A roasting and glazing apparatus includes a roaster, an agitator mounted within the roaster bowl for mixing a mixture of nuts and sugar during a roasting or glazing operation, a heater controlled to heat the roaster bowl during the roasting or glazing operation, and a cover removably mounted to the roaster bowl. The cover includes a reservoir for receiving water from a user and restricting water flow from the reservoir into the mixture of nuts and sugar in the roaster bowl. The cover and the roaster bowl together define a vent on a side of the cover opposite the reservoir. The vent is configured to direct steam out of the roaster bowl in a direction away from the reservoir.

A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.

A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.

There are provided a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes: a stage on which a substrate is seated, in a chamber; and a treatment liquid supply apparatus supplying a treatment liquid containing a solvent and a solute onto the substrate, wherein the treatment liquid supply apparatus supplies the treatment liquid onto the substrate while moving from a center of the substrate to an outer peripheral surface of the substrate.

There are provided a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes: a stage on which a substrate is seated, in a chamber; and a treatment liquid supply apparatus supplying a treatment liquid containing a solvent and a solute onto the substrate, wherein the treatment liquid supply apparatus supplies the treatment liquid onto the substrate while moving from a center of the substrate to an outer peripheral surface of the substrate.

The invention is generally a system for drying, recycling, and washing off residual resin from three-dimensionally (3D) printed objects. Exemplary systems may include a system for washing off residual printing material from a surface of a 3D-printed. In an exemplary embodiment, a chamber is adapted to receive the 3D-printed object and a printing material disruption module is adapted to disrupt a composition of residual printing material on a surface of the 3D-printed object. Additionally, a washing force module may be adapted to apply a washing force field to the 3D-printed object and wash off the residual printing material.

A kit and method of cleaning a barbeque grill that includes engaging a heat-resistant cloth about a support member of a grill brush; absorbing a quantity of liquid with the heat-resistant cloth; placing the brush with heat-resistant cloth engaged onto previously-heated grill bars of the barbeque grill; generating steam as the quantity of liquid is heated by the grill bars; moving the brush with heat-resistant cloth thereon back and forth along the grill bars; removing food matter and grease from the grill bars; and transferring the removed food matter and grease to the heat-resistant cloth. The removal of food matter and grease is accomplished by a combination of the generated steam and the moving of the brush with heat-resistant cloth thereon back and forth along the grill bars. After use, the heat-resistant cloth is disengaged from the brush and may be washed and reused one or more times.

A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.

A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.

An apparatus for removing powder from a powder-based additively manufactured part includes a chamber for locating a powder-based additively manufactured part therein, a support mesh for supporting a powder cake that includes one or more parts therein, an inlet for introducing a gas into the chamber to flow throughout the powder cake and fluidise the powder to disengage from the part, and an outlet to allow the gas to exit the chamber. The apparatus further includes a cryogenic blasting system for spraying a mixture of liquid CO.sub.2 and compressed air at the powder-based additively manufactured part to remove powder therefrom.