A method for washing a filter is used in a seawater desalination process including a first filtration step for subjecting seawater to microfiltration or ultrafiltration, and a second filtration step for subjecting seawater after the first filtration step to a reverse osmosis treatment. The filter is a microfiltration membrane or ultrafiltration membrane used in the first filtration step. An iron compound is added to seawater in any stage in the washing method. The washing method includes a washing chemical liquid preparation step for preparing washing chemical liquid, and a sticking matter removal step for removing matter sticking to the filter by bringing the filter into contact with washing chemical liquid. In the washing chemical liquid preparation step, seawater after the first filtration step is mixed with at least hydrogen peroxide to prepare washing chemical liquid having an iron compound concentration of 1.50 mmol/L or more in terms of iron atoms.

A solution-type water treatment chemical, includes, as one, gluconic acid (salt) and a surfactant having an HLB determined by the following equation (1) satisfying the following equation (2), wherein in a relationship between concentrations of the gluconic acid (salt) and the surfactant and a molecular weight and HLB of the surfactant, the gluconic acid (salt) and the surfactant are contained such that the water treatment chemical does not form a gel or precipitate.

HLB=( inorganic value/ organic value)10(1)

Molecular weight>34.4HLB+1005(2)

A solution-type water treatment chemical, includes, as one, gluconic acid (salt) and a surfactant having an HLB determined by the following equation (1) satisfying the following equation (2), wherein in a relationship between concentrations of the gluconic acid (salt) and the surfactant and a molecular weight and HLB of the surfactant, the gluconic acid (salt) and the surfactant are contained such that the water treatment chemical does not form a gel or precipitate.

HLB=( inorganic value/ organic value)10(1)

Molecular weight>34.4HLB+1005(2)

An object of the present invention is to provide a chemical liquid purification method by which a chemical liquid capable of inhibiting the occurrence of short in a semiconductor substrate manufactured by a photolithography process is obtained. Another object of the present invention is to provide a chemical liquid manufacturing method and a chemical liquid. The chemical liquid purification method of the present invention includes a purification step of filtering a liquid to be purified by using a filter, in which a filter satisfying a condition 1 or a condition 2 in the following test is used as the filter.

Test: 1,500 ml of a test liquid formed of the organic solvent is brought into contact with the filter for 24 hours under a condition of 23 C., and a content of particles containing at least one kind of metal selected from the group consisting of Fe, Al, Cr, Ni, and Ti in the test liquid after the contact satisfies a predetermined condition.

A hollow fiber membrane filtration device includes a hollow fiber membrane module including a vessel that includes a treated water outlet and a concentrated water outlet, hollow fiber membranes, an upper end fixing member that fixes upper end parts of the hollow fiber membranes, a permeated water chamber that is formed on an upper side of the upper end fixing member, a water conduit through which raw water is supplied into the vessel, and a diffusion tube that is provided on a lower side of the hollow fiber membranes. A plurality of ejection holes are provided on a side peripheral surface of the water conduit. A raw water pipe and gas introduction device are connected with the water conduit. A drainage port is provided at a lower part of the vessel.

A hollow fiber membrane filtration device includes a hollow fiber membrane module including a vessel that includes a treated water outlet and a concentrated water outlet, hollow fiber membranes, an upper end fixing member that fixes upper end parts of the hollow fiber membranes, a permeated water chamber that is formed on an upper side of the upper end fixing member, a water conduit through which raw water is supplied into the vessel, and a diffusion tube that is provided on a lower side of the hollow fiber membranes. A plurality of ejection holes are provided on a side peripheral surface of the water conduit. A raw water pipe and gas introduction device are connected with the water conduit. A drainage port is provided at a lower part of the vessel.

An air filter medium includes a fluororesin porous membrane and a supporting member stacked on top of each other. The air filter medium has a permeability ratio (permeability after disinfection treatment/permeability before disinfection treatment) of 5.0 or less, the permeability ratio being a ratio of permeabilities of the air filter media before and after the disinfection treatment of the fluororesin porous membrane as determined using NaCl particles having a particle size of 0.1 ?m, and a pressure loss ratio (pressure loss after disinfection treatment/pressure loss before disinfection treatment) of 0.83 or more and 1.15 or less, the pressure loss ratio being a ratio of pressure losses of the air filter media before and after the disinfection treatment of the fluororesin porous membrane.

An air filter medium includes a fluororesin porous membrane and a supporting member stacked on top of each other. The air filter medium has a permeability ratio (permeability after disinfection treatment/permeability before disinfection treatment) of 5.0 or less, the permeability ratio being a ratio of permeabilities of the air filter media before and after the disinfection treatment of the fluororesin porous membrane as determined using NaCl particles having a particle size of 0.1 ?m, and a pressure loss ratio (pressure loss after disinfection treatment/pressure loss before disinfection treatment) of 0.83 or more and 1.15 or less, the pressure loss ratio being a ratio of pressure losses of the air filter media before and after the disinfection treatment of the fluororesin porous membrane.

Provided are a cleaning agent and a cleaning liquid that prevent a reduction in the rejection rate of an RO membrane which may occur when the RO membrane is cleaned and a method for cleaning an RO membrane with the cleaning liquid. The agent for cleaning an RO membrane includes a urea derivative. The urea derivative preferably includes urea (H.sub.2NCONH.sub.2) and/or biuret (H.sub.2NCONHCONH.sub.2). The cleaning liquid is an aqueous solution produced by diluting the cleaning agent. The method for cleaning an RO membrane uses the cleaning liquid. Urea and biuret have a structure analogous to amide bonds included in aromatic polyamide RO membranes, and have a strong affinity for amide bond portions. Urea and biuret adsorb onto the amide bond portions, and prevent the amide bonds from being broken by the cleaning liquid.

Provided are a cleaning agent and a cleaning liquid that prevent a reduction in the rejection rate of an RO membrane which may occur when the RO membrane is cleaned and a method for cleaning an RO membrane with the cleaning liquid. The agent for cleaning an RO membrane includes a urea derivative. The urea derivative preferably includes urea (H.sub.2NCONH.sub.2) and/or biuret (H.sub.2NCONHCONH.sub.2). The cleaning liquid is an aqueous solution produced by diluting the cleaning agent. The method for cleaning an RO membrane uses the cleaning liquid. Urea and biuret have a structure analogous to amide bonds included in aromatic polyamide RO membranes, and have a strong affinity for amide bond portions. Urea and biuret adsorb onto the amide bond portions, and prevent the amide bonds from being broken by the cleaning liquid.