Patent classifications
B05D1/005
RESIST DISPENSING SYSTEM AND METHOD OF USE
In a method, a resist material is dispensed through a tube of a nozzle of a resist pump system on a wafer. The tube extends from a top to a bottom of the nozzle and has upper, lower, and middle segments. When not dispensing, the resist material is retracted from the lower and the middle segments, and maintained in the upper segment of the tube. When retracting, a first solvent is flown through a tip of the nozzle at the bottom of the nozzle to fill the lower segment of the tube with the first solvent and to produce a gap in the middle segment of the tube between the resist material and the first solvent. The middle segment includes resist material residues on an inner surface wall of the tube and vapor of the first solvent. The vapor of the first solvent prevents the resist material residues from drying.
IONIC LIQUID PEROVSKITE DEVICES
A method including forming a lead halide precursor ink comprising a group 1 metal halide, a lead halide, an ionic liquid, and a solvent; depositing the lead halide precursor ink onto a substrate; drying the lead halide precursor ink to form a lead halide film; and annealing the lead halide film.
METHOD FOR FABRICATING A FILM
A method for fabricating a film comprising at least one polymer layer, formed of polyazulene, or of a copolymer, wherein one of the monomers is azulene, or of any combination thereof, wherein the film is situated on at least one surface of a substrate, is disclosed. The method comprises the steps of: a) forming an oxidant layer on a deposition surface by applying a solution comprising an oxidant on the deposition surface; b) forming a polymer layer formed of polyazulene, or of a copolymer, wherein one of the monomers is azulene, or of any combination thereof, by exposing the deposition surface to at least azulene monomer vapour at a polymerization temperature of 20 - 95° C. under atmospheric pressure, wherein step a) precedes step b), and wherein, during step b), the temperature of the deposition surface differs from the polymerization temperature by 0 - 30° C.
Substrate processing apparatus and method of machining tubular guard
A substrate processing apparatus includes a rotational holding member that rotates a substrate around a predetermined rotational axis while holding the substrate, a liquid supply member that supplies a liquid to the substrate held by the rotational holding member, and a resin-made tubular guard that surrounds the substrate held by the rotational holding member. The tubular guard has an inner peripheral surface and an uneven portion disposed at the inner peripheral surface. The uneven portion has a plurality of recessed portions and a plurality of protruding portions placed between the recessed portions adjacent to each other. The recessed portion has a width smaller than a diameter of a liquid droplet scattering from the substrate held by the rotational holding member and a depth in which the liquid droplet does not come into contact with a bottom portion of the recessed portion in a state in which the liquid droplet is in contact with the protruding portions. The protruding portion has a width that is smaller than the diameter of the liquid droplet and that is smaller than the width of the recessed portion.
Thin Film Coating Packaging for Device Having Meltable and Wetting Links
A method for creating a dielectric thin-film coating for devices having a fusible element is disclosed. The method comprises mixing insoluble and soluble polymers in solid form and exposing the mixture to heat to create a melt mixture. The melt mixture is then dissolved in a solvent to create a slurry which can then be deposited on the device as a thin-film coating to create an interior insulation layer or an external surface.
System for coating a substrate
A system and/or method for coating a substrate. The system may include a chuck for holding and rotating the substrate, a dispensing subsystem for dispensing a coating material onto the substrate, and a shield member. The shield member may be movable towards and away from the substrate during the coating procedure. The shield member may have an inverted funnel shape. The shield member may include a central chamber through which a solvent vapor flows and a peripheral chamber that is fluidly separated from the central chamber through which a gas flows. During a coating procedure, the shield member may be moved very close to the substrate and the solvent vapor and gas may flow onto the substrate to create a solvent rich ambient around the substrate and prevent aerosols of the coating material from redepositing onto the substrate after being flung off due to spinning of the substrate.
COATING METHOD, COATING APPARATUS AND RECORDING MEDIUM
A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.
METHOD FOR APPLYING A PROTECTIVE COATING TO A HAUL TRUCK TRAY
Embodiments herein provide a method of applying a protective coating to a haul truck tray, The method includes (i) installing a mould on at least a portion of the haul truck tray, (ii) placing the at least a portion of the haul truck tray into a jig framework, (iii) heating at least a portion of the haul truck tray placed on the jig framework, (iv) providing a source of fluid protective coating at an elevated point on the at least a portion of the haul truck tray placed on the jig framework, (v) coating at least a portion of the haul truck tray surface with a substantially uniform layer of fluid protective coating, and (vi) allowing the substantially uniform layer of fluid protective coating to cure.
SPIN DISPENSER MODULE SUBSTRATE SURFACE PROTECTION SYSTEM
A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.
System and method for dispensing liquid spin-on glass (SOG) onto semiconductor wafers
A spin-on glass (SOG) depositing system includes a suck back (SB) valve arranged to receive SOG. The SOG depositing system further includes a SOG dispenser having a nozzle, the SOG dispenser coupled with the SB valve for receiving SOG. The SOG depositing system further includes a detector positioned to detect SOG outside the nozzle. The SOG depositing system further includes an SB valve controller coupled with the detector for receiving one or more signals from the detector and coupled with the SB valve for controlling operation of the SB valve, wherein the SB valve controller is configured to pause sensing by the detector based on the sensed amount of SOG outside the nozzle being outside at least one operating parameter.