Patent classifications
B01D2259/40003
Integrated Air Inlet and Outlet Valve and Pressure Swing Adsorption Air Path System
An integrated air inlet and outlet valve and a pressure swing adsorption air path system including the same are disclosed. The integrated air inlet and outlet valve includes a valve body with an air inlet, an air outlet, an exhaust port, a first blowback air inlet and two air path control units. The air path control unit includes a first air inlet and outlet port connected with the air outlet through a first one-way valve and a second air inlet and outlet port selectively communicated with the air inlet or the exhaust port through a first control valve, the exhaust port is provided with an on-off control mechanism, the first blowback air inlet is respectively connected with the first air inlet and outlet port of each air path control unit through a second one-way valve, and the valve body is further provided with a pressure equalization control assembly.
Three-product pressure swing adsorption system
A three-product PSA system which produces three product streams from a feed gas mixture comprising a light key component, at least one heavy key component, and at least one intermediate key component is described. The three-product PSA system produces a high pressure product stream enriched in the light key component, a low pressure tail gas stream enriched in the at least one heavy key component, and an intermediate pressure vent gas stream enriched in the at least one intermediate key component.
Integrated Air Inlet and Outlet Valve and Pressure Swing Adsorption Air Path System
An integrated air inlet and outlet valve and a pressure swing adsorption air path system including the integrated air inlet and outlet valve are disclosed. The integrated air inlet and outlet valve includes a valve body, the valve body is provided with an air inlet, an air outlet, an exhaust port and two air path control units, the air path control unit includes a first air inlet and outlet port, a second air inlet and outlet port, a first control valve, a second control valve and a connecting channel, the second air inlet and outlet port is connected with the air outlet through a one-way valve which enables air to flow to the air outlet in one direction only, and the second air inlet and outlet ports of the two air path control units are connected through a throttle valve.
GAS LASER APPARATUS
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
GAS LASER APPARATUS
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
GAS LASER APPARATUS
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
GAS LASER APPARATUS
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
Apparatus and system for swing adsorption processes related thereto
Provided are apparatus and systems for performing a swing adsorption process. This swing adsorption process may involve passing streams through adsorbent bed units to treat the feed stream to remove certain contaminants from the stream. In the method and system, active valves may be used with passive valves to manage the flow of the streams through the adsorbent bed units.
GAS LASER APPARATUS
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
ADSORPTION COLUMN SET FOR SEPARATING TWO OR MORE GASES OF A GAS MIXTURE FROM EACH OTHER USING PRESSURE SWING ADSORPTION
The invention relates to a set for separating two or more gases from each other, including: a first adsorption column set comprising at least two columns in series; an optional number of additional column sets comprising additional columns; connectors connecting each parallel additional column to the column; auxiliary equipment feeding a gas mixture to the columns and additional columns jointly and discharging separated gases according to pressure swing adsorption.