Patent classifications
B01D2251/102
Method for pretreating and recovering a rare gas from a gas contaminant stream exiting an etch chamber
Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.
Method for treating air contaminants in exhaust gas
A provision of assemblies and methods for treating exhaust gases from combustion devices to reduce air contaminants in the exhaust gas. The exhaust from a combustion device is cooled, followed by passing the exhaust through first and second catalytic chambers with an oxygen enrichment means in between the catalytic chambers. The catalytic chambers comprise at least one catalyst that substantially reduces nitrogen oxides or carbon monoxide or both.
Processes and apparatuses for reducing carbon monoxide levels in a gaseous stream
Processes for reducing carbon monoxide levels in a carbon dioxide rich gaseous stream. The carbon dioxide rich stream is passed to a preferential oxidation zone to selectively convert carbon monoxide to carbon dioxide. Excess oxygen is consumed by reacting with hydrogen, which may be added or controlled based on PSA operating conditions upstream of the preferential oxidation zone. The preferential oxidation zone may be contained within a bed of a dryer.
NOVEL METHOD FOR PRETREATING AND RECOVERING A RARE GAS FROM A GAS CONTAMINANT STREAM EXITING AN ETCH CHAMBER
Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.
MIXING NOZZLE AND CONTAMINATED GAS PURIFICATION DEVICE USING MIXING NOZZLE
The mixing nozzle has a throat section, a diffuser section, a gas nozzle section, a first liquid suction port, a liquid nozzle section, a second liquid suction port, a baffle plate, and a jetting port. The first liquid suction port liquidly absorbs the solution in the water storage pool from a side of the gas nozzle section toward the gas nozzle tip. The liquid nozzle section extends to the downstream side of the gas nozzle section with intervening the first liquid suction port. The second liquid suction port liquidly absorbs the solution in the water storage pool from a side of the liquid nozzle section toward the liquid nozzle tip. The baffle plate is provided such that the mixed flow mixed in the diffuser section collides in front of a downstream end of the diffuser section, and divides and reverses the mixed flow.
EXHAUST TREATMENT SYSTEM AND METHOD
An exhaust treatment system includes a dust-removal system. The dust-removal system has an electric field device (1021) and an exhaust cooling device. The electric field device (1021) includes an inlet of the electric field device, an outlet of the electric field device, a dust-removal electric field cathode (10212), and a dust-removal electric field anode (10211), the dust-removal electric field cathode (10212) and the dust-removal electric field anode (10211) being used for generating an ionization dust-removal electric field. The exhaust cooling device is used for reducing an exhaust temperature before the inlet of the electric field device. An exhaust dust-removal system facilitates to reduce greenhouse gas emission, and also facilitates to reduce hazardous gas and pollutant emission, so that gas emission is more environment-friendly.
Apparatus and method for a carbon reduction assembly
A carbon reduction assembly adapted for use with wet and dry coal combustion products (“CCPs”). The assembly includes a direct-fired carbon reduction section having a dry material inlet device that is adapted to receive the dry CCPs and a direct-fired carbon reduction section burner unit that is adapted to reduce carbon content in the dry CCPs. The assembly also includes a direct-fired dryer section that is operatively connected with the direct-fired carbon reduction section and has a wet material inlet device that is adapted to receive the wet CCPs and a direct-fired dryer section drum that is adapted to dry the wet CCPs. The assembly further includes a control unit that is operatively connected with the carbon reduction section and the dryer section. An amount of hot gas generated by the carbon reduction section is conveyed to the dryer section, and the assembly is adapted to produce dry fly ash.
Vacuum pump with abatement function
A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.
Separating sweet gas from a sour gas stream
An oxidation-reduction desulfurization system includes a reactor vessel with sour gas inlet at the bottom and a gas outlet at the top. A primary stage phase separator includes a vertically-oriented pipe with an inlet located inside the reactor vessel. The ratio of the reactor vessel diameter to the pipe inlet diameter is in a range of 2:1 to 5:1. Surface foam and non-gaseous multi-phase mixture including emulsion flow into a partially gas-filled upper section of the vertically-oriented pipe and freefall to a lower level, thereby facilitating mechanical breaking of the foam and the emulsion. A secondary stage phase separator connected to the gas outlet separates non-gaseous surge from sweet gas. Valves and a controller automatically maintain target levels of the non-gaseous multi-phase mixture and non-gaseous surge.
CLAUS UNIT TREATMENT OF SHUTDOWN TAIL GAS
The process for configuring or reconfiguring a sulfur removal plant having a plurality of Claus units that is greater than the number of downstream tail gas treating units (TGTUs) is disclosed. The process allows for the regeneration of one of the Claus units without shutting down any of the downstream TGTUs or the other Claus units. Specifically, the regeneration tail gas can be diverted to the reaction furnace of an in-service Claus unit, thereby allowing excess oxygen to be used to regenerate the Claus unit more efficiently, and without exceeding environmental SO.sub.2 emission requirements.