An air purification and recirculation system positioned within an animal rearing/sheltering facility. The system draws untreated air into an elongated air treatment apparatus having a dust scrubbing section, an ammonia scrubbing section, and acid scrubbing section, configured so that the treatment sections are positioned in series. At the end of the air treatment process, the treated air is exhausted back into the animal rearing facility so that the air is circulated within the facility. Acid and water used during the air treatment process are continuously recycled and directed back through the scrubbers in the air treatment apparatus.

A waste water processing system includes an upflow contacting column having a flue gas input for receiving flue gas having a temperature of at least 500 degrees F., a waste water input, and a flue gas output. The waste water input is coupled to a fluid injector, e.g., atomizing nozzles, positioned in the throat of a Venturi portion of the upflow contacting column or in a sidewall of the throat of the Venturi portion of the upflow contacting column. The flue gas in the upflow contacting column has a high velocity, e.g., a gas velocity exceeding 65 fps in the throat of the Venturi portion of the upflow contacting column at a position where the fluid injector is located. Drying additives such as recycled ash, lime, and/or cement may be, and sometimes are, input into the upflow contacting column downstream of the waste water input.

A system comprising a collocated thermal plant, water source, CO.sub.2 source and biomass growth module is disclosed. A method of improving the environment by utilizing the system is disclosed.

The invention provides a process for regenerating a liquid absorbent, comprising: contacting the liquid absorbent with a hydrophobic medium, wherein the liquid absorbent comprises at least one amine of Formula (I) and degradation product thereof comprising at least one imine of Formula (II), wherein each Ar is independently an aromatic group and each R is independently selected from hydrogen, an organyl group and NH.sub.2; and selectively extracting the degradation product into or through the hydrophobic medium.

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The present disclosure relates to systems and methods for separation of sulfurous material(s) from a multi-component feed stream. The systems and methods can comprise contacting the multi-component feed stream with a solvent in a contacting column so that at least a portion of the sulfurous material(s) is transferred from the multi-component feed stream to the solvent. A stream of a substantially purified gas can thus be provided along with a liquid stream comprising at least a majority of the sulfurous material. In particular, the solvent can comprise liquid carbon dioxide, which can be particularly beneficial for removing sulfurous materials from multi-component feed streams.

The use of a composition including at least one acido-basic neutralising agent for decontaminating an atmosphere contaminated by a corrosive gas, the acido-basic neutralising agent having at least 2 pKa's and being characterised by: pKa 1≤pKa 2, pKa 1>2, pKa 2<12, 4<½ (pKa 1+pKa 2)<10 pKa 1, representing the smallest of the basic pKa's and pKa 2 representing the largest of the acidic pKa's. Also, a method for decontaminating an atmosphere contaminated by a corrosive gas comprising the spraying of the neutralising agent, and to a decontamination device.

Provided is a gas-treating device including: an absorption device that receives an absorbent to absorb an acidic compound in a gas to be treated into the absorbent; a release device into which the absorbent having absorbed the acidic compound in the absorption device is introduced; a heater for heating the absorbent in the release device to release the acidic compound contained in the absorbent from the absorbent; and a multi-fluid heat exchanger for heating the absorbent before being supplied from the absorption device to the release device by a fluid containing the acidic compound discharged from the release device and the absorbent before being supplied from the release device to the absorption device.

Systems and methods for removing impurities from exhaust gases produced by semiconductor processing tools, e.g., such as a wet bench, utilize cooled scrubbing fluids and non-random structured packing materials to achieve and enhance removal of acid or alkaline components in the exhaust gas along with an enhanced removal of volatile organic components in the exhaust gas. Removal efficiencies of the acid or alkaline components of greater than 90% and removal efficiencies of the volatile organic components of greater than 70% are described.

A unit for recovering hydrogen chloride from an aqueous liquid which includes hydrogen chloride and is contaminated with compounds of low or no volatility, the unit having an evaporation unit for forming, from the liquid, a vapour which contains hydrogen chloride and a liquid concentrate which is contaminated with the compounds of low or no volatility, a first distillation unit for separating the hydrogen-chloride-containing vapour into a first top product and a first bottom product, and a second distillation unit for separating a hydrogen-chloride-containing aqueous fluid into a second top product and a second bottom product, one of these two distillation units being configured to be able to implement therein a distillation above the ambient pressure, and the other of these two distillation units being configured to be able to implement therein a distillation below the ambient pressure.

A long-effect self-cleaning negative-pressure ejector at least comprises a suction chamber, a jet pipe and a flushing member. A side wall of the suction chamber has at least one suction port for communicating with a first fluid pipeline. An exit port of the jet pipe is disposed in the suction chamber and ejects a second fluid so that a negative pressure is generated in the suction chamber, a first fluid in the first fluid pipeline obliquely enters the suction chamber, and a first included angle is between a direction in which the first fluid being sucked into the suction chamber and an ejection direction of the second fluid. The flushing member optionally provides a third fluid to flush the suction chamber and/or the first fluid pipeline. At least one air jet nozzle is disposed on the first fluid pipeline to inject gas into the first fluid pipeline.