) for flowing blow-by gas (13) having an inlet end and an outlet end, and a gap-defining element (15), wherein at least one annular gap (5, 6) is formed or can be formed between the gap-defining element (15) and the outlet end of the gas inlet line (12). A baffle wall (7, 8) is arranged downstream of the annular gap (5, 6). The oil separating device (10) comprises a circumferential wall (18), which surrounds the outer circumference of the gap-defining element (15) and is fixed relative to the carrier (11).

The invention relates to an oil separating device (10) for crankcase ventilation of an internal combustion engine, comprising a carrier (11) comprising a gas inlet line (12) for flowing blow-by gas (13) having an inlet end and an outlet end, and a gap-defining element (15), wherein at least one annular gap (5, 6) is formed or can be formed between the gap-defining element (15) and the outlet end of the gas inlet line (12). A baffle wall (7, 8) is arranged downstream of the annular gap (5, 6). The oil separating device (10) comprises a circumferential wall (18), which surrounds the outer circumference of the gap-defining element (15) and is fixed relative to the carrier (11).

The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.

The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.

Provided is an apparatus for treating waste gas of the electronics industry, and the apparatus includes: a reaction chamber in which an inlet and an outlet are formed and an inner space for purifying waste gas is formed; a first partition plate extending from an inner wall of the reaction chamber facing the inlet in a direction toward the inlet, dividing the inner space into a pre-treatment zone for collecting dust in the waste gas and a remaining purification zone; a second partition plate extending vertically downward from a ceiling of the reaction chamber, dividing the purification zone into a thermal decomposition zone for heating and thermally decomposing waste gas and a post-treatment zone; and a heater installed at the ceiling of the reaction chamber so as to be located in the thermal decomposition zone to thermally decompose a perfluorinated compound by heating waste gas introduced into the thermal decomposition zone; and a dry scrubber unit including one or more catalysts to collect at least one of the dust, a fluorine compound, and nitrous oxide (N2O) in waste gas introduced into the post-treatment zone.

A trap is provided for a vacuum line to be mounted on a pipe connected to a reactor, the trap including: a chamber including an inlet and a bottom wall; an outlet tube in communication with the chamber and including another inlet, the inlet and the outlet tube are configured to be connected to the pipe and to permit passage of a flow of gas to be pumped coming from the reactor; and a deflector between the inlet and the another inlet, the bottom wall being below the another inlet and being an annular cup or an adjustable height cup, and conformed so as to cooperate with the deflector to permit an accumulation of solid elements in the bottom wall when the flow of gas is reduced and to expel the solid elements from the chamber by aerodynamic entrainment when the flow of gas is increased.

A trap is provided for a vacuum line to be mounted on a pipe connected to a reactor, the trap including: a chamber including an inlet and a bottom wall; an outlet tube in communication with the chamber and including another inlet, the inlet and the outlet tube are configured to be connected to the pipe and to permit passage of a flow of gas to be pumped coming from the reactor; and a deflector between the inlet and the another inlet, the bottom wall being below the another inlet and being an annular cup or an adjustable height cup, and conformed so as to cooperate with the deflector to permit an accumulation of solid elements in the bottom wall when the flow of gas is reduced and to expel the solid elements from the chamber by aerodynamic entrainment when the flow of gas is increased.

An apparatus includes a riser reactor within the reaction vessel. The riser reactor defines a longitudinal axis and including a riser reactor inlet at one end and at least one riser reactor outlet at an opposite end. The apparatus includes a separation vessel including at least one separation chamber and at least one collection chamber distributed in an alternating manner about the longitudinal axis. Each separation chamber comprises two vertical lateral walls which also comprise a wall of an adjacent one of the at least one collection chamber. A lateral separation chamber outlet is defined in at least one of the vertical lateral walls to provide fluid and particle communication from the lateral separation chamber to the adjacent one of the at least one collection chamber. The separation vessel includes at least one collection chamber deflector positioned in the at least one collection chamber.

An apparatus includes a riser reactor within the reaction vessel. The riser reactor defines a longitudinal axis and including a riser reactor inlet at one end and at least one riser reactor outlet at an opposite end. The apparatus includes a separation vessel including at least one separation chamber and at least one collection chamber distributed in an alternating manner about the longitudinal axis. Each separation chamber comprises two vertical lateral walls which also comprise a wall of an adjacent one of the at least one collection chamber. A lateral separation chamber outlet is defined in at least one of the vertical lateral walls to provide fluid and particle communication from the lateral separation chamber to the adjacent one of the at least one collection chamber. The separation vessel includes at least one collection chamber deflector positioned in the at least one collection chamber.

A contaminant trap system of a reactor system may comprise a baffle plate stack comprising at least one baffle plate comprising an aperture spanning through a baffle plate body of the baffle plate, and a body portion; and at least one complementary baffle plate comprising a complementary aperture spanning through a complementary baffle plate body of the complementary baffle plate, and a complementary body portion. The at least one baffle plate and the at least one complementary baffle plate may be disposed in a baffle plate order between a first end and a second end of the baffle plate stack in which the baffle plates alternate with the complementary baffle plates, such that no two baffle plates or no two complementary baffle plates are adjacent in the baffle plate order. The at least one baffle plate may comprise a sintered material.