Patent classifications
B08B5/043
METHOD AND APPARATUS FOR CLEANING A GLASS SUBSTRATE
An apparatus and method for cleaning a glass substrate is disclosed, the apparatus including a shroud assembly arranged along a conveyance path of a glass substrate such that an opening of shroud portion of the shroud assembly is adjacent the glass substrate. A nozzle assembly contained within a hollow interior space of the shroud assembly rotates while directing a jet of gas at the glass substrate, dislodging particulate. A vacuum is applied to a second interior hollow space defined by a skirt portion extending around the shroud, thereby removing the dislodged particulate. A second vacuum is applied to a back portion of the shroud to remove particulate accumulated in the shroud. The apparatus may further include a gas knife arranged adjacent the shroud assembly and a vacuum channel arranged below the shroud assembly.
Manufacturing apparatus and method of manufacturing display apparatus using the same
An apparatus for manufacturing a display apparatus includes: a polisher at which a polishing material is supplied to a base member of the display apparatus and the base member is polished with the polishing material to provide a polished base member having a polished surface; a conveyer to which the polished base member is provided from the polisher and from which the polished base member is transferred to outside the apparatus; and a suction unit corresponding to the conveyer and by which a pressure around the conveyer is provided to be lower than a pressure at remaining portions of the apparatus.
SURFACE CLEANING SYSTEM, SURFACE CLEANING DEVICE AND CONTROL METHOD THEREOF
A cleaning system, a cleaning device and a control method therefor, are associated with a floor brush assembly that includes a roller brush housing, a roller brush, a roller brush cover. The roller brush cover and the floor brush housing enclose a roller brush cavity for fitting with the roller brush. The roller brush cover is configured to be operable in a first or second position relative to the floor brush housing. In the first position, there is a first contact area between the roller brush cover and the roller brush. In the second position, there is a second contact area between the roller brush cover and the roller brush. The first contact area is greater than or equal to zero, but less than the second contact area. The inner wall of the roller brush cover can be cleaned by the roller brush.
DUST HOOD
A dust hood for a dust control system includes a first hood body and a second hood body. The first hood body and the second hood body are each selectively movable between an assembled position and a disassembled position. In the assembled position, the first hood body is adjacent to the second hood body. In the disassembled position, the first hood body is spaced apart from the second hood body.
High volume floor dust control system
A high volume dust collector that is adapted and configured to reduce time associated with routine cleaning of an industrial tissue-machine and factory. The dust collector has a body, having an intake positioned to draw large volumes of air and dust from any area where dust is known to accumulate when engaged. The intake is taller than it is wide and is fitted with a grill to prevent larger maculature from clogging the system. An outlet on each collector connects to a fan or blower and sends collected dust to filtration system. An access hatch is positioned on the body of the collector to allow an operator to manually clear any clogs, should they occur.
Collection system and production process of said collection system
A collection system for particulate matter along a conveyor system of products, which advance in an advancing direction, by means of a carrier gas flow; said collection system having a hood made by moulding of polymeric material; wherein the hood has a bent wall, which delimits a suction area, and a connection, which fluidly connects said suction area with a suction conduit through an opening of said bent wall; wherein said bent wall has a longitudinal axis, which in use is transversal, in particular perpendicular, to the advancing direction of the products.
POLISHING CHAMBER ASSEMBLY
An apparatus, system, and method are disclosed for a polishing chamber assembly. An apparatus includes an inner drum positioned on a first axis and forming an inner chamber interior to the inner drum. The inner drum includes a plurality of inner drum perforations formed in the inner drum, an object intake disposed tangential to the inner drum at a proximal end of the inner drum, and an object outlet disposed at a distal end of the inner drum. The apparatus includes an outer drum disposed around the inner drum and forming an annular chamber interior to the outer drum and exterior to the inner drum. A cyclonic gas flow is generated within the apparatus from the object intake to a gas outlet in response to drawing gas from the apparatus through the gas outlet to remove debris from objects within the inner drum.
POLISHING CHAMBER ASSEMBLY
An apparatus, system, and method are disclosed for a polishing chamber assembly. An apparatus includes an inner drum positioned on a first axis and forming an inner chamber interior to the inner drum. The inner drum includes an object intake coupled to the inner drum at a proximal end of the inner drum and an object outlet disposed at a distal end of the inner drum. The apparatus includes an agitator configured to polish objects within the inner drum as the objects move from the object intake to the object outlet. The agitator is disposed within the inner drum and is removably coupled to a rotation element disposed on an end of the inner drum. The apparatus includes an outer drum disposed around the inner drum, which is removably coupled to the outer drum. The outer drum is releasably couplable to a base unit using attachment means.
SUBSTRATE CLEANING APPARATUS
A substrate cleaning apparatus includes a stage on which a substrate is placed, a support unit configured to support the substrate and to rotate the substrate, and a cleaning unit configured to spray a dual fluid to clean the substrate, wherein the cleaning unit may include a spray nozzle including a spray hole opened toward the stage and configured to spray a dual fluid through the spray hole, a cover that may include an inlet surrounding at least a partial area of an outer circumferential surface of the spray hole, that may surround at least a partial area of an outer circumferential surface of the spray nozzle, and that may be spaced apart from the spray nozzle by a predetermined distance, and an air flow passage formed in a space between the cover and the spray nozzle and through which air sucked from the inlet flows.
MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
An apparatus for manufacturing a display apparatus includes: a polisher at which a polishing material is supplied to a base member of the display apparatus and the base member is polished with the polishing material to provide a polished base member having a polished surface; a conveyer to which the polished base member is provided from the polisher and from which the polished base member is transferred to outside the apparatus; and a suction unit corresponding to the conveyer and by which a pressure around the conveyer is provided to be lower than a pressure at remaining portions of the apparatus.