The invention relates to a new process for the manufacture of fluoroaryl compounds and derivatives thereof, in particular of fluorobenzenes and derivatives thereof, and especially wherein said manufacture relates to an environmentally friendly production of the said compounds. Thus, the present invention overcomes the disadvantages of the prior art processes, and in a surprisingly simple and beneficial manner, and as compared to the prior art processes, in particular, the invention provides a more efficient and energy saving processes, and also provides a more environmentally friendly process, for the manufacture of nuclear fluorinated aromatics, and preferably of nuclear fluorinated fluorobenzenes. Accordingly, in one aspect of the invention, an industrially beneficial process for preparing fluorobenzenes from halobenzene precursors using HF to form hydrogen halide is provided by the present invention. A beneficial and surprisingly simple use of chlorobenzene as an industrially interesting starting material in the manufacture of fluorobenzene is provided.

The invention relates to a new process for the manufacture of fluoroaryl compounds and derivatives thereof, in particular of fluorobenzenes and derivatives thereof, and especially wherein said manufacture relates to an environmentally friendly production of the said compounds. Thus, the present invention overcomes the disadvantages of the prior art processes, and in a surprisingly simple and beneficial manner, and as compared to the prior art processes, in particular, the invention provides a more efficient and energy saving processes, and also provides a more environmentally friendly process, for the manufacture of nuclear fluorinated aromatics, and preferably of nuclear fluorinated fluorobenzenes. Accordingly, in one aspect of the invention, an industrially beneficial process for preparing fluorobenzenes from halobenzene precursors using HF to form hydrogen halide is provided by the present invention. A beneficial and surprisingly simple use of chlorobenzene as an industrially interesting starting material in the manufacture of fluorobenzene is provided.

A method for producing methyldichlorophosphane, the method including: allowing methane and phosphorus trichloride to react in the presence of an additive using a metal compound, or a metal compound carried on a carrier, or both thereof.

Implementations of a method of forming a wax ether composition may include: providing a batch of lipids, drying the batch of lipids, and cooling the batch of lipids. The method may also include dosing, with a catalyst, the batch of lipids at 0.1% to 0.3% by weight of the batch of lipids and dissolving the catalyst in the batch of lipids to form a homogenous solution. The method may include adding at least a molar equivalent of a hydrogen donor to the homogenous solution. The method may include sealing and maintaining the homogenous solution and hydrogen donor under atmospheric pressure under reflux until a chemical reaction between the homogenous solution and the hydrogen donor forms a product comprising an ether.

The invention provides a process for the preparation of bismuth oxyhalide, comprising a precipitation of bismuth oxyhalide in an acidic aqueous medium in the presence of a reducing agent. Also provided are bismuth oxyhalide compounds doped with elemental bismuth Bi.sup.(0). The use of Bi.sup.(0) doped bismuth oxyhalide as photocatalysts in water purification is also described.

The invention provides a process for the preparation of bismuth oxyhalide, comprising a precipitation of bismuth oxyhalide in an acidic aqueous medium in the presence of a reducing agent. Also provided are bismuth oxyhalide compounds doped with elemental bismuth Bi.sup.(0). The use of Bi.sup.(0) doped bismuth oxyhalide as photocatalysts in water purification is also described.

Redox catalysts having surface medication, methods of making redox catalysts with surface modification, and uses of the surface modified redox catalysts are provided. In some aspects, the redox catalysts include a core oxygen carrier region such as CaMnO.sub.3, BaMnO.sub.3-, SrMnO.sub.3-, Mn.sub.2SiO.sub.4, Mn.sub.2MgO.sub.4-, La.sub.0.8Sr.sub.0.2O.sub.3-, La.sub.0.8Sr.sub.0.2FeO.sub.3-, Ca.sub.9Ti.sub.0.1Mn.sub.0.9O.sub.3-, Pr.sub.6O.sub.11-, manganese ore, or a combination thereof; and an outer shell having an average thickness of about 1-100 monolayers surrounding the outer surface of the core region. The outer shell can include, for example a salt selected such as Li.sub.2WO.sub.4, Na.sub.2WO.sub.4, K.sub.2WO.sub.4, SrWO.sub.4, Li.sub.2MoO.sub.4, Na.sub.2MoO.sub.4, K.sub.2MoO.sub.4, CsMoO.sub.4, Li.sub.2CO.sub.3, Na.sub.2CO.sub.3, K.sub.2CO.sub.3, or a combination thereof.

A process for producing terephthalic acid, comprising: passing a feed stream through a catalytic reactor wherein the feed stream comprises p-xylene; contacting the feed stream with a catalyst within the catalytic reactor to produce an oxidation reaction wherein the catalyst comprises, less than or equal to 10% of a metal component wherein the metal component comprises cobalt ions, manganese ions, or a combination comprising at least one of the foregoing, less than or equal to 15% bromide ions, and less than or equal to 2% silver ions; and producing a product stream comprising terephthalic acid, wherein the product stream exits the catalytic reactor.

A process for producing terephthalic acid, comprising: passing a feed stream through a catalytic reactor wherein the feed stream comprises p-xylene; contacting the feed stream with a catalyst within the catalytic reactor to produce an oxidation reaction wherein the catalyst comprises, less than or equal to 10% of a metal component wherein the metal component comprises cobalt ions, manganese ions, or a combination comprising at least one of the foregoing, less than or equal to 15% bromide ions, and less than or equal to 2% silver ions; and producing a product stream comprising terephthalic acid, wherein the product stream exits the catalytic reactor.

The present application relates to a method for producing a silica film, which includes a step of contacting a silica precursor layer formed of a silica precursor composition having a pH of 5 or less with a Lewis base, where the silica precursor composition includes a silica precursor formed from a silane compound and an acid catalyst. The present application can provide a method capable of forming a silica film having excellent resistance to a vertical load and a tangential load without going through expensive equipment or a high temperature process.