Some variations provide a system for producing a functionalized powder, comprising: an agitated pressure vessel; first particles and second particles contained within the agitated pressure vessel; a fluid contained within the agitated pressure vessel; an exhaust line for releasing the fluid from the agitated pressure vessel; and a means for recovering a functionalized powder containing the second particles disposed onto surfaces of the first particles. A preferred fluid is carbon dioxide in liquefied or supercritical form. The carbon dioxide may be initially loaded into the pressure vessel as solid carbon dioxide. The pressure vessel may be batch or continuous and is operated under reaction conditions to functionalize the first particles with the second particles, thereby producing a functionalized powder, such as nanofunctionalized metal particles in which nanoparticles act as grain refiners for a component ultimately produced from the nanofunctionalized metal particles. Methods for making the functionalized powder are also disclosed.

A carbonator (100) for producing carbonated beverage including a first connector (11) for a gas-outlet (105) of a CO2-container (104) and with a CO2-valve (12), operable between a closed state and an open state, a second connector, a venting valve, an operating mechanism, and a manipulator (103), coupled to the operating mechanism (80), for allowing a person to operate the operating mechanism (80) between: a start mode (I) in which the venting valve (40) is open and the CO2-valve (12) is closed, and an end mode (III) in which the CO2-valve (12) is open and the venting valve (40) is closed, whereby the operating mechanism (80) is configured to be set in an intermediate mode (II), between the start mode (I) and the end mode (III), in which both the venting valve (40) and the CO2-valve (12) are closed.

A liquid delivering system for wafer cleaning equipment includes an acid scouring tank, a sulfuric acid supplying source, a hydrogen peroxide supplying source, a first mixing device, a second mixing device and a feedback-control panel. The first mixing device and the second mixing device both includes a mixing duct, a multi-section mixing screw rod arranged inside the mixing duct and a heater wrapped around the mixing duct. By ways of adopting the above-mentioned technical solution, it is possible to realize fully mixing sulfuric acid with hydrogen peroxide in a mode of mixing in multi-stages, achieve precise control to temperature, and enable mixed liquid to fully react, thereby ensuring that the mixed liquid coming into the acid scouring tank meets cleaning requirements, and improving quality and efficiency of cleaning wafers.

A liquid delivering system for wafer cleaning equipment includes an acid scouring tank, a sulfuric acid supplying source, a hydrogen peroxide supplying source, a first mixing device, a second mixing device and a feedback-control panel. The first mixing device and the second mixing device both includes a mixing duct, a multi-section mixing screw rod arranged inside the mixing duct and a heater wrapped around the mixing duct. By ways of adopting the above-mentioned technical solution, it is possible to realize fully mixing sulfuric acid with hydrogen peroxide in a mode of mixing in multi-stages, achieve precise control to temperature, and enable mixed liquid to fully react, thereby ensuring that the mixed liquid coming into the acid scouring tank meets cleaning requirements, and improving quality and efficiency of cleaning wafers.

A method for producing a liquid containing a high concentration of tiny bubbles comprises passing liquid from a first reservoir to a second reservoir via a nanobubble generator which produces a liquid containing a high concentration of tiny bubbles.

A hydrolysis system includes a hydrolysis furnace and a pressure relief device. The hydrolysis furnace has a reaction space therein, and a ventilation hole spatially communicating with the reaction space. The pressure relief device includes a pressure relief tube connected to the hydrolysis furnace, adjacent to the ventilation hole, extending in an up-down direction, and defining a first tube space that spatially communicates with the ventilation hole. The pressure relief device further includes at least one auxiliary tube disposed at an end portion of the pressure relief tube opposite to the hydrolysis furnace in the up-down direction, extending in a left-right direction that is substantially perpendicular to the up-down direction, and defining a second tube space that spatially communicates with the ventilation hole.