A film forming apparatus according to an embodiment includes a reaction chamber; a first pipe having first end portion and second end portion, the first end portion being connected to the reaction chamber, the first pipe extending in a first direction, and having a first opening area in cross-section perpendicular to the first direction; a second pipe disposed such that the first pipe is provided between the reaction chamber and the second pipe, the second pipe having third end portion and fourth end portion, and the second pipe extending in a second direction different from the first direction; a narrow portion provided in the first pipe and having a second opening area smaller than the first opening area in cross-section perpendicular to the first direction; and a liquid storage portion located on an imaginary straight line extending from a center of the second end portion in the first direction.

An exhaust unit includes a dirty air intake opening, a clean air output opening and an airflow path defined between the dirty air intake opening and the clean air output opening. The exhaust unit further includes an upstream quenching section and a downstream filtering section along the airflow path. The quenching section has a wetting chamber that includes a reservoir having a fill level for a quenching liquid, and a downtube connected over the dirty air intake opening and opening at its end above, and in opposition to, the plane of the fill level.

The present invention is a portable air purifier device intended to be attached to the belt or to the neck of a user. Purified air is generated by electrochemically and magnetically treating a polluted air. Polluted air is forced through an ionized water, which absorbs particles and kills possible air born bacteria. A magnetic filter assures that small metal particles are also separated from the polluted air. The purified air is then delivered towards the face of the user either through an air curtain or through a mask.

A dust collector that collects welding fumes includes: a tank that stores water in a non-full state; a first tower that stands upright from an upper surface of the tank, and is configured to receive air containing the welding fumes from an upper part of the first tower and to guide the air to the tank; a second tower that stands upright from the upper surface of the tank, and is configured such that air discharged from the tank passes through the second tower; a bottleneck structure portion in which a vertically intermediate part of the first tower is narrowed; a mist generator configured to generate mist in the first tower; and a filter housed in the second tower.

A multi-plate scrubber is provided, and more particularly, a multi-plate scrubber including plates having different shapes to purify polluting gas is provided. According to the multi-plate scrubber, the polluting gas is effectively purified by increasing chances of contact between the polluting gas and circulating water by using various plates having different shapes.

A system for chemical compounds collection, deposition and separation in a fluid stream includes: a stack of layers with a number of window openings, allowing the fluid stream to pass through, neighboring layers forming an angle 0<90, the angle and the distance between neighboring layers being variable and controlled, so as to control the velocity of the fluid stream; spreading apertures in between the layers, and adapted to spray liquid chemical solution inside the closed volume, so as to create a thin film on the surfaces of the layers and lateral walls of the closed volume; a system for generating droplets of chemical solution upstream of the stack, to be mixed in the fluid stream; particles of the chemical compounds being collected by impaction with the droplets, and by diffusion on the thin film, and counter flowing with the chemical solution.

A manufacturing apparatus according to an embodiment is a manufacturing apparatus of a semiconductor device or a liquid crystal device including a process chamber discharging exhaust gas, a waste liquid discharger discharging waste liquid including a part of the exhaust gas, a first pipe provided between the process chamber and the waste liquid discharger, having a first opening area in a cross section in a direction perpendicular to a moving direction of the exhaust gas, a second pipe provided between the first pipe and the waste liquid discharger, having a second opening area smaller than the first opening area in a cross section in the direction perpendicular to the moving direction of the exhaust gas, and a third pipe connected to the first pipe, the third pipe supplying a condensing agent having a normal boiling point of equal to or higher than 25 C. to the first pipe.

A waste gas purification system includes a gas container, a gas input unit for intermittent entrance of waste gas into the gas container, a gas output unit for discharge of the waste gas out of the gas container after the waste gas is purified, and a contaminant capturing apparatus disposed in the gas container and including a capture device that purifies the waste gas by using an adhesive to adhere particulate matter in the waste gas. A length of an active time the gas input unit allows for entrance of the waste gas into the gas container does not exceed sixty seconds. A length of a pause time the gas input unit does not allow for entrance of the waste gas into the gas container does not exceed thirty minutes.

An exhaust configuration for a wet scrubber. The exhaust configuration includes a diffuser that is attached to the wet scrubber and which defining an outlet for discharging scrubbed air and paint laden water from the wet scrubber. Attached on lateral sides of the diffuser are wings. The wings extend away from the outlet.

Processes for separating methane from a gas mixture that comprises methane and C.sub.2 gas, including C.sub.2+ gas, and other gases, including CO.sub.2 and H.sub.2S, that are based upon formation of gas hydrates, and systems useful for implementing such processes, are disclosed.