B05C5/0291

DEVICE FOR APPLYING A VISCOUS MATERIAL

A device for applying a viscous material to workpieces, has a nozzle holder and an applicator nozzle which is arranged on the nozzle holder and has a material line extending from a material inlet, for introduction of the viscous material, to a nozzle opening for emergence of the viscous material. The material line has an inlet portion, extending in a first direction from the material inlet, and an outlet portion, extending to the nozzle opening in a second direction transverse to the first direction, and the applicator nozzle is mounted on the nozzle holder pivotably about a pivot axis forming a longitudinal center axis of the inlet portion.

SYSTEMS FOR AUTOMATED MOBILE PAINTING OF STRUCTURES
20250296107 · 2025-09-25 ·

An automated mobile sprayer (AMS) includes a mobile base, an applicator arm supported by the mobile base, and a nozzle extending from the applicator arm. The nozzle receives fluid from a fluid supply and generates an atomized fluid spray for application to a surface. The applicator arm moves vertically relative to the mobile base and the surface to cause the nozzle to generate a vertical fluid stripe. The mobile base moves laterally relative to the surface to cause the nozzle to generate a horizontal fluid stripe.

PURGEABLE INJECTION APPARATUS FOR SPILL-FREE REPLENISHMENT OF EMBEDDED FOUNDATION PRESERVATION WRAPS
20250303438 · 2025-10-02 ·

A system for replenishing embedded foundation preservation wraps with preservative comprises an embedded foundation, a preservation wrap, and injection apparatus configured to be inserted between the wrap and the foundation. The injection apparatus includes a profiled backing plate and a semicylindrical tube portion defining a lumen therebetween, with a preservative inlet and a plurality of outlet nozzles along a distal bayonet fronting portion. A syringe with a reciprocating plunger operates within the lumen to enable controlled delivery of preservative and purging of residual preservative after use. The plunger may be locked in retracted, inserted, or blocking positions to manage flow and prevent leakage.

PLANAR LIQUID FILM FORMING APPARATUS
20250312811 · 2025-10-09 · ·

Problem: To provide a technology for forming a planar liquid film having less surface unevenness than ever before using a jet-type discharge device.

Solution: Provided is a planar liquid film forming method of forming a planar liquid film on an application target using a jet-type discharge device having a plurality of discharge ports, and an apparatus for implementing the method. In the method, the plurality of discharge ports are arranged on a straight nozzle arrangement line 140, and are arranged with such a distance from one another that globs of a liquid material having landed on the application target can join together to form a linear liquid film. The method includes: a unitary linear liquid film forming step of forming a unitary linear liquid film 404 by discharging the liquid material such that a plurality of liquid globs simultaneously discharged from the plurality of discharge ports have no contact with one another before landing on the application target, and by letting globs of the liquid material having landed join together on the application target; and a specific planar liquid film forming step of forming a specific planar liquid film 405 from a plurality of unitary linear liquid films 404 by successively executing the unitary linear liquid film forming steps while moving the jet-type discharge device and the application target relative to each other in a direction perpendicular to the nozzle arrangement line 140 so that the plurality of unitary linear liquid films 404 join together.

Manufacturing method of display device and manufacturing device of display device

A manufacturing method of a display device includes forming a first droplet on a first region of a substrate by nozzles, moving the nozzles onto a second region of the substrate spaced apart in a first direction from the first region, forming a second droplet on the second region, calculating a first distance between the first and second droplets, moving the nozzles onto a third region of the substrate spaced apart in a direction opposite to the first direction from the second region, forming a third droplet on the third region, moving the nozzles onto a fourth region of the substrate spaced apart in the first direction from the third region, forming a fourth droplet on the fourth region, calculating a second distance between the third and the fourth droplets, and calculating a jetting velocity of each of the nozzles based on the first distance and the second distance.

DROPLET EJECTING DEVICE

Droplet ejecting device (1) includes liquid chamber (12) that stores a liquid to be ejected from nozzle (10) inside, and plunger (11) that advances and retracts inside liquid chamber (12). A distance between a distal end of plunger (11) and a bottom surface inside liquid chamber (12) is larger than a maximum distance between a side surface of plunger (11) and an inner surface of liquid chamber (12) at a position where plunger (11) advances most toward nozzle (10).

Substrate processing apparatus
12521753 · 2026-01-13 · ·

A development device includes a casing, an airflow former and a substrate holding device. The airflow former forms a downward flow of clean air in the inner space of the casing. The development device further includes a plurality of nozzles and a partition mechanism. The plurality of nozzles supply a processing liquid to a substrate held by the substrate holding device. The partition mechanism partitions the inner space of the casing into a processing space and a non-processing space with a substrate held by the substrate holding device. The processing space is a space including a substrate held by the substrate holding device. The partition mechanism includes a cup that receives a processing liquid that splashes from a substrate, a partition plate that has a nozzle opening and a plurality of through holes and is provided above the cup and a cover member that covers the nozzle opening.

Substrate carrier improvement

A method of forming a substrate carrier is provided. The method includes forming a first electrode over a first surface of a substrate, the first electrode arranged in a first pattern including a plurality of segments, wherein portions of the plurality of segments are spaced apart from each other by a plurality of gaps; and dispensing a plurality of droplets of a dielectric material over the substrate and into the plurality of gaps. The plurality of droplets includes a first droplet and a second droplet, the first droplet is dispensed onto a first location over the substrate, the second droplet is dispensed onto a second location over the substrate, a size of the first droplet is at least 10% larger than a size of the second droplet.

MANUFACTURING METHOD OF DISPLAY DEVICE AND MANUFACTURING DEVICE OF DISPLAY DEVICE
20260027580 · 2026-01-29 ·

A manufacturing method of a display device includes forming a first droplet on a first region of a substrate by nozzles, moving the nozzles onto a second region of the substrate spaced apart in a first direction from the first region, forming a second droplet on the second region, calculating a first distance between the first and second droplets, moving the nozzles onto a third region of the substrate spaced apart in a direction opposite to the first direction from the second region, forming a third droplet on the third region, moving the nozzles onto a fourth region of the substrate spaced apart in the first direction from the third region, forming a fourth droplet on the fourth region, calculating a second distance between the third and the fourth droplets, and calculating a jetting velocity of each of the nozzles based on the first distance and the second distance.

PLANARIZATION SYSTEM AND ARTICLE MANUFACTURING METHOD
20260054284 · 2026-02-26 ·

A planarization system includes a first planarization apparatus configured to form a planarization film by bringing a superstrate into contact with a plurality of droplets of a curable composition arranged on a substrate, a second planarization apparatus configured to form a liquid film by a spin coating method, and a heat treatment apparatus configured to perform a heat treatment for curing the liquid film formed by the second planarization apparatus.