In one embodiment, the present application discloses a photo-cleavable surface binding compound of the Formula I and Formula II:

##STR00001##

wherein the variables EG, EG1, SP1, SP2, SP3, Ar and BG are as defined herein. In another embodiment, the application discloses a method for forming a coating on a surface of a substrate using the surface binding compound.

The invention is generally related to a method for producing, in a consistent manner, contact lenses each having an intact durable coating thereon, wherein the coating is a hydrogel coating formed by covalently attached a hydrophilic polymeric material having azetidinium groups onto a base coating of a polyanionic polymer on a contact lens at a relatively low temperature (e.g., from about 40° C. to about 60° C.). The coating temperature for forming a durable hydrogel coating on top of the base coating of a contact lens can be significantly lowered by raising, in situ, the pH (to about 9.5 or higher) of a reactive coating solution which contains the hydrophilic polymeric material having azetidinium groups.

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being −4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.

Methods of forming vias in substrates having at least one damage region extending from a first surface etching the at least one damage region of the substrate to form a via in the substrate, wherein the via extends through the thickness T of the substrate while the first surface of the substrate is masked. The mask is removed from the first surface of the substrate after etching and upon removal of the mask the first surface of the substrate has a surface roughness (Rq) of about less than 1.0 nm.

A polypeptide including a region A, a region B, and a region C, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.

A substrate processing method includes forming a liquid film of an alkaline processing liquid on a substrate by supplying the alkaline processing liquid having a reduced oxygen concentration onto the substrate; and etching the substrate by rotating the substrate while supplying the alkaline processing liquid in a state that the liquid film having a given thickness is formed on the substrate.

In accordance with the present application, there is provided a release liner and method of preparing a liner for a label assembly. The release liner includes paper having a first side that does not have a machine finish or gloss finish or a coating; and a silicone treatment applied to the first side of the paper. The method of preparing a liner for a label assembly includes applying a coat of silicone to a paper at a side of the paper that does not have a machine finish or gloss finish and is otherwise uncoated; and curing the silicone. The release liner includes paper having a silicone coat weight of 0.5 lb/ream or less.

The invention provides processes for the manufacture of conductive transparent films and electronic or optoelectronic devices comprising same.

A problem is to provide a method and a device for producing a conductive polymer conductor according to which a conductive polymer cm be easily adhered to a base material with high accuracy. A solution is a production device 10 equipped with a heating means 11 for heating a base material 22, a raw material application means 12 for applying, to the base material 22, a raw material solution containing a monomer of the conductive polymer, and a producing solution application means 13 for applying, to the base material 22, a producing solution containing an oxidizing agent for promoting polymerization of the monomer, a dopant for developing electrical conductivity in the conductive polymer, and a viscosity improver for improving viscosity. The raw material solution is applied thereto after heating the base material 22 or while heating the base material 22, and then the producing solution is applied thereto.

A method of forming a passivated pigment slurry includes combining a resin and a pigment to form a pigment-resin slurry, wherein the pigment includes a plurality of flakes each having a surface. After combining, the method includes mixing the pigment-resin slurry and an orthosilicate to form a coated pigment-resin slurry. The coated pigment-resin slurry includes the resin and a coated pigment including the plurality of flakes each encapsulated by a first layer formed from silica and disposed on the surface. The method further includes reacting the coated pigment-resin slurry and an organosilane compound having a hydrolysable group and an organic functional group to coat the first layer and thereby form the passivated pigment slurry. The passivated pigment slurry includes the resin and a passivated pigment including the plurality of flakes each coated with a second layer disposed on the first layer.