A method of coating threads using a printhead having rows of nozzles extending along a length of the printhead. The method includes the steps of: feeding the thread along a length of the printhead; and ejecting ink from the rows of nozzles towards the thread. Thread-coating modules and thread-coating systems make use of the method described.

A method of coating threads using a printhead having rows of nozzles extending along a length of the printhead. The method includes the steps of: feeding the thread along a length of the printhead; and ejecting ink from the rows of nozzles towards the thread. Thread-coating modules and thread-coating systems make use of the method described.

Aspects herein relate to coating apparatus and methods for coating medical devices. In an embodiment, a coating system is included having a valve, a fluid supply reservoir in fluid communication with the valve, a reciprocating positive displacement pump in fluid communication with the valve, and a fluid applicator in fluid communication with the three-way valve. The valve can be configured to assume a first fluid transport state and a second fluid transport state, wherein the valve provides fluid communication between the fluid supply reservoir and the reciprocating positive displacement pump when in the first fluid transport state for filling of the reciprocating positive displacement pump, and wherein the valve provides fluid communication between the reciprocating positive displacement pump and the fluid applicator when in the second fluid transport state for applying a coating suspension to a medical device surface. Other embodiments are also included herein.

Aspects herein relate to coating apparatus and methods for coating medical devices. In an embodiment, a coating system is included having a valve, a fluid supply reservoir in fluid communication with the valve, a reciprocating positive displacement pump in fluid communication with the valve, and a fluid applicator in fluid communication with the three-way valve. The valve can be configured to assume a first fluid transport state and a second fluid transport state, wherein the valve provides fluid communication between the fluid supply reservoir and the reciprocating positive displacement pump when in the first fluid transport state for filling of the reciprocating positive displacement pump, and wherein the valve provides fluid communication between the reciprocating positive displacement pump and the fluid applicator when in the second fluid transport state for applying a coating suspension to a medical device surface. Other embodiments are also included herein.

A pipe doping apparatus comprises a bucket assembly including a base and a bucket supported on the base and having an inside volume, a lubricating unit having at least one lubricant applicator inside the bucket; and a source of torque configured to rotate the bucket and/or the lubricating unit relative to a tubular. The apparatus may include a cleaning unit and/or a drying unit and the source of torque may be a fluid jet in either. At least one lubricant applicator may be retractable and may be actuated between a retracted position and an extended position by centripetal force. The apparatus may further include a positioning assembly supporting the base and the rotary bucket assembly and a controller connected to and controlling each of:—the positioning assembly, the cleaning unit, the drying unit, and the lubricating unit.

A pipe doping apparatus comprises a bucket assembly including a base and a bucket supported on the base and having an inside volume, a lubricating unit having at least one lubricant applicator inside the bucket; and a source of torque configured to rotate the bucket and/or the lubricating unit relative to a tubular. The apparatus may include a cleaning unit and/or a drying unit and the source of torque may be a fluid jet in either. At least one lubricant applicator may be retractable and may be actuated between a retracted position and an extended position by centripetal force. The apparatus may further include a positioning assembly supporting the base and the rotary bucket assembly and a controller connected to and controlling each of:—the positioning assembly, the cleaning unit, the drying unit, and the lubricating unit.

A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.

A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.

There is provided a technique of forming an insulating film containing silicon oxide. A coating solution containing polysilazane is applied onto a wafer W, the solvent of the coating solution is volatilized, and the coating film is irradiated with ultraviolet rays in nitrogen atmosphere before performing a curing process. Dangling bonds are generated in silicon which is a pre-hydrolyzed site in polysilazane. Therefore, the energy for hydrolysis is reduced, and unhydrolyzed sites are reduced even when the temperature of the curing process is 350° C. Since efficient dehydration condensation occurs, the crosslinking rate is improved, and a dense (good-quality) insulation film is formed. By forming a protective film on the surface of the coating film to which ultraviolet rays irradiated, the reaction of dangling bonds prior to the curing process is suppressed.

A device includes a chemical solution flow path in which a chemical solution containing polymers flows; a laser beam irradiator configured to irradiate a laser beam to the chemical solution flow path such that an optical path is intersected with a flow direction of the chemical solution in the chemical solution flow path; a light receiving element provided in the optical path passing through the chemical solution flow path; a detector configured to detect, based on a signal output from the light receiving element, an abnormality in a state of polymers corresponding to a majority of the polymers contained in the chemical solution or configured to detect a ratio between a chemical solution containing the polymers and another chemical solution in the chemical solution flow path.