Patent classifications
B01D2257/556
MATERIALS, METHODS, AND DEVICES FOR SILOXANE CONTAMINANT REMOVAL
Adsorbent materials are disclosed, along with filter elements containing the adsorbent materials methods of using adsorbents to remove slioxane contaminants from a gas stream. The method includes providing an adsorbent material that has been washed with an acid and passing a gas through the adsorbent material so as to reduce siloxane levels in the gas. A filter element for reducing siloxane levels in a gas includes a first adsorbent material, the first adsorbent material comprising an acid-washed adsorbent; and a second adsorbent material, the second adsorbent material comprising an acid-impregnated adsorbent.
DISTRIBUTED CONTAMINANT REMOVAL USING LIQUID SORBENT
A contaminant removal system includes a contaminant desorption system and two or more contaminant sorption systems. The contaminant desorption system includes at least one stripper configured to desorb one or more contaminants from a liquid sorbent. The one or more contaminants include at least carbon dioxide. Each contaminant sorption system includes at least one scrubber and a liquid sorbent circuit. Each scrubber is configured to absorb the one or more contaminants from an air stream into the liquid sorbent. The liquid sorbent circuit is configured to circulate the liquid sorbent between the at least one scrubber and the at least one stripper of the contaminant desorption system.
PROCESS AND EQUIPMENT FOR CONDUCTING RESEARCH ON ADSORPTION OF COMPOUNDS TO SOLIDS
Apparatus for conducting research on adsorption properties of particulate solid adsorption materials for an adsorbate in at least two parallel adsorption beds, and method of using such. The apparatus contains multiple parallel beds of adsorbent, of a comparatively small volume between 0.1 to 10 ml, which are connected to two feeds via a splitter for each feed and capillaries downstream of the splitter and upstream of the adsorption bed. The invention further relates to a method using such apparatus.
Cyclohexasilane
High purity cyclohexasilane and a method for increasing the purification efficiency thereto are provided. The method for producing cyclohexasilane of the present invention is characterized in that, in distilling crude cyclohexasilane to obtain purified cyclohexasilane, the absolute pressure during distillation is set to 2 kPa or less, and the heating temperature of crude cyclohexasilane is set to 25 to 100 C. The cyclohexasilane of the present invention contains pure cyclohexasilane at a rate of 98% by mass or more and 100% by mass or less.
PLASMA ABATEMENT OF COMPOUNDS CONTAINING HEAVY ATOMS
A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.
VERSATILE SCRUBBING LIQUID FOR REMOVAL OF CONTAMINANTS FROM A GASEOUS STREAM
Bi-phasic compositions of water-immiscible ionic liquid and aqueous phase for application as versatile scrubbing liquid suitable for decontamination of a contaminated gaseous stream from a variety of contaminants are disclosed. It is currently believed that halogen-assisted catalytic-like oxidation of the contaminants by readily available oxidants in the bi-phasic compositions allows effective decontamination of the gaseous stream.
SILOXANE REMOVAL SYSTEM AND MEDIA REGENERATION METHODS
A method of removing impurities from a gas including the steps of removing impurities from biogas comprising at least one adsorbents via a process vessel or reactor, directing the purified gas to an device to generate power and/or heat, regenerating the saturated adsorption media with the waste heat recovered from the engine exhaust and directing the regeneration gas (hot air or engine exhaust) to flare, engine exhaust stack, or atmosphere.
CYCLOHEXASILANE AND METHOD FOR PRODUCING THE SAME
High purity cyclohexasilane and a method for increasing the purification efficiency thereto are provided. The method for producing cyclohexasilane of the present invention is characterized in that, in distilling crude cyclohexasilane to obtain purified cyclohexasilane, the absolute pressure during distillation is set to 2 kPa or less, and the heating temperature of crude cyclohexasilane is set to 25 to 100 C. The cyclohexasilane of the present invention contains pure cyclohexasilane at a rate of 98% by mass or more and 100% by mass or less.
Plasma abatement of compounds containing heavy atoms
A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEMENT SYSTEM, AND VACUUM PROCESSING SYSTEM
Embodiments disclosed herein include a method for abating compounds produced in semiconductor processes. The method includes energizing an abating agent, forming a composition by reacting the energized abating agent with gases exiting a vacuum processing chamber, and flowing the composition through a plurality of holes formed in a cooling plate. By cooling the composition with the cooling plate, damages on the downstream pump are avoided.