A method of modifying substrate surface includes: performing an O.sub.2 plasma treatment on a substrate including polydimethylsiloxane (PDMS); coating hydrophilic UV curing coating uniformly on the substrate; disposing the substrate into an oxygen-free environment; and exposing to an UV light to cure the hydrophilic UV curing coating. The method of modifying substrate surface may greatly enhance the hydrophilicity and the stability of the PDMS substrate.

Systems and methods for coating surgical needles are provided.

Introduced here is a plasma polymerization apparatus. Example embodiments include a reaction chamber in a shape substantially symmetrical to a central axis. Some examples further include a rotation rack in the reaction chamber. The rotation rack may be operable to rotate relative to the reaction chamber about the central axis of the reaction chamber. Examples may further include reactive species discharge mechanisms positioned around a perimeter of the reaction chamber and configured to disperse reactive species into the reaction chamber in a substantially symmetrical manner from the outer perimeter of the reaction chamber toward the central axis of the reaction chamber, such that the reactive species form a polymeric coating on surfaces of the one or more substrates during said dispersion of the reactive species, and a collecting tube positioned along the central axis of the reaction chamber and having an air pressure lower than the reaction chamber.

Provided is a pore-filling method for protecting the pores of a porous material. The method, which is performed using a modified i-CVD technique, involves filling the pores of a porous material with a gas phase monomer within a pressure chamber and subsequently polymerizing the monomer, both within the pores and on the surface of the material as an overburden. The method is solvent-free and can fill and protect pores of any size of any material.

An apparatus and a method for coating substrates with washcoats in which a substrate (10) is engaged with a headset (6) of a substrate coating apparatus (1) below a washcoat showerhead (5) are disclosed. The washcoat is discharged from the washcoat showerhead (5) onto an upper surface (12) of the substrate under control of a valve assembly (4) before being drawn through the substrate by use of a vacuum generator (7). The valve assembly (4) comprises an outlet valve movable between a closed state and an open state. The valve assembly (4) creates a pressure drop within an interior of the washcoat showerhead (5) when the outlet valve moves from its open state to its closed state.

The present invention discloses an organic polymer film and a manufacturing method thereof. The organic polymer film is mainly manufactured by the following steps. Firstly, the step (A) provides a xylene precursor and a substrate, and the step (B) places the substrate inside of a plasma equipment. After that, the step (C) evacuates the plasma equipment while introducing a carrier gas which carries vapor of the xylene precursor, and the step (D) turns on a pulse power supply system of the plasma equipment, generating a short pulse for plasma ignition. Finally, the step (E) forms the organic polymer film on the substrate. In the aforementioned steps, the frequency of the short pulse plasma is between 1 Hz˜10,000 Hz, and the pulse period of the short pulse plasma is between 1 μs˜60 μs.

To provide a joined member manufacturing apparatus, a method for manufacturing a joined member, and a method for manufacturing a member on which an applied material has been applied, with which it is possible to apply an applied material even in cases where a projection is present in the vicinity of an outer side of an application width of an applied material to be applied on an application target surface. A joined member manufacturing apparatus includes an application device including die head 10 having a distance between the ejection port forming groove and an outer edge of the first opposing face at a portion where an ejection port is formed being 0.1 mm to 1.0 mm, a first suction stage 20A, a second suction stage 20B, an ultraviolet irradiator 45 configured to radiate an ultraviolet ray, a chamber 51 formed to have a size enabling the chamber 51 to accommodate the first and second suction stages 20A and 20B at the same time, the chamber 51 being configured such that a degree of vacuum inside the chamber 51 is adjustable by an operation of a vacuum pump 53, where the applied material G is configured such that viscosity of the applied material G changes when the applied material G is irradiated with an ultraviolet ray.

Introduced here is a plasma polymerization apparatus. Example embodiments include a reaction chamber in a shape substantially symmetrical to a central axis. Some examples further include a rotation rack in the reaction chamber. The rotation rack may be operable to rotate relative to the reaction chamber about the central axis of the reaction chamber. Examples may further include reactive species discharge mechanisms positioned around a perimeter of the reaction chamber and configured to disperse reactive species into the reaction chamber in a substantially symmetrical manner from the outer perimeter of the reaction chamber toward the central axis of the reaction chamber, such that the reactive species form a polymeric coating on surfaces of the one or more substrates during said dispersion of the reactive species, and a collecting tube positioned along the central axis of the reaction chamber and having an air pressure lower than the reaction chamber.

The present invention relates to a method for forming a polymeric nanocoating on a substrate as well as substrates bearing the polymeric nanocoating. The method comprises exposing the substrate to a plasma comprising one or more unsaturated monomeric species for a period of time sufficient to allow the coating to form on the substrate. The one or more unsaturated monomeric species comprise (i) an aromatic moiety and (ii) a carbonyl moiety. The one or more unsaturated monomeric species also comprise a crosslinking reagent.

The present disclosure provides a hydrophobic low-dielectric-constant film and a preparation method therefor. The low-dielectric-constant film is formed from one or more fluorine-containing compounds A by means of a plasma enhanced chemical vapor deposition method, and the one or more fluorine-containing compounds comprise a compound having the general formula C.sub.xSi.sub.yO.sub.mH.sub.nF.sub.2x+2y−n+2 or C.sub.xSi.sub.yO.sub.mH.sub.nF.sub.2x+2y−n, x being an integer from 1 to 20, y being an integer from 0 to 8, m being an integer from 0 to 6, and n being 0, 3, 6, 7, 9, 10, 12, 13, 15, 16, 17 and 19. Thus, a nano-film having a low dielectric constant and good hydrophobicity is formed on the surface of a substrate.