The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

Disclosed is a method for the manufacture of a spray-dried powder consisting essentially of 3-fucosyllactose, the spray-dried powder, its use for the manufacture of nutritional compositions, and nutritional compositions containing the spray-dried powder.

Disclosed is a method for the manufacture of a spray-dried powder consisting essentially of LNT and/or LNnT, the spray-dried powder, its use for the manufacture of nutritional compositions, and nutritional compositions containing the spray-dried powder.

A method and system is provided for treating waste generated from manufacturing operations including at least one of Printed Circuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF), semiconductors manufacturing, chemical milling, and Physical Vapour Deposition (PVD). The method and system are used to create zero liquid discharge recycling.

A manufacturing facility for the continuous production of biopharmaceuticals integrated with single-use disposable technology.

The invention concerns a subsea water processing system comprising an electrochemical unit that uses raw or treated seawater to generate high pH and low pH solutions that are used to clean at least one subsea process apparatus during a cleaning cycle by circulation through the at least one subsea process apparatus via acid or base flow lines connecting the electrochemical unit with the subsea process apparatus on-site.

The invention concerns a subsea water processing system comprising an electrochemical unit that uses raw or treated seawater to generate high pH and low pH solutions that are used to clean at least one subsea process apparatus during a cleaning cycle by circulation through the at least one subsea process apparatus via acid or base flow lines connecting the electrochemical unit with the subsea process apparatus on-site.

Provided are hybrid electrochemical and membrane-based systems for removing silica from water stream to achieve ultra-pure water. The silica concentration of a feed water stream may dictate the most effective and economical variation of disclosed hybrid processes to use. For example, for a feed water stream having a silica concentration of 1-30 ppm, a hybrid system for treating the feed water includes an electrodialysis reversal unit, the electrodialysis reversal unit comprising an inlet stream and a product outlet stream; a reverse osmosis unit, the reverse osmosis unit comprising an inlet stream and a product outlet stream, wherein the inlet stream of the reverse osmosis unit comprises the product outlet stream of the electrodialysis reversal unit; and an electrodeionization unit, the electrodeionization unit comprising an inlet stream and a product outlet stream, wherein the inlet stream of the electrodeionization unit comprises the product outlet stream of the reverse osmosis unit.

A system includes an ion exchange softener fluidly coupled to a wastewater treatment system. The first ion exchange softener may receive a first brine stream from the wastewater treatment system and to remove a plurality of minerals from the first brine stream to generate a second brine stream including the plurality of minerals and a third brine stream. The system also includes a mineral removal system disposed downstream from the ion exchange softener and that may receive the second brine stream and to generate a sodium chloride (NaCl) brine stream and an acid and caustic production system disposed downstream from and fluidly coupled to the mineral removal system. The acid and caustic production system includes a first electrodialysis (ED) system that may receive the NaCl brine stream from the mineral removal system and to generate hydrochloric acid (HCl) and sodium hydroxide (NaOH) from the NaCl brine stream. The system also includes a second ED system disposed downstream from the ion exchange softener and upstream of the acid and caustic production system. The second ED system is fluidly coupled to the ion exchange softener and to the acid and caustic production system, and the second ED may generate desalinated water from the third brine stream and an ED concentrate stream. The second ED system may direct the ED concentrate stream to the acid and caustic production system.