A mixed gas supply device includes: a hydrogen gas generation unit that includes a hydrogen generator, the hydrogen generator generating hydrogen gas by decomposition of water and supplying the hydrogen gas; a nitrogen gas generation unit that includes a filter, the filter separating nitrogen gas from air and supplying the nitrogen gas; a gas mixing unit that mixes the supplied hydrogen gas and the supplied nitrogen gas and generates mix gas including the hydrogen gas and the nitrogen gas; and a single base on which the hydrogen gas generation unit, the nitrogen gas generation unit, and the gas mixing unit are mounted, the hydrogen gas generation unit, the nitrogen gas generation unit, and the gas mixing unit being integrated. The gas mixing unit supplies the generated mixed gas to outside.

A gas solution supply device 1 includes: a first gas-liquid separator 8 in which gas solution is stored; a second gas-liquid separator 16 provided at a stage subsequent to the first gas-liquid separator 8 and in which gas solution to be supplied to a use point is stored; an intermediate line 17 provided between the first gas-liquid separator 8 and the second gas-liquid separator 16; a pressure booster pump 18 provided on the intermediate line 17 and increases a pressure of gas solution being supplied from the first gas-liquid separator 8 to the second gas-liquid separator 16; a gas supply line 2 that supplies gas as a material of the gas solution; and a gas dissolving unit 20 provided on the intermediate line 17 and dissolves the gas supplied from the gas supply line 2 in the gas solution supplied from the first gas-liquid separator 8.

A polymer handling method for a polycrystalline silicon manufacturing device, wherein the polymer byproducts are treated in a manner that the silicon polymers are hydrolyzed. The method creates a heated treatment gas with a moisture content that both treats the polymer to a depth of about 0.25 mm to prohibit formation of the friction and shock sensitive layer near the polymer surface and keeps the hydrolyzed polymer humidified. Furthermore the polymer handling method includes inactivation of the polymer, removal of the polymer of the system and disposal of the polymer after removal.

Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the gas-free liquid oxidant therein to form a homogeneous and gas-free mixture of the process liquid and the gas-free liquid oxidant with minimal degassing. The method comprises the steps of a) injecting the gas-free liquid oxidant into the process liquid, and b) mixing the gas-free liquid oxidant and the process liquid to form the homogeneous and gas-free mixture. The gas-free liquid oxidant is ozone strong water.

An air reactivator includes a plurality of first ribs, a plurality of second ribs, a plurality of diffusion members, and a plurality of air passages. Each of the first ribs has a first top face and a first bottom face and two first inclined faces. Each of the second ribs has a second top face and a second bottom face and two second inclined faces. The diffusion members are defined at connections of the first ribs and the second ribs. Each of the diffusion members has a projection and a third bottom face and a recessed portion. Each of the air passages is defined between the first inclined face, the second inclined face, and the recessed portion. The first ribs, the second ribs, and the diffusion members are made of a mixture of far infrared emitting material and polymer material.

A multifunctional C.sub.4F.sub.7N/CO.sub.2 mixed gas preparation system is disclosed. The C.sub.4F.sub.7N heat exchanger is used to heat and vaporize C.sub.4F.sub.7N input through the C.sub.4F.sub.7N input port; the CO.sub.2 heat exchanger is used to heat and vaporize CO.sub.2 input through the CO.sub.2 input port; the C.sub.4F.sub.7N/CO.sub.2 mixing pipeline structure is used to mix the heated C.sub.4F.sub.7N and heated CO.sub.2, and the C.sub.4F.sub.7N/CO.sub.2 mixed gas output pipeline structure is used to output the C.sub.4F.sub.7N/CO.sub.2 mixed gas. The C.sub.4F.sub.7N/CO.sub.2 mixing pipeline structure comprises a C.sub.4F.sub.7N/CO.sub.2 dynamic gas preparation pipeline structure and a C.sub.4F.sub.7N/CO.sub.2 partial pressure mixing pipeline structure; the C.sub.4F.sub.7N/CO.sub.2 partial pressure mixing pipeline structure includes partial pressure mixing tanks for mixing the CO.sub.2 and the heated C.sub.4F.sub.7N of certain pressures; and a plurality of partial pressure mixing tanks are arranged in parallel. A multifunctional C.sub.4F.sub.7N/CO.sub.2 mixed gas preparation method is also disclosed.

A liquid material vaporization and supply device is provided in which it is possible to accurately control a flow rate even in the case where calibration data is not available for a material gas. A first tank in which a liquid material is vaporized to produce material gas; a second tank in which the material gas is contained at a predetermined pressure; a pressure sensor that senses the pressure inside the second tank; a lead-out path for leading the material gas out of the second tank; a fluid control valve that is provided to open/close the lead-out path; and a flow rate control part that, when the material gas is led out through the lead-out path, on the basis of a reduction in the pressure sensed by the pressure sensor, controls the opening level of the valve to control the flow rate of the material gas are included.

Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the gas-free liquid oxidant therein to form a homogeneous and gas-free mixture of the process liquid and the gas-free liquid oxidant with minimal degassing. The method comprises the steps of a). injecting the gas-free liquid oxidant into the process liquid, and b). mixing the gas-free liquid oxidant and the process liquid to form the homogeneous and gas-free mixture. The gas-free liquid oxidant is ozone strong water.

An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank. Next, the exhaust system performs a hydrogen-gas discharge operation in which the inlet valve and the first outlet valve are closed, and the a bypass valve disposed in a bypass line and the second outlet valve disposed in a hydrogen-gas discharge line are opened to discharge the hydrogen gas stayed in an upper part of the buffer tank while flowing the exhaust gas into a bypass line.

A liquid material vaporization and supply device is provided in which it is possible to accurately control a flow rate even in the case where calibration data is not available for a material gas. A first tank in which a liquid material is vaporized to produce material gas; a second tank in which the material gas is contained at a predetermined pressure; a pressure sensor that senses the pressure inside the second tank; a lead-out path for leading the material gas out of the second tank; a fluid control valve that is provided to open/close the lead-out path; and a flow rate control part that, when the material gas is led out through the lead-out path, on the basis of a reduction in the pressure sensed by the pressure sensor, controls the opening level of the valve to control the flow rate of the material gas are included.