B01D2252/103

MICROWAVE PLASMA SYSTEM FOR EFFICIENTLY PRODUCING NITRIC ACID AND NITROGEN FERTILIZERS

A microwave-plasma system for generating fixed-nitrogen products comprises a microwave generator operably coupled with a gas chamber where the microwave generator provides microwave power to the gas chamber. The system further includes a source of gas, which may be for example oxygen, nitrogen and/or air, operably coupled with the plasma chamber. The microwave power produces a plasma of the gas within the chamber. The system further includes an absorber unit fluidically connected to the gas chamber to capture product from the plasma in the gas chamber. The captured product may include fixed nitrogen gaseous products.

Using Carbon Dioxide From A Direct Air Capture System As A Low Global Warming Car And Industrial Refrigerant

An apparatus includes a captured carbon dioxide input. The captured carbon dioxide input is coupled to receive captured carbon dioxide from a direct air capture system. The apparatus uses the captured carbon dioxide as a low global warming refrigerant to provide cooling functionality in automotive, commercial, and industrial applications, or other operations involving low global warming refrigerants. In various embodiments, the apparatus is a refrigeration apparatus or a heat pump apparatus. Low global warming carbon dioxide refrigerant is natural, non-toxic, non-flammable, and abundant when obtained from a direct air capture system. Moreover, carbon dioxide refrigerant has a high heat transfer coefficient and has a global warming potential (GWP) of one. Carbon dioxide refrigerant is a more sustainable and efficient coolant option than common refrigerants, such as R22, R152, R404a, and R1234yf refrigerants.

System and methods for carbon dioxide capture and recovery

Disclosed are methods and systems for capturing carbon dioxide (CO.sub.2) from an input gas stream (e.g., flue gas from a combustion process). In particular, the system includes a CO.sub.2 absorption module that directs supersaturated CO.sub.2 process water to a CO.sub.2 recovery process. The CO.sub.2 recovery process includes a sparging seal vessel, followed by an agitator, followed by a stripper unit, followed by an outgassing tank, and lastly a membrane separator, configured to outgas CO.sub.2 from the supersaturated process water and direct the gaseous CO.sub.2 into a CO.sub.2 collection header.

REACTOR APPARATUS

A reactor apparatus, includes: a reactor chamber having an inlet through which treatment liquid containing by-products is introduced and having an interior space; a burner at a lower end portion of the reactor chamber to burn waste gas; a guide member above the burner and configured to allow the treatment liquid to flow outwardly of the burner; a water reservoir between the burner and the guide member, the water reservoir having a double pipe structure having an inner wall portion and an outer wall portion, and through which water supplied through a water inlet is configured to flow between the inner wall portion and the outer wall portion; and a cover member coupled to an upper end portion of the water reservoir and configured to cover a space between the inner wall portion and the outer wall portion, wherein an upper end of the outer wall portion is above an upper end of the inner wall portion, wherein a plurality of bumps are on a bottom surface of the cover member spaced apart from each other in a circumferential direction, the plurality of bumps configured to form a gap of several hundred pm between the bottom surface of the cover member and an upper surface of the inner wall portion of the water reservoir.

SPRAY APPARATUS FOR IMPROVING PERFORMANCE OF RECTANGULAR-SHAPED SCRUBBER
20220410180 · 2022-12-29 ·

The present disclosure relates to a spray apparatus for improving the performance of a rectangular-shaped scrubber which may efficiently remove harmful substances in a gas by mounting an injector for spraying a liquid in a rectangular pyramid shape on a scrubber having a rectangular shape. The spray apparatus includes: a scrubber having a rectangular shape; and an injector mounted on the scrubber and including a spray nozzle configured to spray a liquid in a rectangular pyramid shape.

PRODUCTION METHOD FOR HIGH-PURITY HYDROGEN CHLORIDE GAS

A method for producing a high-purity hydrogen chloride gas comprises performing a purification process that includes the steps 1) to 3) below on a byproduct hydrogen chloride gas: 1) a crude hydrochloric acid generation step of allowing water to absorb the byproduct hydrogen chloride gas; 2) a volatile organic impurity-removed hydrochloric acid generation step of bringing the crude hydrochloric acid obtained in the step 1) into contact with an inert gas at a liquid temperature of 20 to 45° C. to dissipate volatile organic impurities; and 3) a high-purity hydrogen chloride gas generation step of supplying the volatile organic impurity-removed hydrochloric acid obtained in the step 2) to a distillation column and performing distillation under conditions of a column bottom temperature of higher than 60° C. and 108° C. or lower and a column top temperature of 60° C. or lower to distill out a high-purity hydrogen chloride gas.

CHEMICAL COMPOSITIONS AND METHODS OF USING SAME FOR REMEDIATING SULFUR-CONTAINING COMPOSITIONS AND OTHER CONTAMINANTS IN FLUIDS
20220411701 · 2022-12-29 ·

A treatment process for remediating; contaminants in a mixture of contaminated fluids, including at least one liquid fluid and at least one gaseous fluid, includes the steps of: preparing a treatment composition containing at least 80 volume % of an aqueous solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent, and at least one organic acid selected from the group consisting of fulvic acid and humic acid at a collective concentration of 0.1-5 wt % of the treatment composition; adding a dosage of the treatment composition to a mixture of contaminated fluids including a liquid portion and a gaseous portion; and allowing the treatment composition to react with the mixture of contaminated fluids for at least 10 minutes. A pH of the treatment composition is at least 12.0

Method for ammonium-enhanced flue gas desulfurization by using red mud slurry

The present invention discloses a method for ammonium-enhanced flue gas desulfurization (FGD) by using red mud slurry. The method specifically includes: crushing red mud, sieving the crushed red mud, slurrying the red mud, conducting aeration treatment, adding an ammonium salt and/or ammonia, and conducting natural sedimentation to obtain pretreated red mud slurry and pretreated red mud liquor; adding an ammonium salt and/or ammonia to the slurry, adding water and conducting uniform mixing, conducting pre-FGD, conducting deep desulfurization on treated flue gas by using the pretreated red mud liquor, and directly discharging desulfurized flue gas; and charging the pretreated red mud slurry and the pretreated red mud liquor obtained after the treatment to a replacement tank below, adding lime milk to the replacement tank, conducting stirring and natural sedimentation, conducting soilization on subnatant thick red mud slurry, and refluxing the supernatant to a red mud aeration tank.

Powder Removing Apparatus Using Screw Cylinder for Gas Processing Facility
20220402001 · 2022-12-22 ·

Proposed is a powder removing apparatus using a screw cylinder for a gas processing facility, in which the powder removing apparatus has a structure in which a scraper is coupled to the screw cylinder that allows a piston rod to be moved forward while being rotated in one direction and to be moved backward while being rotated in a reverse direction according to a supply direction of fluid, thereby allowing the powder adhered to an inner circumferential surface of a pipeline of the gas processing facility or an inner wall surface of the gas processing facility to be easily and efficiently removed. According to an embodiment of the present disclosure, the powder removing apparatus includes the screw cylinder and a scraper.

GAS PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
20220395776 · 2022-12-15 ·

A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate. The gas passing through the flow path is brought into contact with the dissolving liquid retained in the partition plate.