Patent classifications
B01D46/4209
V-BANK FILTER
The present disclosure is directed methods and apparatus of a V-Bank filtration system capable of maintaining desired air flow rates while effectively filtering the air. These methods and apparatus charge particles and then capture those particles in a filter medium. Once captured in the filter medium, micro-organisms are exposed to high energy electric fields that may degrade and ultimately destroy the captured micro-organisms. Electric fields generated within portions of the V-Bank filter apparatus may also be contained within the portions of the filter apparatus based on exterior parts of these portions being grounded at Earth ground potential. Magnetic fields (or electro-magnetic fields) associated with the generated electric fields may also be contained within the portions of the apparatus based on the exterior parts of these portions being grounded.
AIR PURIFICATION FILTER DEVICE USING X-RAY IONIZER
Provided is an air purification filter device using an X-ray ionizer that cleanly filters contaminated air and discharges cleaned air by supplying the contaminated air such as bad odors and fine dust from restaurants, factories, livestock farms, and manufacturing facilities to the device, charging positive or negative ions to contaminated air using an X-ray ionizer, and collecting contaminated air by static electricity in the baffle filter and metal mesh filter using the Coanda Effect.
Filter module for the separation of overspray
A filter module, including a plurality of filter elements for separating overspray from an air flow, the filter module including a reusable and cleanable frame configured as a support structure for components for collecting overspray, and a plurality of components inserted into the frame for collecting overspray, wherein the components for collecting overspray are at least filter elements and linings in the frame, which are configured as disposable, single-use products the filter elements form at least a first filter stage, and all the surfaces of the frame which are exposed to the air flow upstream of the first filter stage are provided with the linings such that the surfaces of the frame are protected against overspray.
FILTER DEVICE FOR ADJUSTING AN ATMOSPHERE WITHIN A MANUFACTURING FACILITY AND MANUFACTURING FACILITY FOR AN ADDITIVE MANUFACTURING PROCESS
The present invention relates to an automatable manufacturing facility FA based on optical interactions, in particular a manufacturing facility for selective laser melting (SLM), and an integrated filter device FV in which, by selective insertion of device elements, both contamination by different particle residues within the manufacturing facility FA can be avoided and a manufacturing atmosphere defined by a homogeneous process gas flow can be formed. Furthermore, the present invention relates to a manufacturing system for automated manufacturing of workpieces by means of irradiation of a material to be processed, which, with the aid of controlled adaptations of the process gas to be introduced into the manufacturing facility FA to the properties of the filter device FV, enables the previously described generation of the manufacturing atmosphere, in particular independently of the manufacturing materials used.