Patent classifications
B05C11/1002
PAINTING DEVICE
A painting device includes a paint output part for outputting paint toward an object to be painted; an introduction pipe through which the paint flows and which introduces the paint into the paint output part; flowmeters placed outside the introduction pipe and measuring the flow rate of the paint in the introduction pipe; and a determination unit for determining whether the condition of the paint is normal on the basis of the result of measurement by the flow meters. The flow meter can be placed between an air motor and a valve. The flow meters can be placed downstream and upstream of the valve, respectively. The flow meters can be placed downstream and upstream of a joint, respectively. The flow meters can be placed downstream and upstream of a pump, respectively.
MULTI PART ASSEMBLY THAT SIMPLIFIES THE APPLICATION OF PRIMER SOLVENTS AND PLASTIC BONDING CEMENTS AND/OR AGENTS TO PLASTIC AND/OR PVC PIPING
The present invention is a system and method facilitating the application of PVC primer or PVC cement to the inner surfaces of PVC unions, PVC sleeves, and the outer surfaces of PVC pipes. The invention consists of a PVC primer or PVC cement reservoir, a method of filing the PVC reservoir, and forcing the PVC primer or PVC cement through a series of tubes and holes in the apparatus and into a foam applicator which transfers the PVC primer or PVC cement onto the inner surface or onto the outer surface of a PVC union, PVC sleeve, or PVC pipe to a predetermined depth thus reducing waste of the PVC primer or PVC cement. The foam applicator housing contains a foam applicator specifically for applying PVC primer or PVC cement to either the inner surface of a PCV union, PVC sleeve, or to the outer surface of a PVC pipe giving a uniform application of PVC primer or PVC cement.
HOT MELT ADHESIVE DISTRIBUTION SYSTEM
A distribution system for storing and conveying a supply of material is described. The distribution system includes a bin for storing and conveying a supply of material. The bin includes a housing defining an internal chamber configured to receive the material, at least one outlet configured to direct the material from the bin, a plate defining a lower end of the internal chamber and supporting and directing the material to the at least one outlet, an agitation device attached to the plate, and a gasket disposed between the plate and the housing.
System and method for active adhesive recirculation control
A method for controlling a recirculation pump assembly is disclosed. The method includes receiving a process-dependent characteristic and determining a recirculation flow rate of adhesive that flows to the recirculation pump assembly based on the process-dependent characteristic. The method further includes determining a recirculation pump speed of the recirculation pump assembly for pumping the adhesive to a supply channel using the recirculation flow rate, and adjusting an operating speed of the recirculation pump assembly to match the recirculation pump speed. A system and storage device for performing the above method are also disclosed.
Sealant discharging nozzle and sealant discharging apparatus
A sealant discharging nozzle includes a nozzle body, a flat surface, a nozzle positioning portion, and a locating pin. The flat surface is provided on the nozzle body and is formed on a discharge port side of a through hole that extends along a central axis of the nozzle body. The nozzle positioning portion includes a pair of tapered surfaces disposed on both sides of the flat surface in a width direction of the flat surface. The locating pin is formed between the pair of tapered surfaces.
Methods, Apparatuses, and Systems for Smart Delivery of Coating Material
Methods, systems, and apparatuses are disclosed for controlling the release of a coating material to a substrate surface, with the system and apparatuses emulating an experienced human artisan by sensing condition parameters and substrate parameters and comparing parameters to stored parameter values and value ranges.
Bath systems and methods thereof
A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.
Inflow base for a fluidizing apparatus
An inflow base which is permeable to process air and includes openings for the process air which flows thought the inflow base. The inflow base is arranged in the fluidizing apparatus in a manner rotatable about an axis Z of the fluidizing apparatus and subdivides this into a distribution chamber and into a vortex chamber. The inflow base of the fluidizing apparatus includes at least a first and a second inflow base plate, wherein one of the inflow base plates at its outer end includes or forms a sealing element.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes a substrate holding section that holds a substrate, a processing tank that stores a processing liquid allowing the substrate held by the substrate holding section to be immersed in, and a plurality of bubble generating pipes that each supply a gas to the processing liquid to generate bubbles in the processing liquid. Of the plurality of bubble generating pipes, a flow rate of a gas supplied to an outer bubble generating pipe located below an outer region of the substrate immersed in the processing liquid differs from a flow rate of a gas supplied to an inner bubble generating pipe located below a central region of the substrate.
Processing chamber mixing systems
Exemplary processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.