A vehicle-cleaning system and method of cleaning a vehicle are provided, the system comprises a cleaning agent dispenser configured to administer a cleaning agent to a surface of a vehicle for cleaning, wherein the cleaning agent preferably comprises one or more nanoparticulate metal oxide. In one embodiment, the system comprises a chemical agent dispenser configured to separately administer a chemical agent to the surface of a vehicle to react with said cleaning agent to form a resultant foam. The system further comprises an electromagnetic wave emitting system for providing wavelength in a range of about 200 nm to about 380 nm to activate the nanoparticulate metal oxide.

A vehicle-cleaning system and method of cleaning a vehicle are provided, the system comprises a cleaning agent dispenser configured to administer a cleaning agent to a surface of a vehicle for cleaning, wherein the cleaning agent preferably comprises one or more nanoparticulate metal oxide. In one embodiment, the system comprises a chemical agent dispenser configured to separately administer a chemical agent to the surface of a vehicle to react with said cleaning agent to form a resultant foam. The system further comprises an electromagnetic wave emitting system for providing wavelength in a range of about 200 nm to about 380 nm to activate the nanoparticulate metal oxide.

To measure the concentration of an oxidant in an oxidative cleaning liquid used in a process of cleaning an electronic material in a simple, easy, consistent, and accurate manner without being affected by impurities included in the cleaning liquid, such as metals. A method for measuring the concentration of an oxidant in a sample liquid used as a cleaning liquid in a process of cleaning an electronic material includes decomposing at least part of an oxidant included in the sample liquid by heating or the like; measuring the amount of oxygen gas generated by decomposition of the oxidant; and determining the concentration of the oxidant in the sample liquid on the basis of the amount of the oxygen gas.

An automatic dishwashing composition is provided including a builder; a phosphonate; a nonionic surfactant; and a dispersant polymer comprising: 60 to 98 wt % of structural units of formula I ##STR00001##
wherein each R.sup.1 is independently selected from a hydrogen and a —CH.sub.3 group; and 2 to 40 wt % of structural units of formula II ##STR00002##
wherein each R.sup.2 is independently selected from a —C.sub.1-4 alkyl group and wherein each R.sup.3 is independently selected from a hydrogen and a methyl group.

An automatic dishwashing composition is provided including a builder; a phosphonate; a nonionic surfactant; and a dispersant polymer comprising: 60 to 98 wt % of structural units of formula I ##STR00001##
wherein each R.sup.1 is independently selected from a hydrogen and a —CH.sub.3 group; and 2 to 40 wt % of structural units of formula II ##STR00002##
wherein each R.sup.2 is independently selected from a —C.sub.1-4 alkyl group and wherein each R.sup.3 is independently selected from a hydrogen and a methyl group.

Methods and apparatus to treat workpieces are disclosed. A disclosed example equipment is to treat a workpiece with a process fluid, where the workpiece has a workpiece body with at least one cavity that extends from a first opening to a second opening. The example equipment includes a line system for providing the process fluid, where the line system has at least one line duct with an adapter for connecting the line system to the at least one cavity, a process chamber to receive the workpiece in treatment, where the process chamber includes an outlet to discharge a process fluid that has been induced into the cavity, and a suction installation to generate negative pressure, where the suction installation is connected to the process chamber by a suction duct to suction the process fluid from a fluid vessel through the at least one line duct and the at least one cavity into the process chamber.

An apparatus and method for removing support material from a part formed by three-dimensional (3D) printing. The support removal machine contains a tank for submersion of a 3D printed part into a liquid mass. The liquid mass circulates in the tank in a controlled manner such that submerged parts remain centrally suspended in the tank, regardless of the material, density and geometry comprising the part. The part circulates and rotates in conjunction with the rotational flow of the liquid mass for uniform exposure to means of support removal. During rotation, the part may be subjected to multiple means of agitation that include heat, chemical and ultrasonic, in order to optimize energy use and maximize efficiency of the removal of support material.

An apparatus and method for removing support material from a part formed by three-dimensional (3D) printing. The support removal machine contains a tank for submersion of a 3D printed part into a liquid mass. The liquid mass circulates in the tank in a controlled manner such that submerged parts remain centrally suspended in the tank, regardless of the material, density and geometry comprising the part. The part circulates and rotates in conjunction with the rotational flow of the liquid mass for uniform exposure to means of support removal. During rotation, the part may be subjected to multiple means of agitation that include heat, chemical and ultrasonic, in order to optimize energy use and maximize efficiency of the removal of support material.

Provided is a method of treating a substrate, the method comprising: heating a treatment liquid with a heater unit installed in a circulation line while circulating the treatment liquid in a housing of a tank through the circulation line coupled to the housing to adjust a temperature of the treatment liquid; evaporating water in the treatment liquid in the housing by heating the treatment liquid to a temperature higher than a temperature of water contained in the treatment liquid by the heater unit to adjust a concentration of a chemical liquid contained in the treatment liquid; and supplying the treatment liquid of which the temperature and the concentration are controlled to a substrate to treat the substrate, in which the evaporation of water from the treatment liquid stored in the housing is accelerated by supplying gas to the treatment liquid flowing through the circulation line.

Provided is a method of treating a substrate, the method comprising: heating a treatment liquid with a heater unit installed in a circulation line while circulating the treatment liquid in a housing of a tank through the circulation line coupled to the housing to adjust a temperature of the treatment liquid; evaporating water in the treatment liquid in the housing by heating the treatment liquid to a temperature higher than a temperature of water contained in the treatment liquid by the heater unit to adjust a concentration of a chemical liquid contained in the treatment liquid; and supplying the treatment liquid of which the temperature and the concentration are controlled to a substrate to treat the substrate, in which the evaporation of water from the treatment liquid stored in the housing is accelerated by supplying gas to the treatment liquid flowing through the circulation line.