There is provided a substrate processing apparatus including: a rotatable holding part configured to rotate a substrate while holding the substrate; a liquid supply part configured to supply a processing liquid to a peripheral edge portion of the substrate held by the rotatable holding part; a sensor configured to detect a temperature distribution at the peripheral edge portion; and a controller configured to execute an operation of detecting a boundary portion between a region of the peripheral edge portion to which the processing liquid adheres and a region of the peripheral edge portion to which the processing liquid does not adhere, based on the temperature distribution.

Provided is a double-station cleaning system comprising a cleaning machine, wherein workpieces are placed into the feeding frames, the feeding frames are placed into trays, the bracket assembly is pushed to drive the trays to move along the guide rail assembly, the feeding frame in one of the trays is conveyed to a feeding inlet of the cleaning machine, the feeding frame is pushed to move along two rows of nylon wheels and linear guide rails inside the cleaning machine, and the feeding frame and the workpieces in the feeding frame are pushed into the cleaning machine so as to be cleaned. The double stations work alternately, so that the work time is saved, and the work efficiency is increased.

Systems and methods for cleaning vehicle sensors are disclosed that optimize sensor cleaning fluid usage. An exemplary vehicle sensor cleaning system includes a sensor cleaning fluid delivery system that delivers sensor cleaning fluid to a sensor of a vehicle and a sensor cleaning control system in communication with the sensor cleaning fluid delivery system. The sensor cleaning control system determines a target cleanliness level for the sensor based on sensor cleaning data associated with the sensor. The target cleanliness level is less than a maximum cleanliness level indicating indicates a contaminate-free sensor. The sensor cleaning control system further monitors a cleanliness level of the sensor and initiates a sensor cleaning operation when the cleanliness level of the sensor is less than an operational cleanliness threshold, such that the sensor cleaning fluid delivery system delivers sensor cleaning fluid to the sensor to clean the sensor to the target cleanliness level.

A substrate processing apparatus includes a chamber, a substrate holding unit, an elevated/lowered member, and an elevation/lowering driving unit. The chamber includes a base plate having an upper surface that defines a housing space. The substrate holding unit is housed in the housing space, is placed on the upper surface of the base plate, and holds a substrate. The elevated/lowered member is elevated and lowered inside the housing space. The elevation/lowering driving unit drives the elevation and lowering of the elevated/lowered member. The elevation/lowering driving unit includes a driving source, disposed higher than a lower surface of the base plate, and an elevating/lowering head, which is connected to a guard and is moved vertically by the driving source within a movable range in which an entirety of the head is positioned higher than the lower surface of the base plate.

The inventive concept provides a substrate treating method. The substrate treating method comprising: a liquid treating step for cleaning a substrate by supplying a treating liquid to the substrate in a first process chamber; a transfer step for transferring the substrate to a second process chamber after the liquid treating step; and a drying step for removing the treating liquid remaining on the substrate in the second process chamber, and wherein the method further comprises a standby step of a liquid treated substrate to standby in the first process chamber when the liquid treated substrate of the liquid treating step cannot be transferred to the second process chamber, and at the standby step the treating liquid is discharged until the substrate can be transferred to the second process chamber.

Systems, apparatus, methods, and articles of manufacture provide for cleaning a mobile device and other types of portable user devices. In one embodiment, a controller of a mobile device cleaning system may control a sterilization device for cleaning a mobile device (e.g., a phone). In one embodiment, one or more display devices may provide information to observers during a cleaning process.

A pump is disclosed which includes a pump body, a silencer connected to the pump body, and a condensation preventing device surrounding the silencer. A liquid supplying apparatus is also disclosed which includes the pump for providing a power to supply the liquid to outside, and a storage tank for storing a liquid.

A submersion conveyor system for processing materials that need to be completely submersed in a processing liquid, such as food products, the submersion conveyor system providing a continual looping motion with a conveyor belt and flights providing a semi-enclosed volume for containing the material to be processed, the semi-enclosed volume containing the material to be processed being completely submersed in at least a portion of a processing tank during operation to provide a washing, rinsing, coating, treating, sanitizing and/or chilling or heating of the processing materials.

A cleaning system for processing a substrate after polishing includes a sulfuric peroxide mix (SPM) module, at least two cleaning elements, and a plurality of robots. The SPM module includes a sulfuric peroxide mix (SPM) cleaner having a first container to hold a sulfuric peroxide mix liquid and five to twenty first supports to hold five to twenty substrates in the liquid in the first container, and a rinsing station having a second container to hold a rinsing liquid and five to twenty second supports to hold five to twenty substrates in the liquid in the second container. Each of the at least two cleaning elements are configured to process a single substrate at a time. Examples of a cleaning element include a megasonic cleaner, a rotating brush cleaner, a buff pad cleaner, a jet spray cleaner, a chemical spin cleaner, a spin drier, and a marangoni drier.

A system and method for cleaning disks includes a cleaning disk rotatably supported by a structural frame, the rotatable cleaning disk defining a plurality of holes, the plurality of holes carrying disks to be cleaned. The rotatable cleaning disk disposed between a first plurality of brushes and a second plurality of such that each of the first plurality of brushes and the second plurality of brushes contacting and agitating surfaces of the disks. A washing tank is supported by the structural frame and defines a reservoir of cleaning solution. At least a portion of the rotatable cleaning disk and the first and second pluralities of brushes are submerged in the cleaning solution. A blower forces heated air over the disks to be cleaned and removes cleaning solution from the disks, and a light source irradiates the disks to be cleaned for a predetermined amount of time.