A method for the destruction of a target gas, the method including: a) compressing at a first pressure a mixture of air and target gas to produce a compressed target gas mixture; b) destroying the target gas by combusting the compressed target gas mixture with diesel fuel in a forced-induction internal combustion engine, at a combustion pressure greater than the first pressure in the turbocharger, to produce an oxidised exhaust gas, the combustion occurring while maintaining a load on the diesel engine with a load bank; and c) processing the oxidised exhaust gas to produce a vent gas for venting to atmosphere where the vent gas includes substantially no target gas.

A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.

The present disclosure generally relates to systems and methods for the combustive abatement of waste gas formed during the manufacture of semiconductor wafers. In particular, the systems described herein are capable of combusting air-polluting perfluorocarbons, including those having high greenhouse gas indexes such as hexafluoroethane (C.sub.2F.sub.6) and tetrafluoromethane (CF.sub.4), as well as particulate-forming silicon dioxide precursors, such as silane (SiH.sub.4) and tetraethoxysilane (Si(OC.sub.2H.sub.5).sub.4, abbreviated TEOS), with greater efficiency and lower energy usage than prior abatement systems. More particularly, and in one preferred embodiment, the present disclosure is directed to a waste gas abatement system that utilizes a combination of non-combustible and combustible gases (or gas mixtures) for thermal combustion, which are directed through multiple permeable interior surfaces of a reaction chamber, efficiently combusting waste gas and preventing undesirable accumulation of solid particulate matter on the chamber surfaces.

A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamberand a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.

The invention relates to a method for preparing a solid comprising a step of mixing a set of compounds comprising at least two Cu.sub.2(OH).sub.2CO.sub.3 powders of different particle sizes and at least one binder and the use of the solid prepared by means of this method.

According to one embodiment, a silicon-containing product forming apparatus includes a reaction chamber, an emission path, a process liquid tank, a supplier, and a flow path switcher. The emission path emits an emission material from the reaction chamber. The supplier includes a supply line configured to supply a process liquid to the emission path from the process liquid tank, and a byproduct generated by reaction is treated in the emission path by the supplied process liquid. The flow path switcher switches the communication state of the emission path with each of the reaction chamber and the supply line of the supplier.

The present invention discloses a preparation method of a catalyst with white carbon black modified by ZrNdO and use thereof, and belongs to the field of catalyst technologies. In the present invention, an organic solvent evaporation induced self-assembly method is used to load ZrNdO onto white carbon black to obtain a mesoporous ZrNdO/white carbon black catalyst. The mesoporous ZrNdO/white carbon black catalyst in the present invention has high catalytic activity, contains uniformly distributed mesopores with a relatively large average aperture, and has a simple preparation process, etc.

Venturi Scrubbers are used to separate particulate from a large range of fluids. Many provide additional liquid and/or gas to drive the fluid and aid in the removal of particulate. The present invention provides a liquid ring pump through which the fluid to be treated is first passed and then exhausted, with additional work fluid to a Venturi scrubber such that the particulate can be separated from the exhaust fluid.

The present disclosure generally relates to systems and methods for the combustive abatement of waste gas formed during the manufacture of semiconductor wafers. In particular, the systems described herein are capable of combusting air-polluting perfluorocarbons, including those having high greenhouse gas indexes such as hexafluoroethane (C.sub.2F.sub.6) and tetrafluoromethane (CF.sub.4), as well as particulate-forming silicon dioxide precursors, such as silane (SiH.sub.4) and tetraethoxysilane (Si(OC.sub.2H.sub.5).sub.4, abbreviated TEOS), with greater efficiency and lower energy usage than prior abatement systems. More particularly, and in one preferred embodiment, the present disclosure is directed to a waste gas abatement system that utilizes a combination of non-combustible and combustible gases (or gas mixtures) for thermal combustion, which are directed through multiple permeable interior surfaces of a reaction chamber, efficiently combusting waste gas and preventing undesirable accumulation of solid particulate matter on the chamber surfaces.

A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamberand a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.