Cleaning fixtures for cleaning a showerhead assembly are disclosure. The cleaning fixtures include: a fixture body incorporating three or more cavities, each cavity being separate from an adjacent cavity by a partition, and a number of channels associated with each cavity for fluidly connecting the cavities with an upper surface of the fixture body.

A directed flow apparatus is proposed for improving the mechanical washing of surgical instrument handpieces. The apparatus takes the form of a cleaning adaptor that is designed to attach to the distal opening of the handpiece and an inlet port connector inserted on a fluid jet of the mechanical washer. A suitable length of tubing is connected between the cleaning adaptor and the inlet port connector so that when the washing cycle begins, a high force stream of cleaning fluid is specifically directed into the interior of the handpiece and focusing the direction of the cleaning fluid into a channel that is not easily accessible otherwise.

There are provided methods of treating a catalyst-containing reactor system with a liquid solvent to remove contaminants from the reactor system. An exemplary method includes the steps of: isolating the reactor system to be treated from upstream and downstream equipment; reducing the temperature and pressure of the isolated reactor system by flushing with a hydrogen rich gas; injecting a non-aqueous liquid solvent into the reactor system at an injection point while continuously flowing hydrogen-rich gas through the reactor system; maintaining the solvent in a liquid state while flowing the solvent continuously through the reactor system; and terminating the step of injecting solvent and terminating the continuous flowing of hydrogen-rich gas. The exemplary method is free of the injecting of a carrier gas into the reactor system comprising alkanes selected from the methane, ethane, propane, butane and pentane.

There are provided methods of treating a catalyst-containing reactor system with a liquid solvent to remove contaminants from the reactor system. An exemplary method includes the steps of: isolating the reactor system to be treated from upstream and downstream equipment; reducing the temperature and pressure of the isolated reactor system by flushing with a hydrogen rich gas; injecting a non-aqueous liquid solvent into the reactor system at an injection point while continuously flowing hydrogen-rich gas through the reactor system; maintaining the solvent in a liquid state while flowing the solvent continuously through the reactor system; and terminating the step of injecting solvent and terminating the continuous flowing of hydrogen-rich gas. The exemplary method is free of the injecting of a carrier gas into the reactor system comprising alkanes selected from the methane, ethane, propane, butane and pentane.

A cleaning apparatus for a vacuum exhaust system capable of preventing redeposition of deposits on a downstream side of a vacuum pump is provided. A cold trap capable of causing deposits to be formed by cooling gas containing a sublimation component, at least one first vacuum pump disposed upstream of the cold trap, at least one first piping connecting the first vacuum pump to the cold trap, at least one second vacuum pump disposed downstream of the cold trap, and at least one second piping connecting the second vacuum pump to the cold trap are provided. At least a part of the first vacuum pump or the first piping is configured to be heated to higher than or equal to a sublimation temperature of the sublimation component. The cold trap is configured to be cooled to less than or equal to the sublimation temperature of the sublimation component.

A cleaning apparatus for a vacuum exhaust system capable of preventing redeposition of deposits on a downstream side of a vacuum pump is provided. A cold trap capable of causing deposits to be formed by cooling gas containing a sublimation component, at least one first vacuum pump disposed upstream of the cold trap, at least one first piping connecting the first vacuum pump to the cold trap, at least one second vacuum pump disposed downstream of the cold trap, and at least one second piping connecting the second vacuum pump to the cold trap are provided. At least a part of the first vacuum pump or the first piping is configured to be heated to higher than or equal to a sublimation temperature of the sublimation component. The cold trap is configured to be cooled to less than or equal to the sublimation temperature of the sublimation component.

A wiping tip (1) includes a hollow cylindrical member (10), and a cotton-like wiping member (20) arranged on the cylindrical member (10). The cotton-like wiping member (20) constitutes a thin film portion (21) covering an opening at an end of the cylindrical member (10), and an outer circumferential portion (23) extending from the thin film portion (21) and covering an outer circumferential face of the cylindrical member (10) over a predetermined length from the end.

A wiping tip (1) includes a hollow cylindrical member (10), and a cotton-like wiping member (20) arranged on the cylindrical member (10). The cotton-like wiping member (20) constitutes a thin film portion (21) covering an opening at an end of the cylindrical member (10), and an outer circumferential portion (23) extending from the thin film portion (21) and covering an outer circumferential face of the cylindrical member (10) over a predetermined length from the end.

A method of treating an apparatus to remove surface deposits therefrom is performed by selecting a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less that exhibit properties of Brownian motion that facilitate penetration of solid deposits on surfaces of an apparatus that is subject to surface deposits from contact with fluids. The surfaces of the apparatus are contacted with a treatment composition comprising the colloidal particle dispersion. The composition is allowed to act upon the materials adhering to the surfaces of the apparatus to loosen and breakup the materials adhering to the surfaces of the apparatus. The loosened and broken materials are removed from the surfaces of the apparatus.

The present disclosure includes arrangements, systems, and methods for removing mineral deposits. Disclosed is an aqueous solution within a container, with the container containing mineral deposits. The aqueous solution submerges the mineral deposits and may include at least one acid, or a combination of an organic acid and an inorganic acid in percentages that allow the replacement of toxic dangerous chemical ingredients. Disclosed also is a cathode and an anode within the container that are at least partially submerged within the aqueous solution. A direct current power source is configured to direct a voltage across the cathode and the anode to generate an electrical charge gradient within the aqueous solution.