An exhaust gas treatment apparatus which includes a denitration device, a dust collector, and a desulfurization device in order, respectively, in a flow path of exhaust gas discharged from a boiler, wherein a heavy-metal component removal device is provided in the exhaust gas flow path between the dust collector and the desulfurization device. This device is provided with: an absorption tower including a nozzle which sprays acidic absorption liquid on the exhaust gas, a tank which stores liquid which has absorbed a heavy metal, and a pump which supplies the nozzle with the liquid in the tank; a neutralizing tank which neutralizes the liquid drawn from the absorption tower; and a separator which separates the neutralized liquid into a solid and a liquid component. Since a small amount of heavy metal can be removed in the absorption tower, re-emission of the heavy metal by the desulfurization device is prevented.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A complex malodor removing equipment includes: a neutralizing module which dissolves a portion of malodor-causing substances, in malodorous gas introduced from malodor-producing equipment, in liquid water and removes same, which includes an acidity neutralizing module that introduces an alkaline substance from outside and removes an acidic malodor-causing substance from the malodor-causing substances, and an alkaline neutralizing module that introduces an acidic substance from outside and removes an alkaline malodor-causing substance from the malodor-causing substances, and which connects the acidity neutralizing module and the alkaline neutralizing module; and a balancing module which dissolves the remainder of the malodor-causing substances, in the malodorous gas introduced from the neutralizing module, in water and removes same, which includes an oxidation balancing module that introduces an oxidizing agent from outside and balances the malodor-causing substances, and a reduction balancing module that introduces a reducing agent from outside and balances the malodor-causing substances.

An exhaust gas treatment apparatus which includes a denitration device, a dust collector, and a desulfurization device in order, respectively, in a flow path of exhaust gas discharged from a boiler, wherein a heavy-metal component removal device is provided in the exhaust gas flow path between the dust collector and the desulfurization device. This device is provided with: an absorption tower including a nozzle which sprays acidic absorption liquid on the exhaust gas, a tank which stores liquid which has absorbed a heavy metal, and a pump which supplies the nozzle with the liquid in the tank; a neutralizing tank which neutralizes the liquid drawn from the absorption tower; and a separator which separates the neutralized liquid into a solid and a liquid component. Since a small amount of heavy metal can be removed in the absorption tower, re-emission of the heavy metal by the desulfurization device is prevented.

The present invention provides processes for filtering undesired chemicals in streams of contaminated air for supply to confined areas. The processes provide (1) contacting air with a filter comprising by volume from about 5% to about 95% impregnated zirconium hydroxide, from about 5% to about 95% activated impregnated carbon, and optionally, up to about 50% ammonia removal material; and (2) supplying the contacted air to a confined area.

Systems and methods of preventing an event occurrence or mitigating effects of an event occurrence in an industrial facility are disclosed herein. In some embodiments, a first input is received from a first sensor and, based at least in part on the first input, an initial action is automatically generated. In response to the initial action, a second input is received from a second sensor and, based at least in part of the received first and second inputs, a likelihood of an event occurrence is determined. Based at least in part of the determined likelihood, a remedial action configured to prevent the occurrence of the event occurrence is automatically generated. In some embodiments, the remedial action is generated in real-time and can be directed to a process condition, environmental condition, or secondary source.

The invention relates to a process for the treatment of a gas stream comprising hydrochloric acid, hydrofluoric acid and fluorinated/oxygenated compounds, in which the gas stream is successively subjected to: a stage of catalytic hydrolysis; a stage of washing with an acid solution; a stage of adsorption of impurities by active charcoal; a stage of adiabatic or isothermal absorption of the hydrochloric acid in an aqueous solution, making it possible to collect hydrochloric acid solution.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

The invention relates to a process for the treatment of a gas stream comprising hydrochloric acid, hydrofluoric acid and fluorinated/oxygenated compounds, in which the gas stream is successively subjected to: a stage of catalytic hydrolysis; a stage of washing with an acid solution; a stage of adsorption of impurities by active charcoal; a stage of adiabatic or isothermal absorption of the hydrochloric acid in an aqueous solution, making it possible to collect hydrochloric acid solution.