According to one embodiment, the liquid crystal material processing device includes a syringe containing contents composed of a liquid crystal material and the like, having a distal end portion constituting a first discharge pipe, an agitation mechanism agitating the contents of the syringe, a vacuum chamber having a second discharge pipe penetrating the bottom to connect to the first discharge pipe of the syringe. The agitation mechanism agitates the liquid crystal material and the pure water in the syringe, and purifies the liquid crystal material by causing water-soluble impurities to transfer to the pure water. The agitation mechanism agitates the liquid crystal material remaining in the syringe after the water layer has been discharged. The evacuation mechanism evacuates the vacuum chamber and causes the liquid crystal material to be degassed while the remaining liquid crystal material is agitated.

This document describes a gas streaming device for use between an injection port and a mixing chamber within an airlift pump, and an airlift pump with the gas streaming device. The gas streaming device includes a planar plate with multiple holes extending therethrough, where the holes are dimensioned to direct the gas into multiple micro-streams for streaming air from the injection port into the mixing chamber. An airlift pump in combination with such a gas streaming device is useful for removing anomalously high concentrations of dissolved gas in a liquid. The increased efficiency for this invention may also enable this type of pump to be economic in other applications where it is desirable to lift a liquid or induce flow.

The present disclosure relates to systems and methods for gas injected chemistry for single wafer processing. An example method includes generating, by a gas generator, a gas. The method also includes mixing, in a mixing tank, a gas-enriched chemical mixture comprising the gas and a chemical mixture. The method also includes dispensing, via a sample chamber, a dispensed volume of the gas-enriched chemical mixture onto the substrate. The method also includes returning a spent volume of the gas-enriched chemical mixture to the mixing tank.

A rotary processing device that processes a processing object inside a drum and suppresses scattering of particles is described. The rotary processing device includes a drum including a feeding unit for the processing object on one side and a discharge unit for the processing object on the other side and a processor that is connected to a rotation axis member, rotates about a rotation axis of the rotation axis member, and processes the processing object in the drum. The rotary processing device also includes a suppressor that suppresses a gas flow from the other side toward the one side in the drum.

To realize excellent durability of an apparatus, realize a dissolved gas amount suitable for propagation of ultrasonic waves, and stably generate fine bubbles that further comply with a treatment using ultrasonic waves. An ultrasonic treatment apparatus according to the present invention includes: a treatment part capable of accommodating a treatment liquid and an object to be treated; an ultrasonic generator that is provided in the treatment part and applies ultrasonic waves to the object to be treated; and a circulation path for circulating the treatment liquid in the treatment part, in which a fine bubble generator which performs deaeration on an extracted treatment liquid and generates fine bubbles in the treatment liquid, is provided to the circulation path, in series with a treatment liquid extraction pipe. The fine bubble generator has two or more narrow portions each having an opening flow path with a size narrower than an inside diameter of the treatment liquid extraction pipe, in which the opening flow paths of the narrow portions adjacent to each other are configured to prevent the treatment liquid from proceeding straight, and an opening cross-sectional area at each pressure reduction zone satisfies a predetermined relation.