A substrate processing apparatus includes a chamber body having an upper opening, a chamber lid part having a lower opening, and a shield plate arranged in a lid internal space of the chamber lid part. The radial dimension of the shield plate is greater than that of the lower opening. Covering the upper opening of the chamber body with the chamber lid part forms a chamber that internally houses a substrate. In the substrate processing apparatus, before the substrate is conveyed and the chamber is formed, the lid internal space of the chamber lid part is filled with the gas supplied from a gas supply part, in a state in which the shield plate overlaps with the lower opening. This allows the chamber to be quickly filled with the gas to achieve a desired low oxygen atmosphere after the formation of the chamber.

A paint hardening device is a device for hardening paint applied to a workpiece and includes an electron beam emission portion configured to emit an electron beam to harden the paint, and a storage chamber in which the electron beam emission portion is accommodated. The paint hardening device is configured to move the workpiece and the electron beam emission portion relative to each other while the electron beam is being applied to the paint from the electron beam emission portion in a state where an inert gas atmosphere is formed at least in an electron-beam passing region where the electron beam passes in the storage chamber, the electron beam being applied to the paint from the electron beam emission portion.

Methods for treating cellulosic materials comprising introducing a liquid treating composition into the cellulosic material, the treating composition comprising an aqueous alkaline copper-containing solution comprising copper tetraammine carbonate; and exposing the cellulosic material provided thereby to carbon dioxide to provide treated cellulosic material.

A substrate processing apparatus includes a chamber body having an upper opening, a chamber lid part having a lower opening, and a shield plate arranged in a lid internal space of the chamber lid part. The radial dimension of the shield plate is greater than that of the lower opening. Covering the upper opening of the chamber body with the chamber lid part forms a chamber that internally houses a substrate. In the substrate processing apparatus, before the substrate is conveyed and the chamber is formed, the lid internal space of the chamber lid part is filled with the gas supplied from a gas supply part, in a state in which the shield plate overlaps with the lower opening. This allows the chamber to be quickly filled with the gas to achieve a desired low oxygen atmosphere after the formation of the chamber.

A system for manufacturing a thermoplastic prepreg includes a double belt mechanism that is configured to compress a fiber mat, web, or mesh that is passed through the double belt mechanism, a resin applicator that is configured to apply monomers or oligomers to the fiber mat, web, or mesh, and a curing oven that is configured to effect polymerization of the monomers or oligomers and thereby form the thermoplastic polymer as the fiber mat, web, or mesh is moved through the curing oven. The double belt mechanism compresses the fiber mat, web, or mesh and the applied monomers or oligomers as the fiber mat, web, or mesh is passed through the curing oven so that the monomers or oligomers fully saturate the fiber mat, web, or mesh. Upon polymerization of the monomers or oligomers, the fiber mat, web, or mesh is fully impregnated with the thermoplastic polymer.

A method of photografting organic molecules to a metal oxide comprising: (a) contacting a substrate having a metal oxide layer on a surface thereof with an acrylate, derivative thereof or a photolabile functional group; and (b) exposing the metal oxide layer and the acrylate, derivative thereof or photolabile group to UV or visible radiation to form covalent bonds between the metal oxide and the acrylate, the derivative thereof or the photolabile.

Methods and associated systems for preparing a nano-protective coating are disclosed. The method includes (1) placing a substrate in a reaction chamber of a nano-coating preparation equipment; (2) introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar); (3) turning on a movement mechanism so that the substrate is moved in the reaction chamber; (4) introducing a monomer vapor into the reaction chamber to achieve a vacuum degree of 30-300 mTorr; and (5) turning on a plasma discharge for chemical vapor deposition to form an organosilicon nano-coating on a surface of the substrate.

The film production method includes: forming an ink layer on the base substrate covering the surface of the base substrate, the ink layer including a solvent and a film-forming material dissolved in the solvent; blowing gas to the ink layer so that the solvent in the ink layer spreads towards the periphery of the base substrate; removing the solvent in the ink layer so that the film-forming material in the ink layer forms a film covering the surface of the base substrate.

The present invention relates in particular to a method and a device for a spatially resolved production of a location dependent textured coating. The method includes the steps of provisioning a two-dimensional representation, evaluating a data record of the two-dimensional representation, determining local structures of the two-dimensional representation, determining the type and location of at least one texture that is produced on at least one region of the two-dimensional representation, provisioning a fluid coating material, and applying the fluid coating material to at least one region of the two-dimensional representation.

A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.