Patent classifications
B05D3/068
UREA (MULTI)-URETHANE (METH)ACRYLATE-SILANE COMPOSITIONS AND ARTICLES INCLUDING THE SAME
Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula R.sub.ANHC(O)N(R.sup.4)R.sup.11[OC(O)NHR.sub.s].sub.n, or R.sub.SNHC(O)N(R.sup.4)R.sup.11[OC(O)NHR.sub.A].sub.n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described. Methods of using multilayer composite films as barrier films in articles selected from solid state lighting devices, display devices, and photovoltaic devices are also described.
Method to make a photoconductor drum having an overcoat using a dual curing process
A method of preparing an organic photoconductor drum having a protective overcoat on its outermost surface is provided. In an example embodiment, a photoconductor drum having an electrically conductive substrate, a charge generation layer, a charge transport layer and an outermost protective overcoat layer is provided. The photoconductor drum is cured using a two-step process. The first curing step applies either ionizing irradiation, such as with an electron beam or by gamma rays or applies non-ionizing irradiation such as ultraviolet light to the photoconductor drum. A mask is sized and placed over the print area of the initially cured photoconductor drum, thereby exposing the outermost edges of the photoconductor drum. The outer edges of the masked photoconductor drum is then exposed to a second curing step using ultraviolet light irradiation.
Drug delivery system and method of manufacturing thereof
A method of modifying the surface of a medical device to release a drug in a controlled way by providing a barrier layer on the surface of one or more drug coatings. The barrier layer consists of modified drug material converted to a barrier layer by irradiation by an accelerated neutral beam derived from an accelerated gas cluster ion beam. Also medical devices formed thereby.
GAS-BARRIER LAMINATED SHEET, PROCESS FOR PRODUCING GAS-BARRIER LAMINATED SHEET, AND ELECTRONIC MEMBER OR OPTICAL MEMBER
The present invention relates to: a gas-barrier laminated sheet having a layer structure of release sheet (A)/gas-barrier layer/adhesive resin layer/release sheet (B), wherein arithmetic average roughness (Ra) of a surface on the release sheet (A) side of the gas-barrier layer is 5 nm or less, and maximum cross-section height (Rt) of the surface is 100 nm or less; a process for producing the gas-barrier laminated sheet; and an electronic member or an optical member, including a gas-barrier layer and an adhesive resin layer derived from the gas-barrier laminated sheet. The present invention provides: a gas-barrier laminated sheet excellent in sealing performance and bending properties and a process for producing the same, and an electronic member and an optical member including a gas-barrier layer and an adhesive resin layer derived from the gas-barrier laminated sheet.
PERSONALIZED SUBSTRATES
In one embodiment, a method includes determining an ornamental pattern to be transferred to a substrate. The ornamental pattern is specific to a particular user, and one or more parameters of the ornamental pattern are based at least in part on social-graph information of the user. The method also includes generating one or more instructions for controlling a laser-treatment system to transfer the ornamental pattern to the substrate; sending the instructions to the laser-treatment system to transfer the ornamental pattern to the substrate; and transferring the ornamental pattern to the substrate.
Urea (multi)-urethane (meth)acrylate-silane compositions and articles including the same
Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula R.sub.ANHC(O)N(R.sup.4)R.sup.11[OC(O)NHR.sub.S].sub.n, or R.sub.SNHC(O)N(R.sup.4)R.sup.11[OC(O)NHR.sub.A].sub.n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described. Methods of using multilayer composite films as barrier films in articles selected from solid state lighting devices, display devices, and photovoltaic devices are also described.
METHOD FOR PRODUCING PRINTED MATTER AND PRINTING MACHINE
Provided are a method for producing a printed matter and a printing machine which suppress the decrease of transferability and improve adhesiveness between ink and a film substrate when ink is printed on the film substrate. The method for producing a printed matter of the present invention is a method for producing a printed matter by printing ink on a film, which uses a film having a nitrogen element concentration of 0.5 to 10.0 atom % in the film surface, and includes irradiating with an active energy ray after printing.
Lithography patterning with a gas phase resist
Disclosed is an apparatus for lithography patterning. The apparatus includes a substrate stage configured to hold a substrate coated with a deposition enhancement layer (DEL), a radiation source for generating a patterned radiation towards a surface of the DEL, and a supply pipe for flowing an organic gas near the surface of the DEL, wherein elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL.
ELECTRON BEAM CURABLE INKJET FORMULATIONS WITH IMPROVED CHEMICAL RESISTANCE
The present invention is directed to a method for printing energy curable ink and coating compositions comprising high amounts of monofunctional monomers that exhibit both good adhesion to plastic substrates, and good solvent resistance. The method of the present invention employs electron beam curing of the ink and coating compositions, at accelerating voltages greater than or equal to 70 keV, and electron beam doses greater than or equal to 30 kGy, and preferably greater than or equal to 40 kGy.
COVER FILM
The present invention provides a cover film for a bending display, and the cover film includes a transparent base film and a hard coat layer formed on at least one surface of the transparent base film, in which the hard coat layer has a thickness of 23 m or less, and an end surface of the hard coat layer has a line roughness of 2.5 m or less.