The present invention discloses a molten salt ultrasonic cleaning machine. the molten salt ultrasonic cleaning machine includes a tank body, a molten salt heating system, an ultrasonic application system and a stirring system, wherein the tank body is configured to accommodate molten salt and a to-be-cleaned workpiece; the tank body includes a bottom wall, and a side wall arranged circumferentially in a surrounding way; the molten salt heating system is configured to heat the molten salt in the tank body; the ultrasonic application system is configured to apply ultrasonic impact to the to-be-cleaned workpiece in the tank body; and the stirring system includes a stirring rod which is rotatably arranged in the tank body. When the molten salt ultrasonic cleaning machine provided by the present invention cleans a workpiece, the stirring rod rotates to improve the flowability of the molten salt. In combination with the ultrasonic impact, rapid removal of pollutants in the complex space of the workpiece and pollutants on the bottom layer of the surface is accelerated, so that the cleaning efficiency is improved. Moreover, the improvement of the molten salt flowability can promote complete reaction between the unreacted paint and residues which float on the surface of the liquid level, and the molten salt, so that the quantity of generated waste gas is reduced.

A material cleaning device and a cooking appliance. The material cleaning device comprises: a cleaning chamber, an air inlet, a material inlet, and a water inlet being provided on the cleaning chamber, the air inlet, the material inlet, and the water inlet being respectively used for transporting air flows, a material to be cleaned, and water for cleaning the material to the cleaning chamber; and a stirring assembly provided in the cleaning chamber and being capable of rotating in the cleaning chamber under the action of the air streams, so as to stir the material and the water in the cleaning chamber. The material cleaning device drives the stirring assembly to rotate by means of air streams, so as to make the stirring assembly stir the material and the water in the cleaning chamber, thereby implementing automatic cleaning. The material cleaning device features a simple structure, and is easy to use.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid; and a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture.

The present invention provides apparatus for post-processing an additively manufactured polymer part, comprising a reservoir (402) for containing a liquid solvent; a processing chamber (408) in controllable fluid communication with the reservoir; and a controller (418) configured to controllably post-process an additively manufactured polymer part located in the processing chamber by the solvent responsive to at least one parameter associated with the part. A method for post-processing an additively manufactured polymer part is also provided.

During meeting for planning operations for scale removal and scale inhibitor squeeze treatment in wells, the possibility of the manifold being partially incrusted with scale raised considering the more critical mixture of water produced. The proposed solution is a method of treatment for removing scale from a manifold. Said method uses the geothermal heating of the exploration reservoir to heat a chemical removal solution (50). Heating is required to ensure the temperature is in a range that is also suitable for conducting the removal reaction, since the distance that the solution travels to the manifold (20) e the low temperature of the underwater environment make the reaction occur inefficiently, as in the case of pre-salt.

During meeting for planning operations for scale removal and scale inhibitor squeeze treatment in wells, the possibility of the manifold being partially incrusted with scale raised considering the more critical mixture of water produced. The proposed solution is a method of treatment for removing scale from a manifold. Said method uses the geothermal heating of the exploration reservoir to heat a chemical removal solution (50). Heating is required to ensure the temperature is in a range that is also suitable for conducting the removal reaction, since the distance that the solution travels to the manifold (20) e the low temperature of the underwater environment make the reaction occur inefficiently, as in the case of pre-salt.

Method of making a three-dimensional object, comprising the steps of: (a) providing a carrier platform on which the three-dimensional object can be formed; (b) producing the three-dimensional object, (c) immersing the object in a wash liquid with the object remaining adhered to the carrier platform; (d) agitating (i) the object in said wash liquid, (ii) the wash liquid with the object immersed therein, or (iii) both the object and the wash liquid, to at least partially remove residual resin from the surface of the object; (e) separating the object from the wash liquid, with the object remaining adhered to the carrier platform, (f) agitating the object to at least partially remove residual wash liquid from the surface thereof; and (g) repeating steps (c) through (f) to remove additional polymerizable resin from the surface thereof, wherein steps (c) through (f) are carried out in the same vessel.

Method of making a three-dimensional object, comprising the steps of: (a) providing a carrier platform on which the three-dimensional object can be formed; (b) producing the three-dimensional object, (c) immersing the object in a wash liquid with the object remaining adhered to the carrier platform; (d) agitating (i) the object in said wash liquid, (ii) the wash liquid with the object immersed therein, or (iii) both the object and the wash liquid, to at least partially remove residual resin from the surface of the object; (e) separating the object from the wash liquid, with the object remaining adhered to the carrier platform, (f) agitating the object to at least partially remove residual wash liquid from the surface thereof; and (g) repeating steps (c) through (f) to remove additional polymerizable resin from the surface thereof, wherein steps (c) through (f) are carried out in the same vessel.

A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.

A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.