A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.

A substrate cleaning method includes: steps (a) to (d). In step (a), a liquid is supplied onto a nanoimprint template substrate that has a patterned surface with foreign particles to form a liquid film on the patterned surface. In step (b), the liquid film is solidified to form a solidified film including the foreign particles. In step (c), the substrate is reversed. In step (d), the solidified film is melted to remove the foreign particles.

A method for producing a steel tube include the manufacturing of a steel tube having an inner tube wall, an outer tube wall (3), and a free tube cross-section enclosed by the inner tube wall. After the manufacturing, the steel tube includes at least one contaminant on the outer tube wall and entails, after the manufacturing of the steel tube, cleaning of the outer tube wall by applying liquid or solid CO.sub.2 onto the outer tube wall in order to remove a contaminant from the outer tube wall.

Cleaning processing equipment may include generating a function characterizing a relationship between fouling formation in the processing equipment and operation of the processing equipment. A cleaning recipe may be selected based on properties of fouling material formed in the processing equipment during operation of the processing equipment. Operating costs associated with cleaning schedules may be determined based on the first function and the cleaning recipe and one of the cleaning schedules may be selected based on the respective determined operating costs. A cleaning process on the processing equipment may be executed according to the selected cleaning schedule using the selected cleaning recipe.

A substrate treatment device according to an embodiment includes a placement portion on which a substrate is placed and rotated, a liquid supply portion which supplies a liquid to a surface on an opposite side to the placement portion of the substrate, a cooling portion which supplies a cooling gas to a surface on a side of the placement portion of the substrate, and a control portion which controls at least one of a rotation speed of the substrate, a supply amount of the liquid, and a flow rate of the cooling gas. The control portion brings the liquid present on a surface of the substrate into a supercooled state and causes at least a part of the liquid brought into the supercooled state to freeze.

The invention relates to a device for generating a CO.sub.2 snow jet, comprising an expansion channel (6) which extends in a flow direction (14) for generating a CO.sub.2 gas/CO.sub.2 snow mixture based on liquid CO.sub.2, said expansion channel having an inlet opening (18) for supplying liquid CO.sub.2 and an outlet opening (22) for discharging the CO.sub.2 gas/CO.sub.2 snow mixture. The device also comprises a nozzle for generating an outer jet which surrounds and accelerates the CO.sub.2 gas/CO.sub.2 snow mixture discharged from the outlet opening of the expansion channel. The expansion channel has multiple channel sections (36a, 36b, 36c, 36d, 36e) arranged one behind the other in the flow direction, wherein the expansion channel cross section (40) that lies on a plane orthogonal to the flow direction changes locally in a particular transition or transition region (38a, 38b, 38c, 38d, 38e, 38f) between the channel sections, and the expansion channel (6) cross section (46d) at the upstream end (48d) of a particular channel section (36d) is larger than the expansion channel (6) cross section (46c) at the upstream end (48c) of the channel section (36c) arranged upstream of said channel section (36d) in the flow direction (14).

A method for stripping a coating off of a blade includes discharging liquid nitrogen through a nozzle onto the blade at a coating to cause lifting of the coating from a substrate of the blade and traversing the nozzle along the blade to cause peeling of the coating off of the substrate of the blade as the nozzle traverses the blade.

According to one embodiment, a substrate processing apparatus includes: a stage rotatable around a central axis; a plurality of holders provided on the stage to hold a substrate; a cooler capable of supplying a cooling gas to a space between the stage and the substrate; and a liquid supply capable of supplying a liquid to a surface of the substrate on an opposite side to the stage. When holding the substrate, each of the plurality of holders moves toward the central axis along a surface of the stage so as to surround a peripheral edge of the substrate and the space between the stage and the substrate.

A cleaning apparatus for a vacuum exhaust system capable of preventing redeposition of deposits on a downstream side of a vacuum pump is provided. A cold trap capable of causing deposits to be formed by cooling gas containing a sublimation component, at least one first vacuum pump disposed upstream of the cold trap, at least one first piping connecting the first vacuum pump to the cold trap, at least one second vacuum pump disposed downstream of the cold trap, and at least one second piping connecting the second vacuum pump to the cold trap are provided. At least a part of the first vacuum pump or the first piping is configured to be heated to higher than or equal to a sublimation temperature of the sublimation component. The cold trap is configured to be cooled to less than or equal to the sublimation temperature of the sublimation component.

In a cleaning method for removing adhesive residues from surfaces, in particular after separating an adhesive connection between adhesively joined partners, liquid carbon dioxide from a reservoir enters a jet, apparatus and is guided there through a first dosing unit into an expansion chamber wherein a cold-resistant liquid is then supplied to a mixture created in the expansion chamber from gaseous carbon dioxide and carbon dioxide particles and wherein the mixture, to which the cold-resistant liquid has been added, exits the jet apparatus via an outlet opening thereof. Furthermore, a jet apparatus removes adhesive residues from surfaces.