The disclosed technology includes a fluid heating device that can include a heating chamber in communication with a heating element, and an ultrasonic transducer in communication with the heating chamber and for transmitting ultrasonic sound waves. The disclosed technology includes an ultrasonic transducer system that includes an assembly configured to attach to a fluid heating device, and an ultrasonic transducer affixed to the assembly. The disclosed technology also includes a method for ultrasonic cleaning within a fluid heating device that can include a controller configured to receive flow data from a flow sensor; based on the flow data, determine that fluid is flowing through a heating chamber; and output instructions for an ultrasonic transducer to output ultrasonic sound waves.

A method of fabricating a film vibration device, including: photoetching a surface of a silicon wafer to form a circular-hole array; etching an aluminum layer on the silicon wafer; etching the silicon wafer to form a through-hole array to obtain a porous silicon wafer; attaching a polyethylene terephthalate (PET) sheet to a side of the porous silicon wafer; ablating the PET sheet to obtain a porous PET film; attaching a polyvinylidene fluoride (PVDF) film to a lower side of the porous silicon wafer; performing vacuumization above the porous silicon wafer, while heating the PVDF film below the porous silicon wafer to create dome micro-structures on the PVDF film; and laminating the porous PET film on each of two sides of the PVDF film to obtain the film vibration device. This application also provides a cleaning device having the film vibration device.

Methods and apparatus for cleaning brushes quickly, comfortably and efficiently are disclosed. The apparatus contains at least one cleaning chamber comprising a plurality of cleaning elements disposed within the chamber that contacts the brushes during cleaning, the cleaning chamber in contact with a) a drive and a motor that can deliver rapid reciprocating motions to the cleaning elements, b) a solvent flow system, and c) a removable brush holder connected to a motor that turns the brushes slowly over the cleaning elements. Rapid reciprocating motions of the cleaning elements, continuous flow of a solvent over the brushes to be cleaned and a slow rotation of the brush itself over the cleaning elements achieve rapid cleaning of brushes with little damage to the brush itself. A removable brush holder that can accommodate many different kinds of brushes in the same slot extends the functionality and comfort of using the brush cleaner.

The present invention discloses a method for effectively cleaning vias, trenches or recessed areas on a substrate using an ultra/mega sonic device, comprising: applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency f.sub.1 and power P.sub.1 to drive said ultra/mega sonic device; after the ratio of total bubbles volume to volume inside vias, trenches or recessed areas on the substrate increasing to a first set value, setting said ultra/mega sonic power supply at frequency f.sub.2 and power P.sub.2 to drive said ultra/mega sonic device; after the ratio of total bubbles volume to volume inside the vias, trenches or recessed areas reducing to a second set value, setting said ultra/mega sonic power supply at frequency f.sub.1 and power P.sub.1 again; repeating above steps till the substrate being cleaned.

A system for delivering ultrasonic energy to a transducer load has at least one ultrasonic transducer, and a radio frequency (RF) generator for delivering RF power to the transducer load. The RF generator has an output circuit that has at least one tunable resonant frequency, a voltage circuitry system that senses an output voltage waveform, a current circuitry system that senses an output current waveform, and a phase detector circuit for measuring a phase differential between the output voltage waveform and the output current waveform. The phase detector circuit has an XOR gate that receive a voltage signal input and a current signal input, a comparator that compares the measured phase differential to a desired phase difference to generate a phase value; and a motor controller evaluates the phase value and based on the phase value automatically repositions or maintains the position of a moveable metallic core within a variable inductor, to generate a desired ultrasonic transmission in a liquid wherein the voltage and current phases are approximately aligned.

A dual-frequency ultrasonic cleaning apparatus is disclosed. The dual-frequency ultrasonic cleaning apparatus includes a frequency generator for generating an oscillation frequency of sinusoidal waves, a first transducer for generating a first frequency of ultrasonic waves on the basis of the received oscillation frequency, a second transducer for generating a second frequency of ultrasonic waves on the basis of the received oscillation frequency, an output value measuring unit for measuring output values of the ultrasonic waves generated by the first transducer and the second transducer, and a controller for selecting the oscillation frequency to be generated by the frequency generator within a predetermined bandwidth with respect to a reference band frequency such that the output values of the ultrasonic waves generated by the first transducer and the second transducer become maximum.

An ultrasonic cleaning apparatus comprising: a tank for in use receiving a cleaning liquid and an item to be cleaned; a plurality of transducers arranged, when driven, to direct ultrasonic pressure waves into the tank; and a controller arranged in use to drive the transducers. First and second transducers from the plurality of transducers are arranged in use to direct ultrasonic pressure waves into an overlapping volume; and the controller is arranged in use to drive the first and second transducers to produce ultrasonic pressure waves at different frequencies from each other. The controller is arranged to in use produce first and second drive signals for the transducers using first and second frequency generators to each switch between primary and secondary operation, with the sequential switching taking place to cause different combinations of primary and secondary operation for the first and second frequency generators to occur over time.

A system comprises a support, typically part of dishwashing machine or clothes washing machine, having a plurality of piezoelectric transducers. Each transducer can have a cylindrical housing with a water inlet along a side surface of the housing. The transducers can also comprise a lens and a piezoelectric material with electrodes configured to couple to a power supply.

A laundry appliance includes a drum that rotationally operates within a tub. A fluid delivery system selectively delivers wash fluid to the drum. A rotator rotationally operates within the drum. The rotator selectively operates independent of the drum and about a common rotational axis of the drum and the rotator. A sanitizing mechanism includes an ultrasonic transducer. The ultrasonic transducer selectively delivers waves of an ultrasonic frequency into an amount of the wash fluid disposed within the drum and the rotator. The ultrasonic frequency generates air bubbles and causes cavitation of the air bubbles that directs a micro jet of air through the wash fluid and into articles being processed within the drum.

Methods of mitigating current overload of an ultrasonic system having an ultrasonic stack under load at startup are provided. The methods include beginning an ultrasonic cycle in the ultrasonic system having the ultrasonic stack that runs a closed loop phase control through the weld cycle by ramping up the power of the ultrasonic stack under load. During ramping up of the power of the ultrasonic stack under load, a controller lowers the phase to a negative phase. After ramping up the power of the ultrasonic stack under load is complete, the controller raises the phase to 0 degrees and the ultrasonic stack is operating at steady state and with the phase at 0 degrees.