Described herein is a coating system comprising an applicator head that is configured to apply a coating to a surface of a workpiece, a shroud comprising a housing and an internal cavity located inside of the housing, and a humidifying apparatus comprising an output that is fluidly coupled to the shroud, wherein the humidifying apparatus configured to introduce a quantity of humid air to the internal cavity of the shroud.

According to one embodiment, a system for manufacturing a fully impregnated thermoplastic prepreg includes a mechanism for moving a fabric or mat and a drying mechanism that removes residual moisture from at least one surface of the fabric or mat. The system also includes a resin application mechanism that applies a reactive resin to the fabric or mat and a press mechanism that presses the coated fabric or mat to ensure that the resin fully saturates the fabric or mat. The system further includes a curing oven through which the coated fabric or mat is moved to polymerize the resin and thereby form a thermoplastic polymer so that upon exiting the oven, the fabric or mat is fully impregnated with the thermoplastic polymer. During at least a portion of the process, humidity in the vicinity of the coated fabric or mat is maintained at substantially zero.

According to one embodiment, a system for manufacturing a fully impregnated thermoplastic prepreg includes a mechanism for moving a fabric or mat and a drying mechanism that removes residual moisture from at least one surface of the fabric or mat. The system also includes a resin application mechanism that applies a reactive resin to the fabric or mat and a press mechanism that presses the coated fabric or mat to ensure that the resin fully saturates the fabric or mat. The system further includes a curing oven through which the coated fabric or mat is moved to polymerize the resin and thereby form a thermoplastic polymer so that upon exiting the oven, the fabric or mat is fully impregnated with the thermoplastic polymer. During at least a portion of the process, humidity in the vicinity of the coated fabric or mat is maintained at substantially zero.

A processing apparatus has: a light irradiation apparatus configured to irradiate a coat formed on a base member with a processing light; and a controlling apparatus configured to control the light irradiation apparatus. The processing apparatus is configured to change a thickness of at least a part of the coat by irradiating the coat with the processing light so that the base member is not exposed from the coat.

A device and a system for a lacquer transfer with a frame, transfer roller with a circumferential lateral wall, a drive unit, a slit nozzle, the slit nozzle at least indirectly connected to the frame, an outside contact surface of the lateral wall including depressions, the transfer roller mounted rotatably about an axis of rotation at the frame, the drive unit configured to drive the transfer roller for the transfer roller to rotate about the axis of rotation. The slit nozzle includes a supply connection, nozzle-cavity, slit-shaped nozzle-channel and at least one limiter, the supply connection coupled to the nozzle-cavity for supplying lacquer to the nozzle-cavity, the nozzle-channel extending from the nozzle-cavity to a muzzle end formed by the slit nozzle at the end of the nozzle-channel for dispensing lacquer, the slit nozzle configured by the limiter to adjust a cross-section in a restriction area of the nozzle-channel.

A combined radiation and functional layer application system includes one or more radiation sources and a commonly located functional layer application unit configured to dispose a functional layer over the surface of a fixed target ahead of the radiation sources during relative motion between the target and the radiation sources/application unit. System and method embodiments include those in which the target is stationary or moving, and embodiments in which the functional layer is applied as a liquid or as a solid laminate. Embodiments relate to application of an oxygen-blocking layer of a printing plate prior to exposure to actinic radiation. Certain solid laminate embodiments include a two-roll system for positioning the laminate for cutting adjacent a trailing edge of the plate.

A combined radiation and functional layer application system includes one or more radiation sources and a commonly located functional layer application unit configured to dispose a functional layer over the surface of a fixed target ahead of the radiation sources during relative motion between the target and the radiation sources/application unit. System and method embodiments include those in which the target is stationary or moving, and embodiments in which the functional layer is applied as a liquid or as a solid laminate. Embodiments relate to application of an oxygen-blocking layer of a printing plate prior to exposure to actinic radiation. Certain solid laminate embodiments include a two-roll system for positioning the laminate for cutting adjacent a trailing edge of the plate.

A method for manufacturing an electrode for secondary battery, including a pressing process in which a load is applied to an electrode active material slurry when the solid content of the electrode active material slurry is 70 wt % to 98 wt % during the process of drying the electrode active material slurry coated as one or more layers on a current collector. An apparatus for manufacturing the same is also provided.

A method for manufacturing an electrode for secondary battery, including a pressing process in which a load is applied to an electrode active material slurry when the solid content of the electrode active material slurry is 70 wt % to 98 wt % during the process of drying the electrode active material slurry coated as one or more layers on a current collector. An apparatus for manufacturing the same is also provided.

There is provided a technique of forming an insulating film containing silicon oxide. A coating solution containing polysilazane is applied onto a wafer W, the solvent of the coating solution is volatilized, and the coating film is irradiated with ultraviolet rays in nitrogen atmosphere before performing a curing process. Dangling bonds are generated in silicon which is a pre-hydrolyzed site in polysilazane. Therefore, the energy for hydrolysis is reduced, and unhydrolyzed sites are reduced even when the temperature of the curing process is 350° C. Since efficient dehydration condensation occurs, the crosslinking rate is improved, and a dense (good-quality) insulation film is formed. By forming a protective film on the surface of the coating film to which ultraviolet rays irradiated, the reaction of dangling bonds prior to the curing process is suppressed.