Patent classifications
B08B7/026
METHOD AND DEVICE FOR REMOVING IMPURITIES IN GRANULES
A method and apparatus for removing impurities from granules are provided, the method includes: adopting at least one of a low-frequency acoustic wave gas guided wave mode, a high-frequency acoustic wave gas guided wave mode and a high-frequency acoustic wave solid guide mode, so that the acoustic waves are transmitted to the granules to be removed to weaken the bonding force between the granules and the impurities in the granules to be removed, while using airflow to enhance the separation of the impurities and the granules. Among them, the low-frequency acoustic wave gas guided wave mode is that the low-frequency acoustic wave is transmitted by using gas as a wave guide medium; the high-frequency acoustic wave gas guided wave mode is that the high-frequency acoustic wave is transmitted by using gas as a wave guide medium.
Reprocessing of contaminated reusable devices with direct contact of pressure waves
A reusable apparatus, such as a medical instrument or tool, is decontaminated by applying pressure waves with direct contact of the pressure wave applicator to the reusable apparatus in an open bath in a sufficient dosage to remove contamination but without adversely affecting the ability to reuse the apparatus.
SYSTEM AND PROCESS FOR CLEANING A MEMBRANE
The present disclosure is directed to a membrane cleaning system and a membrane cleaning process, the membrane cleaning system including: a membrane; a membrane holder accommodating the membrane in a cut-out section within the membrane holder, wherein the cut-out section allows access to the membrane from two opposing sides; and a speaker configured to emit sound waves of a resonant frequency of the membrane for a predetermined duration and at a predetermined amplitude, wherein the sound waves are directed to one side of the membrane.
Modular sonic vibration buffer system and method
A modular some vibration buffer system includes an adapter assembly that can be attached to a sonic vibration device. The adapter assembly includes a body with apertures and a plate with arms that are received in the apertures of the body to couple the plate to the body. A cleaning tool is secured between the body and the plate to couple the cleaning tool to the adapter assembly. The sonic vibration device is operable to vibrate the cleaning tool via the adapter assembly. The system also includes additional adapter assemblies and cleaning tools with different characteristics that are attachable to the sonic vibration device in a modular nature for different cleaning or buffering applications.
METHOD AND APPARATUSES FOR DISPOSING OF EXCESS MATERIAL OF A PHOTOLITHOGRAPHIC MASK
The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.
METHOD AND APPARATUSES FOR DISPOSING OF EXCESS MATERIAL OF A PHOTOLITHOGRAPHIC MASK
The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.
METHOD AND APPARATUSES FOR DISPOSING OF EXCESS MATERIAL OF A PHOTOLITHOGRAPHIC MASK
The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.
Methods And System For Removal Of Unwanted Material From An Additively Manufactured Object
Systems and methods according to the invention are used for removal of unwanted material from an additively manufactured object by application of sonic energy are disclosed. Application of sound at specific frequencies, specific amplitudes and specific waveforms to specific materials causes physical displacement of such materials. When applied to objects formed by additive manufacturing and unwanted material formed with such objects, the displacement causes the unwanted material to break away from the object. Advantageously, the unwanted material removed from the additively manufactured object can be recycled.
A SYSTEM AND A METHOD FOR CLEANING A DEVICE
Disclosed is systems and methods for cleaning devices holding fluid such as heat exchanges. The cleaning is performed by using a system such as a transducer assembly including a mechanical wave generator and a waveguide including a cavity. The system is capable of operating at its fundamental resonance frequency even when connected to an outer surface of the device to be cleaned.
Method for removing dust using speaker and electronic device supporting the same
An electronic device includes a housing surrounding an exterior of the electronic device and including at least one opening, a sensor module including at least one sensor, a sound output device including sound output circuitry configured to output an acoustic-signal through the at least one opening, a memory, and a processor electrically connected to the sensor module and the sound output device, wherein the processor may be configured to: determine whether the electronic device is in a state where a foreign substance has entered into the electronic device through the at least one opening, determine whether the electronic device is in a first disposition state using the sensor module based at least on determining that the electronic device is in the state where the foreign substance has entered into the electronic device, and control the electronic device to output a specified acoustic-signal having a specified frequency band and a specified waveform through the sound output device based on the electronic device being in the first disposition state.