An apparatus for purifying waste gases for an integrated semiconductor is provided, which includes a cover including a burner mounted thereon to generate a flame and a plurality of waste gas inlet pipes formed on a circumference of the burner to make waste gases flow therethrough; a reactor including upper and lower openings formed thereon so that the cover is detachably coupled to the upper opening, a converging member tapered to have a smaller diameter as going toward a lower portion thereof, and a transport pipe vertically arranged to communicate with an apex of the converging member, in which a water curtain is formed to prevent accumulation of by-products, to burn and discharge the inflow waste gases; and a cleaning portion integrally formed in the reactor to water-clean the burnt waste gases that are discharged into the reactor after passing through the transport pipe to collect particles. Since the burner, the reactor, and the scrubber are integrally formed in a body.

The invention relates to a method for removing solids in dust and sulphur oxides from process gases generated in a metallurgical process by a wet process. At least part of basic liquid is fed into the gas flow containing solids in at least one cascade scrubber in order to mix basic liquid with the gases and solids to be cleaned at the latest during the wetting of the gases and solids in the water space of the cascade scrubber, and the mixture containing basic liquid, wetted gases and solids are directed to have a cascade shower in each cascade scrubber in order to remove sulphur and solids from the gases.

A wet-type air cleaner comprises a storage tank, a filter tank, a housing, a gas collecting structure, a turbine, and a plurality of brackets. The storage tank comprises a spray pipe and a water transmission pipe. The filter tank has a top portion, at least two side portions, and a bottom portion, and comprises an air outlet; at least two side covers; a plurality of filter layer; and a sewage pipe. The housing comprises an inlet; a vertical body; a circular body; and a horizontal body having a plurality of pores; reinforcing structure; and at least one outfall. The turbine comprises a power source, wherein the water transmission pipe extends into the filter tank, the spray pipe extends to the inlet of the housing, the circular body is located below the storage tank and above the filter tank, a height of a part of the vertical body overlaps with the height of the plurality of filter layers, and a height of the horizontal body is located below the height of the plurality of filter layer.

An apparatus for purifying waste gases for an integrated semiconductor is provided, which includes a cover including a burner mounted thereon to generate a flame and a plurality of waste gas inlet pipes formed on a circumference of the burner to make waste gases flow therethrough; a reactor including upper and lower openings formed thereon so that the cover is detachably coupled to the upper opening, a converging member tapered to have a smaller diameter as going toward a lower portion thereof, and a transport pipe vertically arranged to communicate with an apex of the converging member, in which a water curtain is formed to prevent accumulation of by-products, to burn and discharge the inflow waste gases; and a cleaning portion integrally formed in the reactor to water-clean the burnt waste gases that are discharged into the reactor after passing through the transport pipe to collect particles. Since the burner, the reactor, and the scrubber are integrally formed in a body.

A fountain is provided. The fountain includes: a drape; a catch basin located below the drape and oriented to catch a fluid flowing at least one of over and through the drape; a conduit fluidly connected to the catch basin forming a circuit to return the fluid in the catch basin to flow at least one of over and through the drape; a pump fluidly connected to the circuit and configured to pump the fluid through the conduit; and at least one of the drape, catch basin, conduit includes surface oriented to contact the fluid and the surface includes at least one of copper and silver.

An exhaust gas treatment apparatus capable of eliminating an adverse effect of a processing gas is disclosed. The exhaust gas treatment apparatus includes a gas treatment reactor having a flow-path forming wall, and a double-pipe structure. The double-pipe structure includes an inner cylinder into which at least a part of the flow-path forming wall is inserted, and an outer cylinder disposed outside the inner cylinder.

A fluid treatment device including: a pipe having an inlet through which fluid is introduced into the pipe from a fluid treatment space, an outlet through which sterilized fluid is discharged to the fluid treatment space, and a flow channel connecting the inlet to the outlet, the pipe providing a sterilization area in the flow channel; a solvent filling at least a portion of the sterilization area; and at least one light source module disposed in the sterilization area, and including a light source to emit sterilizing light and a substrate on which the light source is mounted, in which the fluid introduced through the inlet passes through the solvent towards the outlet, the solvent traps contaminants contained in the fluid when the fluid passes through the solvent, and the light source module sterilizes the solvent with the contaminants trapped therein.