This application relates to an apparatus for reducing fine dust by using lightweight mixed air. The apparatus may include an apparatus main body configured to introduce and mix external air and remove the fine dust through adsorption, a seal type air mixing unit configured to mix the introduced external air and helium gas, an adsorption solution production unit configured to produce an adsorption solution for adsorbing the fine dust. The apparatus may also include an air bubble generation unit configured to generate air bubbles, emitted to outside, by using the adsorption solution, a flow control unit configured to control flow of air, so as to induce air bubble generation in the air bubble generation unit. The apparatus may further include a controller installed in a part of the apparatus main body and configured to control operations of the above units of the apparatus.

A gas mixing system for semiconductor fabrication includes a mixing block. The mixing block defines a gas mixing chamber, a first gas channel fluidly coupled to the gas mixing chamber at a first exit location, and a second gas channel fluidly coupled to the gas mixing chamber at a second exit location, wherein the first exit location is diametrically opposite the second exit location relative to the gas mixing chamber and the second gas channel has a bend of 90 degrees or less between an entrance of the second gas channel and the second exit location.

A plant for delivering a gas mixture including a source of a first gas, a source of a second gas, a mixer device fluidically connected to the source of first gas and to the source of second gas. A first flow regulator member and a second flow regulator member, a control unit, a buffer tank, at least one measurement sensor configured to measure a physical quantity, the variation of which is representative of a variation in the consumption flow rate delivered by the delivery line and to provide a first measurement signal of said physical quantity.

A burner has a housing on which a combustion tube is arranged, wherein the combustion tube has an opening at the end averted from the housing, wherein a mixing element is provided in the combustion tube, and the space between the mixing element and the opening forms a combustion chamber, wherein the housing has at least two mutually separate channels which open out in the mixing element, wherein gases flow through the channels and the mixing element, and mixing of the gases takes place for the first time in a combustion chamber, wherein the mixing element is produced in an additive manufacturing process and has at least two separate intermediate channels which branch in the direction of the combustion chamber in a flow direction.

A gas mixing system for semiconductor fabrication includes a mixing block. The mixing block defines a gas mixing chamber, a first gas channel fluidly coupled to the gas mixing chamber at a first exit location, and a second gas channel fluidly coupled to the gas mixing chamber at a second exit location, wherein the first exit location is diametrically opposite the second exit location relative to the gas mixing chamber and the second gas channel has a bend of 90 degrees or less between an entrance of the second gas channel and the second exit location.

Systems and methods are described for dissolving ammonia gas in deionized water. The system includes a deionized water source and a gas mixing device including a first inlet for receiving ammonia gas, a second inlet for receiving a transfer gas, and a mixed gas outlet for outputting a gas mixture including the ammonia gas and the transfer gas. The system includes a contactor that receives the deionized water and the gas mixture and generates deionized water having ammonia gas dissolved therein. The system includes a sensor in fluid communication with at least one inlet of the contactor for measuring a flow rate of the deionized water, and a controller in communication with the sensor. The controller sets a flow rate of the ammonia gas based on the flow rate of the deionized water measured by the sensor, and a predetermined conductivity set point.

A first intake manifold is connected to a first group of cylinders, a second distinct intake manifold is connected to a second group of cylinders and a first, respectively a second, exhaust manifold for receiving the exhaust gas emitted from the first, respectively the second, group of cylinders. An EGR line is connected to the first and second exhaust manifolds. A mixing unit includes a four-way valve having a first inlet connected to an air line, a second inlet connected to the EGR line, a first outlet connected to the first intake manifold and a second outlet connected to the second intake manifold. The first inlet is connected to the air line, the second inlet is connected to the EGR line. The first outlet and said second outlet form a substantially X-shape. The first inlet and said second inlet are coaxial. The first outlet and second outlet are coaxial such that the first inlet is diagonally facing the second inlet and the first outlet is diagonally facing the second outlet.

A system for introducing gas from an unconventional source into a gas grid pipeline includes a passive blender (10) that introduces gas from an unconventional source (1) into a gas grid (2), the passive blender (10) having gas inputs (3, 11) from the unconventional source (1) and the gas grid (2) and a blended gas output (12), and wherein an internal flow path within the passive blender (10) is shaped and sized to provide entraining and mixing of the gases. The passive blender (10) acts to entrain gas from a gas grid (2) through input (11) by utilising the flow of gas from an unconventional source (1) through input 3, proportionally blending inputs 3 and 11 before outputting the blended gas back to the main gas grid (2). The system comprises the passive blender (10) of the present invention, a first gas input pipe (11) from a grid gas pipeline (2) into the passive blender (10) a second gas input pipe (3) from the unconventional source (1) into the passive blender (1), and an output pipe (12) from the passive blender (10) into the grid gas pipeline (2). The blender (10) and system are advantageous in that they can greatly reduce the necessary conditioning of unconventional gas before it is introduced into a gas grid supply (2) without additional flow motivation or controls.

The present invention relates to a device configured for treating an exhaust gas from a fuel cell, the device including: a tube member discharging an exhaust gas from a fuel cell stack; a gas guide portion provided in a tube member and configured to guide a target gas contained in the exhaust gas to the outside of the tube member; and a guide tube spaced from the gas guide portion and provided to cover the gas guide portion such that it is possible to obtain an advantageous effect of effectively reducing a concentration of the target gas in the exhaust gas discharged from the fuel cell.

An exhaust hydrogen dilution device includes a purge receiving chamber to store hydrogen purged from a fuel cell of a fuel cell system and an air passage chamber adjoining the purge receiving chamber. Diluter gas flows through the air passage chamber. An interface member between the chambers comprises an interface member having first and second vents respectively on an upstream side and a downstream side. A pressure loss at the first vent is greater than or equal to a pressure loss at the second vent. Some of the diluter gas flows into the purge receiving chamber through the first vent and is mixed with the hydrogen into a mixed gas that flows toward the second vent. The pressure losses are adjusted such that a ratio of the hydrogen flowing into the air passage chamber to a total amount of gases flowing through the air passage chamber is 4% or lower.