A method of removing impurities from a gas including the steps of removing impurities from biogas comprising at least one adsorbents via a process vessel or reactor, directing the purified gas to an device to generate power and/or heat, regenerating the saturated adsorption media with the waste heat recovered from the engine exhaust and directing the regeneration gas (hot air or engine exhaust) to flare, engine exhaust stack, or atmosphere.

An aircraft pressurized air system and method is disclosed. The system includes a compressor that receives and compresses outside air, and an air cycle machine that receives compressed air from the compressor and directs conditioned air to an aircraft pressurized zone. The system also includes a contaminant sensor disposed along an air flow path between the compressor and the aircraft pressurized zone, comprising an optical guide, a metal organic framework on an exterior surface of the optical guide in operative fluid communication with air from the air flow path, a light source in communication with the optical guide at a first end of the optical guide, and a light detector in communication with the optical guide at a second end of the optical guide.

The filter of a gas sensor comprises an inorganic porous support supporting both an organic sulfonic acid compound including sulfo group (SO3H) and a Lewis acid having at least a metal element of transitional metal elements, Al element, Ga element, In element, Ge element, and Sn element. The Lewis acid loaded in the inorganic porous support adsorbs low concentration siloxanes. The organic sulfonic acid compound including sulfo group polymerizes adsorbed siloxanes in the filter so as not to desorb from the filter.

The present invention relates to a process for trapping silicon compounds in a gaseous or liquid feedstock, comprising bringing the feedstock into contact with a trapping mass with a liquid hourly space velocity LHSV of less than 5 h.sup.1 or a gas hourly space velocity GHSV of less than 500 h.sup.1.

A reheating collection device for a gas phase process is provided with a container elongated in an axial direction along an axis to define a chamber, an inflow path and an exhaust path respectively in communication with the chamber and apart in the axial direction from each other, and a heater heating the chamber between the inflow path and the exhaust path.

Disclosed herein are systems and methods for regenerating media in a siloxane removal system. In particular, the present disclosure relates to a method for regenerating an adsorption medium, comprising receiving a source gas stream comprising at least one hydrocarbon and carbon dioxide; separating the source gas stream into a carbon dioxide-rich gas stream, and a substantially carbon dioxide-free gas stream; directing the carbon dioxide-rich gas stream into a regeneration vessel containing an adsorption medium having one or more adsorbed impurities on the adsorption medium; desorbing impurities from the adsorption medium by contacting the adsorption medium with the carbon dioxide-rich gas stream to generate a carbon dioxide-rich gas containing desorbed impurities and a regenerated adsorption medium; and directing the carbon dioxide-rich gas stream containing desorbed impurities out of the regeneration vessel.

A process for combined removal of siloxanes and sulfur-containing compounds from biogas streams, such as streams from landfills or anaerobic digesters, comprises heating the biogas stream and optionally mixing it with air, feeding the gas to a first filter unit with high temperature resistance, injecting a dry sorbent into the first filter unit to capture siloxanes present in the gas, recycling part of the exit gas from the first filter unit to the inlet thereof for the sulfur-containing compounds to be captured by the dry sorbent or optionally to a second filter unit inlet for the sulfur-containing compounds to be captured by a sulfur-specific sorbent and recovering clean gas from the first or optionally from the second filter unit.

A method for removing solvent from a solvent containing sweep gas stream obtained from a fertilizer coating process is disclosed. The method can include directly contacting the solvent containing sweep gas stream with an aqueous composition comprising 50% wt/wt to 100% wt/wt of water, condensing at least a portion of the solvent out of the solvent containing sweep gas stream into the aqueous composition to produce a solvent-enriched aqueous composition and a recovered sweep gas stream, and removing the recovered sweep gas stream from the solvent-enriched aqueous composition.

Embodiments disclosed herein include an abatement system and method for abating compounds produced in semiconductor processes. The abatement system includes a remote plasma source for generating an oxidizing plasma for treating exhaust gases from a deposition process performed in the processing chamber, the treatment assisting with the trapping particles in an exhaust cooling apparatus. The remote plasma source then generates a cleaning plasma for treating exhaust gases from a cleaning process performed in the processing chamber, the cleaning plasma reacting with the trapped particles in the exhaust cooling apparatus and cleaning the exhaust cooling apparatus.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.