A substrate processing apparatus includes: a substrate holder configured to hold a substrate; a processing liquid supply part configured to supply a processing liquid to the substrate held by the substrate holder; a chemical liquid supply part configured to supply a chemical liquid as a component of the processing liquid to the processing liquid supply part; a pure water supply part configured to supply pure water as a component of the processing liquid to the processing liquid supply part; a low-dielectric constant solvent supply part configured to supply a low-dielectric constant solvent as a component of the processing liquid to the processing liquid supply part; and a controller configured to control a ratio of the chemical liquid, the pure water, and the low-dielectric constant solvent contained in the processing liquid by controlling the chemical liquid supply part, the pure water supply part, the low-dielectric constant solvent supply part.

A plural component dispensing system individually delivers separate material components to each of a plurality of proportioners. Each of the proportioners regulates volumetric flow of each of the separate material components to produce a target ratio of the separate material components associated with the proportioner. The target ratios associated with the plurality of proportioners can be the same or different target ratios. Each proportioner delivers the separate material components at the associated target ratio to one of a plurality of dispensing devices. Each dispensing device mixes the separate components received at the corresponding target ratio and delivers the components as a mixture.

First and second fluid components are individually pumped to a device from first and second pumps. A first volumetric flow rate of the first fluid component discharged from the first fluid component is measured. A second volumetric flow rate of the second fluid component discharged from the second pump is measured. Operation of at least one of the first and second pumps is controlled based on the measured first volumetric flow rate and the measured second volumetric flow rate to produce a target ratio of the first fluid component and the second fluid component at the device.

First and second fluid components are individually pumped to a device from first and second pumps. A first volumetric flow rate of the first fluid component discharged from the first fluid component is measured. A second volumetric flow rate of the second fluid component discharged from the second pump is measured. Operation of at least one of the first and second pumps is controlled based on the measured first volumetric flow rate and the measured second volumetric flow rate to produce a target ratio of the first fluid component and the second fluid component at the device.

A connecting device for connecting two or more components to one another, includes an inlet section and an outlet section. The inlet section and the outlet section respectively include one or more connectors for each of the two or more components, with one or more passages extending between the inlet section and the outlet section, with the connecting device being of single piece design and being plastic.

The present disclosure describes a wellhead system that includes a wellhead; a tank of corrosion inhibitor chemical; and an ejector device comprising: a high pressure nozzle connected to the wellhead through a first flowline; a low pressure nozzle connected to the tank of corrosion inhibitor chemical through a second flowline; and wherein the ejector device is configured to generate a gas and chemical mixture fluid that exits the ejector device and flows downstream of the wellhead system.

A method of manufacturing a microarray substrate having improved reliability and mass-production properties uses a vapor of a surface-reforming material, and includes washing a base substrate, supplying the vapor of the surface-reforming material into a container to which the base substrate is provided, and coupling the vapor of the surface-reforming material to a surface of the base substrate to form a self-assembled monolayer.

A method of manufacturing a microarray substrate having improved reliability and mass-production properties uses a vapor of a surface-reforming material, and includes washing a base substrate, supplying the vapor of the surface-reforming material into a container to which the base substrate is provided, and coupling the vapor of the surface-reforming material to a surface of the base substrate to form a self-assembled monolayer.

An apparatus includes an intake assembly, the intake assembly including a connector, the connector configured for coupling to a pressurized liquid source. The apparatus also includes a chemical storage assembly. The chemical storage assembly is coupled to at least one outlet of the intake assembly. The chemical storage assembly is configured for at least one of (a) storing a chemical or (b) mixing a chemical with a liquid from the pressurized liquid source. The apparatus further includes an outlet assembly. The outlet assembly includes a first outlet configured for expelling pressurized liquid from the pressurized liquid source in a first direction at a rate sufficient to induce approximately lateral movement of the apparatus. The outlet assembly also includes a second outlet configured for expelling at least one of the chemical or the chemical mixed with the liquid.

An apparatus includes an intake assembly, the intake assembly including a connector, the connector configured for coupling to a pressurized liquid source. The apparatus also includes a chemical storage assembly. The chemical storage assembly is coupled to at least one outlet of the intake assembly. The chemical storage assembly is configured for at least one of (a) storing a chemical or (b) mixing a chemical with a liquid from the pressurized liquid source. The apparatus further includes an outlet assembly. The outlet assembly includes a first outlet configured for expelling pressurized liquid from the pressurized liquid source in a first direction at a rate sufficient to induce approximately lateral movement of the apparatus. The outlet assembly also includes a second outlet configured for expelling at least one of the chemical or the chemical mixed with the liquid.