An abatement system for pyrophoric chemicals where the materials are captured or controlled by a hazard volume and fed to a vaporizer in an oxygen deprived environment. Materials are heated until vaporized while mixed with nitrogen. The mixture exits the system through a reaction column. The system is monitored by oxygen sensors, smoke detectors and temperature sensors.

The present invention provides an energy-efficient method and apparatus that can achieve exhaust gas abatement with a minimum use of diluent nitrogen gas. More specifically, the present invention is directed to a method and apparatus for exhaust gas abatement under reduced pressure, in which an exhaust gas supplied from an exhaust gas source via a vacuum pump is decomposed by heat of a high-temperature plasma under a reduced pressure.

Provided is an apparatus for treating waste gas of the electronics industry, and the apparatus includes: a reaction chamber in which an inlet and an outlet are formed and an inner space for purifying waste gas is formed; a first partition plate extending from an inner wall of the reaction chamber facing the inlet in a direction toward the inlet, dividing the inner space into a pre-treatment zone for collecting dust in the waste gas and a remaining purification zone; a second partition plate extending vertically downward from a ceiling of the reaction chamber, dividing the purification zone into a thermal decomposition zone for heating and thermally decomposing waste gas and a post-treatment zone; and a heater installed at the ceiling of the reaction chamber so as to be located in the thermal decomposition zone to thermally decompose a perfluorinated compound by heating waste gas introduced into the thermal decomposition zone; and a dry scrubber unit including one or more catalysts to collect at least one of the dust, a fluorine compound, and nitrous oxide (N2O) in waste gas introduced into the post-treatment zone.

An apparatus and method for wet cleaning a gas stream has a housing with a gas inlet and a gas outlet, wherein, in the housing, there is at least a first washing segment that serves to clean the gas stream with a washing liquid and that is arranged in the flow path of the gas stream. Inside the housing of the apparatus, there is at least one fan that regulates air pressure along the flow path of the gas stream. A bypass channel for bypassing the flow path through the at least one washing segment as well as a regulator that is arranged in the bypass and that serves to discharge the gas stream being conveyed via the bypass channel are arranged inside the housing.

A method of optimising operating conditions in an abatement apparatus configured to treat an effluent stream from a processing tool and an abatement apparatus are disclosed. The method of optimising operating conditions in an abatement apparatus configured to treat an effluent stream containing PFC from a processing tool comprise: changing an operating parameter which controls an operating condition of the abatement apparatus; determining a change in a PFC concentration present in an exhaust stream of the abatement apparatus; and determining whether to retain the operating parameter based on the change in the PFC concentration. In this way, the concentration of PFC present in the exhaust can be used to determine whether the abatement apparatus is operating under the correct operating conditions or not.

An object of the present invention is to provide a new frameless catalytic thermal oxidation device capable of treating concentrations of harmful materials including NOx at a low temperature. Further, another object of the present invention is to provide a frameless catalytic thermal oxidation device capable of minimizing the occurrence of THC and minimizing a risk of accidents and environmental pollution which may occur in maintenance operations. According to the objects, the present invention provides a cartridge-type thermal oxidation device capable of being separated for maintenance, wherein a cartridge internal structure is configured so that the time while the material to be treated stays in a zone with the catalyst is increased, and a member capable of dropping and collecting powder generated by thermal oxidation reaction is configured.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

A gas trap system for metal organic chemical vapor deposition (MOCVD) exhaust abatement operations is provided. The gas trap system may include a housing including an inlet configured to receive exhaust gas and an outlet. The gas trap system may also include a conical inlet shield positioned within the housing. The conical inlet shield may form a first path between the housing and the conical inlet shield, wherein the first path receives the exhaust gas from the inlet. The conical inlet shield may also cool the exhaust gas and cause the exhaust gas to be uniformly distributed in the first path. The gas trap system may also include a filter configured to receive the exhaust gas from the first path and to filter the exhaust gas, wherein the filtered gas exhaust is provided to the outlet.

A VOC removal system removes VOCs from an exhaust fluid of a semiconductor process. The VOC removal system measures current VOC removal parameters and passes them to an analysis model trained with a machine learning process. The analysis model predicts a future VOC removal efficiency based on the current VOC removal parameters. The analysis model generates adjustment parameters based on the current VOC removal parameters and the predicted future VOC removal efficiency. A control system adjusts the VOC removal system based on the adjustment parameters.

Described are methods, devices, and systems useful for removing gaseous ammonia from a gas mixture at a pressure in an ambient pressure range by allowing the ammonia to adsorb onto a solid adsorbent, as well as related systems and methods.