Patent classifications
B01D2259/818
EXHAUST GAS TREATMENT SYSTEM AND METHOD WITH NON-THERMAL PLASMA GENERATOR
An exhaust gas treatment system for an internal combustion engine includes an exhaust gas pathway configured to receive exhaust gas from the internal combustion engine and a non-thermal plasma generator positioned in the exhaust gas pathway. The non-thermal plasma generator is configured to increase a proportion of nitrogen dioxide in the exhaust gas. The system also includes a first treatment element positioned in the exhaust gas pathway downstream of the non-thermal plasma generator and a second treatment element positioned in the exhaust gas pathway downstream of the first treatment element. At least one of the first treatment element or the second treatment element includes a combined selective catalytic reduction and diesel particulate filter (SCR+F) element.
Multifunctional microwave plasma and ultraviolet light deodorization treatment device
A multifunctional microwave plasma and ultraviolet light deodorization treatment unit, which includes: a rapid decomposition device (1), a high frequency plasma electric field (2), a microwave plasma electric field (3), a high intensity ultraviolet radiation field (4), a low temperature plasma electric field (5), a high intensity ozone gas reaction chamber (6), a reaction termination chamber (7) and a clean gas organization chamber (8) sequentially installed inside a horizontal rectangular box which has an elongated body defining a horizontal axis and has a channel cavity therein. The deodorization treatment unit further includes an exhaust gas odor collecting pipe and an odor gas storage cabinet (9) connected to an air pump (10), the air pump (10) is connected to an odor gas inlet of the rapid decomposition device (1), the clean gas organization chamber (8) has one end connected to a clean gas exhaust pipe.
Isolated Plasma Array Treatment Systems
Systems, methods, and apparatus are contemplated in which a tube cell that produces a dielectric barrier discharge (DBD) is individually configured to minimize the mixing of unwanted byproducts of the generated plasma with an exhaust air stream. The tube cell generates a DBD within a tube cell, such that oxidants or radicals are generated in an environment substantially separated from the exhaust stream. The generated oxidants are directed to intersect with the exhaust stream to minimize the generation of unwanted byproducts. The tube cells are further shaped and arranged in tube cell arrays to alter the flow dynamics of the exhaust stream and the oxidant or radical streams, including mixing of the streams.
Exhaust pipe device
An exhaust pipe device according to an embodiment includes a dielectric pipe; a radio-frequency electrode; a ground electrode; and a plasma generation circuit. The radio-frequency electrode is disposed on an outer periphery side of the dielectric pipe and a radio-frequency voltage is applied to the radio-frequency electrode. The ground electrode is disposed on an end portion side of the dielectric pipe such that a distance from the radio-frequency electrode is smaller on an inner side than on an outer side of the dielectric pipe, and a ground potential is applied to the ground electrode. The plasma generation circuit generates plasma inside the dielectric pipe. The exhaust pipe device functions as a part of an exhaust pipe disposed between a film forming chamber and a vacuum pump that exhausts gas inside the film forming chamber.
EMITTER FOR DISSOCIATING GAS MOLECULES USING NON-LINEAR QUANTUM DISSONANCE
This disclosure relates generally to an emitter for dissociating exhaust gases on a molecular level into their respective elemental constituents. The emitter includes a palladium plated anode and a cathode, at least a portion of which is palladium plated. When properly powered, the emitters create a non-linear quantum dissonance field to dissociate molecules in exhaust.
NON-THERMAL MULTIPLE PLASMA GATE DEVICES
A plasma gate device comprises a plasma creation chamber, first through fourth dielectrics, and first through sixth electrodes. The plasma creation chamber is a space in which plasma is created from a first fluid and a second fluid. The first and second dielectrics form upper and lower boundaries on a first side of the plasma creation chamber. The third and fourth dielectrics form upper and lower boundaries on a second side of the plasma creation chamber. The first and second electrodes receive voltages to generate a first electric field which creates a first plasma on the first side of the plasma creation chamber. The third and fourth electrodes receive voltages to generate a second electric field which creates a second plasma on the second side of the plasma creation chamber. The fifth electrode extracts electrons from the first plasma. The sixth electrode injects electrons into the second plasma.
Triphase Organic Matter Pyrolysis System and its Atmospheric Pressure Water Ion Generating Device
A triphase organic matter pyrolysis system includes multiple devices cooperating with each other. The feeding device delivers organic matters into the preheating device. The preheated organic matters are delivered into the pyrolysis and carbonization reaction device. The steam generating device produces a saturated steam which is delivered into the water ion generating device which heats the saturated steam into a superheated steam which is dissociated into water ions which are delivered into the pyrolysis and carbonization reaction device. The water ions cut, dissociates and carbonizes the organic matters to form carbon residues and gas-liquid wastes. The heat energy is recycled by the heat recycle device and is delivered into the preheating device. The gas-liquid wastes are processed by the gas-liquid separation device and the gas purifying device to form gas and liquid that are harmless.
APPARATUS AND METHOD FOR THE GAS TREATMENT
An apparatus for the gas treatment including a reaction chamber. The reaction chamber including an inlet opening of a flow of gas to be treated; means for the formation of ionizing electrical discharges adapted to interact with the gas to be treated to form a plasma state for obtaining a flow of treated gas which includes at least a high-added value fraction and at least a waste fraction; an outlet opening of the high-added value fraction arranged downstream of the means for the formation with respect to the direction of forward movement of the flow of gas to be treated inside the reaction chamber; reintroduction means for reintroducing the waste fraction inside the reaction chamber, and the reintroduction means being arranged downstream of the means for the formation with respect to the direction of forward movement.
APPARATUS FOR EXHAUST GAS ABATEMENT UNDER REDUCED PRESSURE
An apparatus for exhaust gas abatement under reduced pressure includes a reaction tube having, in an interior thereof, an exhaust gas treatment space in which an exhaust gas supplied from an exhaust gas source via a vacuum pump is heated by an electric heater or excited by a plasma for decomposition and/or reaction treatment. The apparatus also includes a downstream vacuum pump connected to an exhaust gas outlet located downstream of the reaction tube to reduce a pressure in a region located downstream of an outlet of the vacuum pump and including the interior of the reaction tube. The downstream vacuum pump is a water-sealed pump. The apparatus further includes a water-washing unit for washing a downstream end of an exhaust gas flow path in the reaction tube with washing water. The washing water supplied by the water-washing unit is reused as seal water for the downstream vacuum pump.
SILANE RECIRCULATION FOR RAPID CARBON/SILICON CARBIDE OR SILICON CARBIDE/SILICON CARBIDE CERAMIC MATRIX COMPOSITES
A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamberand a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.