Embodiments of the present disclosure generally relate to methods for cleaning aerospace components having oxidation, corrosion, contaminants, and/or other degradations. In one or more embodiments, a cleaning method includes positioning the aerospace component into a processing region of a processing chamber, introducing hydrogen gas into the processing region, maintaining the processing region at a pressure of about 100 mTorr to about 5,000 mTorr, and heating the aerospace component at a temperature of about 500° C. to about 1,200° C. for about 0.5 hours to about 24 hours to produce a cleaned surface on the aerospace component. In other embodiments, a cleaning method includes exposing the aerospace component to ozone while maintaining the aerospace component at a temperature of about 15° C. to about 500° C. for 0.25 hours to about 24 hours to produce a cleaned surface on the aerospace component.

The present disclosure provides a substrate treating apparatus. The substrate treating apparatus includes a support unit that supports a substrate, and a laser unit that irradiates a laser beam to the substrate supported by the support unit, the laser unit includes an irradiation member that irradiates the laser beam, a lens disposed on a travel path of the laser beam irradiated by the irradiation member to be rotatable, and a reflection member having an inclined surface for changing the travel path of the laser beam that passed through the lens.

A heating device for heating a component in a turbo molecular pump for exhausting a gas includes a heat transfer member, a heater, a first seal member and a second seal member. The heat transfer member is provided in an opening of a housing of the turbo molecular pump and has one end fixed to the component and the other end exposed to an outside. The heater in the heat transfer member heats the component through the heat transfer member. The first seal member is provided between the heat transfer member and the opening along an outer peripheral surface of the heat transfer member. The second seal member between the heat transfer member and the opening is located close to the component compared to the first seal member. The second seal member suppresses movement of radicals in a gas into a space between the heat transfer member and the opening.

An integrated approach for cleaning an active surface of a petrochemical sensor. Sensors in the petrochemical industry are often deployed in locations where they are prone to fouling. By heating the active surface fouling substances may be removed from the active surface. Heating the surface above a supercritical point of a fluid being sensed may create a fluid that may serve to clean the active surface. Limiting the duration of the applied heating and/or pulsing the heating may mitigate adverse effects of use of high temperatures. A doped active surface, such as a doped diamond window may be designed to have conductive areas in the window that may be used for resistive heating of the window.

Embodiments of the present disclosure provide a device for manipulating a substance, the device comprising at least three series of interdigitated electrode pairs, wherein each electrode of each pair is connected to an electrode in an adjacent pair in the respective series by an electrical path, and a dielectric layer disposed on the at least three series of interdigitated electrode pairs, the dielectric layer comprising one or more sub layers. The at least three series of interdigitated electrode pairs are selectively and independently energisable to produce an electric field at a top surface of the dielectric layer so that a substance on the top surface may be manipulated by the electric field. The device further comprises one or more groups of the interdigitated electrode pairs, each group having a longitudinal axis, wherein in each group the respective interdigitated electrode pairs are arranged along the respective longitudinal axis such that along the respective longitudinal axis no two adjacent pairs are from a single one of the at least three series, and no pair is adjacent to two other pairs from a single one of the at least three series.

A pyrolytic cleaning top burner system for a stove having a normal cooking mode includes a top burner coupled to a stove, a cover for seating on the stove surface, means for heating a top burner, and an exhaust outlet. The cover covers at least the top burner in a cleaning mode. The heating means heats to a cleaning temperature in a cleaning mode that permits baked on food that is positioned under the cover to be disintegrated with heat. The exhaust outlet exhausts air from under the cover. A method for pyrolytically cleaning a top burner of a stove or cooktop is also disclosed.

The present disclosure discloses a microwave flash evaporation process and apparatus and uses thereof. A microwave flash evaporation process, wherein the process makes integration of those technologies for liquid spraying, liquid droplet flash evaporation, microwave enhancement, vacuum steam discharge, and simulation and optimization of multi-mode resonant cavity, wherein through the coupling effect of the microwave, by means of one stage microwave flash evaporation, the effect normally achieved by multi-effect evaporation and flash evaporation is obtained and a liquid droplet micro-system with microwave energy transfer in situ is formed so as to prevent a circulation pump and a steam heat exchange system from being corroded under high temperature and high pressure, and prevent scaling on a heat exchanger, and improve evaporation efficiency. The present disclosure makes integration of those technologies for liquid spraying, liquid droplet flash evaporation, microwave enhancement, vacuum steam discharge, and simulation and optimization of multi-mode resonant cavity, and can be used for performing the processes of effluent disposal, seawater desalination, evaporation concentration of spent liquor of Bayer process, concentration crystallization of chemical production, sterilization of solution, unoil of solution, the rectification separation for various organic mixed solutions, sterilization, unoil and dehydration of solid powder. There is a prospect for this new process of the present disclosure with short technological process to upgrade the evaporation process.

Exemplary methods of semiconductor processing may include forming a plasma of a fluorine-containing precursor. The methods may include performing a chamber clean in a processing region of a semiconductor processing chamber. The processing region may be at least partially defined between a faceplate and a substrate support. The methods may include generating aluminum fluoride during the chamber clean. The methods may include contacting surfaces within the processing region with a carbon-containing precursor. The methods may include volatilizing aluminum fluoride from the surfaces of the processing region.

The present invention relates to a cleaning method and a cleaning apparatus for a mask. The cleaning method includes: step 1, providing a to-be-cleaned mask which is made of metal and has an organic material film attached thereto; step 2, heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask; step 3, stopping heating with microwave, and spraying the heated mask with a solution to remove off the broken organic material film from the mask; step 4, cleaning residual organic material film on the mask with a solution; step 5, rinsing the cleaned mask to wash off residual solution on the mask; step 6, drying the rinsed mask with microwave. Accordingly, the cleaning period of mask is dramatically shortened, the cleaning productivity is increased and the probability of material residue is decreased.

Methods and apparatus to reduce biological carryover using induction heating are disclosed herein. An example method includes washing an aspiration and dispense device. The example method includes generating an alternating electromagnetic field and introducing the aspiration and dispense device into the alternating electromagnetic field. The example method includes inductively heating the aspiration and dispense device with the alternating electromagnetic field. In the example method, the washing is to occur in concert with the heating.