An apparatus determines soiling of an object and includes a rinsing zone for rinsing off dirt particles built up on an object with a fluid. A collecting arrangement includes a retaining device for capturing the dirt particles rinsed off from the object and a measuring device measures a physical parameter of the captured dirt particles. A transport system moves the dirt particles captured with the retaining device to the measuring device to permit measuring the physical parameter of the captured dirt particles.

A spray washing cart apparatus, including: a cart (10); a nozzle array holder (14); at least one cleaning nozzle array (16.1) arranged on the nozzle array holder (14), the cleaning nozzle array (16.1) including a plurality of spray nozzles (18.1) for spray washing; a water distribution manifold (20, 22) for supplying water to the cleaning nozzle array (16.1); and a water pump (24) connectable to the cleaning nozzle array (16.1) through the manifold (20, 22), wherein the water pump (24) is mounted on the cart (10), wherein the cleaning nozzle array (16.1) extends in a first direction (1), and wherein the nozzle array holder (14) is mounted on a top side of the cart (10) to be linearly moveable in a second direction (2) transverse to the first direction (1).

In a method of cleaning a substrate, a protecting liquid may be sprayed to a surface of the substrate from a first position in a first spray direction. Cleaning droplets may be injected on to the surface of the substrate. The protecting liquid may be sprayed to the surface of the substrate from a second position different from the first position in a second spray direction. For example, the protecting liquid may be always sprayed from the central portion toward the edge portions in the substrate so that the protecting liquid on the substrate may have a uniform thickness.

A fluidic oscillator insert is designed to project a full circumference spray pattern from a single outlet that is characterized by slightly convex or outwardly curving radius and a combination of full and partial protrusions immediately in front of the outlet, in combination with curved walls defining the throat of the outlet (and even outer surfaces of the housing), surprisingly produces full circumference, oscillating spray pattern. Further aspects of the invention include a system and a double exit insert, both of which also produce full circumference oscillating spray patterns.

A substrate processing apparatus includes a rotating holder for a substrate, a first nozzle used to eject a jet flow, a second nozzle used to discharge a continuous flow, and a nozzle moving unit integrally moving the first and second nozzles. A landing position of the continuous flow is located closer to a rotation center than a landing position of the jet flow is. At least movement paths of the landing positions of the jet flow and the continuous flow or flow directions of the continuous flow and the jet flow are different from each other. The movement paths are made to be different from each other by locating the landing position of the continuous flow downstream of the movement path of the landing position of the jet flow. The flow directions are made to be different from each other by tilting the continuous flow.

A surface washing drone with a modular cleaning head unit. The surface washing drone may also include a safety failover mechanism. The surface washing drone communicates and works together with other surface washing drones in a group.

A brushless car wash system includes a variable width. The width of the brushless car wash system is adjusted according to a width of a vehicle being washed. By adjusting the width of the brushless car wash system, wash performance of the brushless car wash system is increased.

A brushless car wash system includes a wash unit that washes upper surfaces of the vehicle. The height of the wash unit is adjusted based on the contour of the upper surfaces of the vehicle. Adjusting the height of the wash unit results in increased wash performance of the brushless car wash system.

An apparatus for cleaning flat objects such as semiconductor wafers with a pulsed liquid jet emitted from a group of nozzles that may be installed on one or on both sides of the wafer installed in a vertically arranged rotating chuck. The apparatus is comprised of a series of individual processing units, such as a loading unit, cleaning units, drying unit, and an unloading unit arranged circumferentially around a universal industrial robot capable of reaching any of the units and transferring the wafers between the units. Drying is carried out in a horizontal position of the wafer and may combine spin-dry with chemical treatment for accelerating the drying process and for improving quality of the drying process. All units are located in a sealed enclosure with a controlled purity of the atmosphere inside the enclosure. Method of cleaning is also disclosed.

A photovoltaic (PV) module cleaning system can include a robotic cleaning device and a support system. The support system can be configured to provide a metered fill to the robotic cleaning device. In some embodiments, the robotic cleaning device and include a curved cleaning head. Various techniques for deploying a robotic cleaning device on PV modules include out-and-back, leapfrog, among others.