A device, such as a wet scrubber for cleaning a stream of gas by removing gaseous, liquid and solid impurities, has a gas inlet and a gas outlet. At the gas inlet there is a first structured packing. A spray-scrubber area with atomizing nozzles is provided above the first structured packing. A first demister is provided for separating larger drops above the spray-scrubber area. A woven fabric is above the first demister, and spray nozzles are arranged around this woven fabric to spray washing liquid in the direction of the gas stream onto the surface of the woven fabric. A final demister is located above the woven fabric and has a demister rinsing apparatus. The device may be used to dispose of industrial waste gases encountered in the semiconductor industry, particularly for the disposal of waste gases stemming from CVD processes in microelectronics production.

A device for capturing particles includes a gas-guiding unit, a gas-guiding unit and a mist-elimination unit. The gas-guiding unit has opposing first and second ends. The mist-elimination unit is disposed at the second end. The liquid-circulation unit, disposed under the mist-elimination unit by surrounding the gas-guiding unit, includes through holes below the gas-guiding unit by a gap. A gas containing particles enters the channel via the first end and then the mist-elimination unit via the second end. While the gas flows into the channel, the liquid in the liquid-circulation unit is inhaled into the channel via the gap to form droplets containing particles. After the droplets are captured by the mist-elimination unit, the liquid formed at the mist-elimination unit flows down into the liquid-circulation unit to reform the liquid to be further inhaled back to the channel of the gas-guiding unit via the gap.

A device for capturing particles includes a gas-guiding unit, a gas-guiding unit and a mist-elimination unit. The gas-guiding unit has opposing first and second ends. The mist-elimination unit is disposed at the second end. The liquid-circulation unit, disposed under the mist-elimination unit by surrounding the gas-guiding unit, includes through holes below the gas-guiding unit by a gap. A gas containing particles enters the channel via the first end and then the mist-elimination unit via the second end. While the gas flows into the channel, the liquid in the liquid-circulation unit is inhaled into the channel via the gap to form droplets containing particles. After the droplets are captured by the mist-elimination unit, the liquid formed at the mist-elimination unit flows down into the liquid-circulation unit to reform the liquid to be further inhaled back to the channel of the gas-guiding unit via the gap.

A cleaner unit of the present invention is intended to be used in a cyclone air cleaner in which the cleaner unit includes a cleaner element and a resin net, wherein the cleaner unit has a cylindrical shape and is configured to cause outside air to swirl around an outer periphery of the cleaner unit and to be introduced through the cleaner element into a hollow part defined inside the element so as to remove dust. The cleaner element has an outer periphery covered by the resin net including an outer periphery part and a plurality of mesh openings, at least the outer periphery part being made of a resin.

An air pollution control unit is configured to bring particle-containing gas and washing liquid into contact with each other to collect particles in the particle-containing gas. The air pollution control unit includes a gas washing column having a gas cleaning section in which the particle-containing gas and the washing liquid are brought into co-current contact with each other, a gas cooling column disposed downstream of the gas washing column along the gas flow and having a gas cooling section in which the particle-containing gas that has been cleaned (cleaned gas) and cooling liquid are brought into countercurrent contact with each other, and a gas communication path.

A combination marine exhaust gas scrubber and ballast disinfection system using seawater/water surrounding a ship to reduce/scrub smoke-stack emissions and produce a disinfected seawater/water for ballast, which can then be periodically or continually discharged back into the seawater/water body without concern for the spread of non-invasive species.

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h).

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h).

An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.

An apparatus and method for wet cleaning a gas stream has a housing with a gas inlet and a gas outlet, wherein, in the housing, there is at least a first washing segment that serves to clean the gas stream with a washing liquid and that is arranged in the flow path of the gas stream. Inside the housing of the apparatus, there is at least one fan that regulates air pressure along the flow path of the gas stream. A bypass channel for bypassing the flow path through the at least one washing segment as well as a regulator that is arranged in the bypass and that serves to discharge the gas stream being conveyed via the bypass channel are arranged inside the housing.