Patent classifications
B01J27/16
Air cleaning apparatus
An air cleaning apparatus includes: a collection filter for collecting dust; a first ultraviolet light emitter for irradiating the collection filter with ultraviolet light having a first wavelength; and a photocatalyst supporting filter which supports a photocatalyst exhibiting photocatalytic activity by the ultraviolet light having the first wavelength and collects the dust. The collection filter transmits the ultraviolet light having the first wavelength, and the ultraviolet light having the first wavelength passing through the collection filter is irradiated to the photocatalyst supporting filter.
Air cleaning apparatus
An air cleaning apparatus includes: a collection filter for collecting dust; a first ultraviolet light emitter for irradiating the collection filter with ultraviolet light having a first wavelength; and a photocatalyst supporting filter which supports a photocatalyst exhibiting photocatalytic activity by the ultraviolet light having the first wavelength and collects the dust. The collection filter transmits the ultraviolet light having the first wavelength, and the ultraviolet light having the first wavelength passing through the collection filter is irradiated to the photocatalyst supporting filter.
FLUID CATALYTIC CRACKING CATALYST COMPOSITION FOR ENHANCED BUTYLENES YIELDS WITH METAL PASSIVATION FUNCTIONALITY
Disclosed herein is a fluid catalyst cracking (FCC) catalyst composition that includes a first component and a second component. The first component includes zeolite Y and a first matrix that includes a metal passivating constituent. The second component includes beta zeolite and a second matrix. Also disclosed herein are methods of preparing the FCC catalyst composition and method of using the FCC catalyst composition.
FLUID CATALYTIC CRACKING CATALYST COMPOSITION FOR ENHANCED BUTYLENES YIELDS WITH METAL PASSIVATION FUNCTIONALITY
Disclosed herein is a fluid catalyst cracking (FCC) catalyst composition that includes a first component and a second component. The first component includes zeolite Y and a first matrix that includes a metal passivating constituent. The second component includes beta zeolite and a second matrix. Also disclosed herein are methods of preparing the FCC catalyst composition and method of using the FCC catalyst composition.
CATALYTIC CRACKING OF GLYCERIDE OILS WITH DEACTIVATED PHOSPHORUS-CONTAINING ZSM-5 LIGHT OLEFINS ADDITIVES
A process is provided for the catalytic cracking of a glyceride oil feedstock with a catalyst composition containing a deactivated phosphorus-containing ZSM-5 light olefins selective additive.
CATALYTIC CRACKING OF GLYCERIDE OILS WITH DEACTIVATED PHOSPHORUS-CONTAINING ZSM-5 LIGHT OLEFINS ADDITIVES
A process is provided for the catalytic cracking of a glyceride oil feedstock with a catalyst composition containing a deactivated phosphorus-containing ZSM-5 light olefins selective additive.
Catalysts for petrochemical catalysis
Metal oxide catalysts comprising various dopants are provided. The catalysts are useful as heterogenous catalysts in a variety of catalytic reactions, for example, the oxidative coupling of methane to C2 hydrocarbons such as ethane and ethylene. Related methods for use and manufacture of the same are also disclosed.
Catalysts for petrochemical catalysis
Metal oxide catalysts comprising various dopants are provided. The catalysts are useful as heterogenous catalysts in a variety of catalytic reactions, for example, the oxidative coupling of methane to C2 hydrocarbons such as ethane and ethylene. Related methods for use and manufacture of the same are also disclosed.
Etching compositions
The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing silicon germanium (SiGe) from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process.
Etching compositions
The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing silicon germanium (SiGe) from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process.